IP Library Granted Patent US 6,847,102
Granted Patent B2
US 6,847,102 · App. 10/290,959 · Granted Jan 25, 2005

Low profile semiconductor device having improved heat dissipation

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Quick Facts
Patent No.
US 6,847,102
App. No.
10/290,959
Granted
Jan 25, 2005
Kind
B2
Abstract

A package substrate ( 12, 52 ) has a first surface, a second surface opposite a first surface, and a cavity ( 22, 70 ) formed in the first surface that extends into the package substrate. The cavity has a cavity wall substantially perpendicular to the first and second surfaces. An integrated circuit die ( 20, 60 ) is placed in the cavity, and a conductive material ( 24, 72 ) is placed in the cavity to thermally couple an outer wall of the integrated circuit to the cavity wall. The conductive material improves the heat dissipation path between the integrated circuit die and the package substrate. The cavity may extend through the package substrate to the second surface such that the second surface of the package substrate is substantially coplanar to a surface of the integrated circuit die. An encapsulation layer ( 28, 78 ) may be formed over the conductive material, integrated circuit die, and at least a portion of the first surface of the package substrate.

Claims (19)

1. A semiconductor device comprising:

a package substrate having a first surface, a second surface opposite the first surface, and a cavity formed in the first surface and extending into the package substrate, the cavity having a cavity wall substantially perpendicular to the first and second surfaces;

an integrated circuit die, wherein at least a portion of the integrated circuit die is in the cavity, and wherein the integrated circuit die has a first surface, a second surface opposite the first surface, an outer wall substantially perpendicular to the first and second surfaces, a ledge portion at an intersection of the first surface of the integrated circuit die and the outer wall, wherein at least a portion of the outer wall substantially faces the cavity wall; and

a conductive material in the cavity, wherein the conductive material thermally couples the outer wall of the integrated circuit die to the cavity wall.

2. The semiconductor device of claim 1 , further comprising:

an encapsulation layer overlying the first surface of the integrated circuit die, the conductive material, and at least a portion of the first surface of the package substrate.

3. The semiconductor device of claim 2 , wherein the encapsulation layer comprises a material different from the conductive material.

4. The semiconductor device of claim 2 , wherein a thermal conductivity of the conductive material is greater than a thermal conductivity of the encapsulation layer.

5. The semiconductor device of claim 1 , wherein the conductive material substantially fills the cavity between the outer wall of the integrated circuit die and the cavity wall.

6. The semiconductor device of claim 1 , wherein the integrated circuit die is entirely within the cavity.

7. The semiconductor device of claim 1 , further comprising:

a plurality of wire bonds extending from the first surface of the integrated circuit die to the first surface of the package substrate.

8. The semiconductor device of claim 1 , wherein at least a portion of the cavity wall is plated with a second conductive material.

9. The semiconductor device of claim 8 , wherein the cavity wall of the package substrate comprises a plurality of cut-out portions.

10. The semiconductor device of claim 1 , wherein the package substrate comprises a solder mask ridge near an intersection of the first surface of the package substrate and the cavity wall.

11. The semiconductor device of claim 1 , wherein the cavity extends through the package substrate from the first surface of the package substrate to the second surface of the package substrate.

12. The semiconductor device of claim 11 , wherein the second surface of the integrated circuit die is substantially coplanar with the second surface of the package substrate.

13. The semiconductor device of claim 11 , wherein the second surface of the integrated circuit die is capable of being coupled to a printed circuit board.

14. The semiconductor device of claim 1 , wherein the conductive material bonds the outer wall of the integrated circuit die to the cavity wall.

Assignments (17)
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040925 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Feb 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V. F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 052917/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040928 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Jan 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 052915/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 037486 FRAME 0517. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Dec 10, 2019
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 053547/0421 →
RELEASE OF SECURITY INTEREST Recorded Sep 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 050744/0097 →
CORRECTIVE ASSIGNMENT TO CORRECT THE TO CORRECT THE APPLICATION NO. FROM 13,883,290 TO 13,833,290 PREVIOUSLY RECORDED ON REEL 041703 FRAME 0536. ASSIGNOR(S) HEREBY CONFIRMS THE THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS.. Recorded Feb 20, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: SHENZHEN XINGUODU TECHNOLOGY CO., LTD.
Reel/Frame 048734/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE PATENTS 8108266 AND 8062324 AND REPLACE THEM WITH 6108266 AND 8060324 PREVIOUSLY RECORDED ON REEL 037518 FRAME 0292. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Feb 1, 2017
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 041703/0536 →
CORRECTIVE ASSIGNMENT TO CORRECT THE NATURE OF CONVEYANCE LISTED CHANGE OF NAME SHOULD BE MERGER AND CHANGE PREVIOUSLY RECORDED AT REEL: 040652 FRAME: 0180. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER AND CHANGE OF NAME. Recorded Jan 12, 2017
From: FREESCALE SEMICONDUCTOR INC.
To: NXP USA, INC.
Reel/Frame 041354/0148 →
CHANGE OF NAME Recorded Nov 8, 2016
From: FREESCALE SEMICONDUCTOR INC.
To: NXP USA, INC.
Reel/Frame 040652/0180 →
RELEASE OF SECURITY INTEREST Recorded Nov 7, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 040928/0001 →
RELEASE OF SECURITY INTEREST Recorded Sep 21, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V., F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 040925/0001 →
SUPPLEMENT TO THE SECURITY AGREEMENT Recorded Jun 16, 2016
From: FREESCALE SEMICONDUCTOR, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 039138/0001 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 13, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037518/0292 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 12, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037486/0517 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037356/0553 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037354/0225 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037356/0143 →
SECURITY AGREEMENT Recorded Nov 6, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 031591/0266 →