IP Library Granted Patent US 6,875,325
Granted Patent B2
US 6,875,325 · App. 10/297,265 · Granted Apr 5, 2005

Sputtering target producing few particles

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Quick Facts
Patent No.
US 6,875,325
App. No.
10/297,265
Granted
Apr 5, 2005
Kind
B2
Abstract

A sputtering target having a sprayed coating at least on the side face thereof and producing few particles. The deposit produced on the side face of the sputtering target is prevented from separating and flying.

Claims (11)

1. A sputtering target producing few particles, comprising a sputtering target having a sputtering face, an opposite face engaged to a backing plate and a side face extending between the sputtering and opposite faces, and a sprayed coating having a surface roughness of 10 to 20 μm Ra (average roughness of center line), said sprayed coating being located only on the side face of the sputtering target from a location beginning at a spaced distance from said sputtering face and extending in a direction toward said backing plate such that said sprayed coating does not extend on said sputtering face or on a part of said side face adjacent said sputtering face.

2. A sputtering target producing few particles according to claim 1 , characterized in that the side face of the sputtering target is an inclined face.

3. A sputtering target according to claim 2 , wherein said side face of said sputtering target is an inclined face broadening toward said backing plate.

4. A sputtering target according to claim 3 , wherein said sprayed coating extends continuously from said side face of the sputtering target onto a face of said backing plate.

5. A sputtering target according to claim 4 , wherein said sprayed coating is an aluminum alloy.

6. A sputtering target according to claim 3 , wherein said sprayed coating is an aluminum alloy.

7. A sputtering target according to claim 2 , wherein said sprayed coating extends continuously from said side face of the sputtering target onto a face of said backing plate.

8. A sputtering target according to claim 2 , wherein said sprayed coating is an aluminum alloy.

9. A sputtering target according to claim 1 , wherein said side face of said sputtering target is an inclined face broadening toward said backing plate.

10. A sputtering target according to claim 1 , wherein said sprayed coating extends continuously from said side face of the sputtering target onto a face of said backing plate.

11. A sputtering target according to claim 1 , wherein said sprayed coating is an aluminum alloy.

Assignments (4)
CHANGE OF ADDRESS Recorded Feb 7, 2017
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 041649/0733 →
CHANGE OF NAME/MERGER Recorded Jun 9, 2011
From: NIPPON MINING & METALS CO., LTD.
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 026417/0023 →
CHANGE OF NAME Recorded Nov 22, 2006
From: NIKKO MATERIALS CO., LTD.
To: NIPPON MINING & METALS CO., LTD.
Reel/Frame 018545/0153 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 5, 2003
From: MIYASHITA, HIROHITO; OKABE, TAKEO
To: NIKKO MATERIALS COMPANY LIMITED
Reel/Frame 014026/0579 →