Method of depositing dielectric
View Patent ↗This invention relates to a method of depositing dielectric on a semiconductor substrate to form part of a capacitor. The method includes reactive sputtering a metal oxide layer from a target of metal onto the substrate wherein the support is biased to induce a DC voltage across the depositing dielectric as it forms. The voltage may be in the range of 200-300V.
1. A method of depositing a dielectric on a semiconductor substrate on a support to form part of a capacitor including reactive sputtering a metal oxide layer from a target of the metal onto the substrate characterized in that this support is biased to induce a DC voltage across the depositing dielectric as it forms.
2. A method as claimed in claim 1 wherein the induced voltage is in the range of 200 to 300 volts.
3. A method as claimed in claim 1 wherein the support is biased by means of an RF or pulsed DC power supply.
4. A method as claimed in claim 1 wherein the target is biased by an RF or pulsed DC power supply.
5. A method as claimed in claim 1 further including plasma oxidation of the oxide after or during deposition.
6. A method as claimed in claim 1 wherein the dielectric is deposited on a first electrode and discrete second electrodes are deposited on the upper surface to define a plurality of capacitors.
7. A method as claimed in claim 6 wherein the area of each second electrode is less than 0.01 cm 2 .
8. A method as claimed in claim 1 , wherein the metal oxide is Tantalum Pentoxide.
9. A method of forming a dielectric layer, comprising
situating a semiconductor substrate against a support within a processing chamber;
reactive sputtering a layer of metal oxide on a surface of the substrate situated against the support using a target of the metal which is spaced within the chamber from the support; and
while the metal oxide layer is being sputtered on the surface of the substrate, biasing the support against which the substrate is situated to induce a DC voltage across the metal oxide layer as the metal oxide layer is being formed.
10. A method as claimed in claim 9 , wherein the induced DC voltage is in the range of 200 to 300 Volts.
11. A method as claimed in claim 9 , wherein said biasing of the support comprises delivering power to the support from an RF or pulsed DC power supply.
12. A method as claimed in claim 10 , wherein said biasing of the support comprises delivering power to the support from an RF or pulsed DC power supply.
13. A method as claimed in claim 9 , further comprising biasing the target, using an RF or pulsed DC power supply, during said reactive sputtering of the metal oxide layer.
14. A method as claimed in claim 9 , further comprising plasma oxidation of the metal oxide after or during said sputtering of the metal oxide layer onto the surface of the substrate.
15. A method as claimed in claim 9 , wherein the metal oxide layer is a Tantalum Pentoxide layer.
16. A method of forming a plurality of capacitors, comprising:
situating a semiconductor substrate against a support within a processing chamber, wherein the semiconductor substrate has an electrically conductive layer which constitutes a first electrode, and wherein the electrically conductive layer has an exposed surface facing away from the support;
reactive sputtering a layer of metal oxide on the exposed surface of the electrically conductive layer of the substrate situated against the support using a target of the metal which is spaced within the chamber from the support;
while the metal oxide layer is being formed on the first electrode, biasing the support against which the substrate is situated to induce a DC voltage across the metal oxide layer as the metal oxide layer is being formed; and
forming a plurality of second electrodes which are spaced apart from one another across a surface of the metal oxide layer such that the metal oxide layer is interposed between the second electrodes and the first electrode.
17. A method as claimed in claim 16 , wherein the induced DC voltage is in the range of 200 to 300 Volts.
18. A method as claimed in claim 16 , wherein said biasing of the support comprises delivering power to the support from an RF or pulsed DC power supply.
19. A method as claimed in claim 16 , further comprising biasing the target, using an RF or pulsed DC power supply, during said reactive sputtering of the metal oxide layer.
20. A method as claimed in claim 16 , further comprising plasma oxidation of the metal oxide layer after or during the sputtering of the metal oxide layer onto said surface of the substrate.
21. A method as claimed in claim 16 , wherein the metal oxide layer is a Tantalum Pentoxide layer.
22. A method as claimed in claim 17 , wherein said biasing of the support comprises delivering power to the support from an RF or pulsed DC power supply.
23. A method as claimed in claim 22 , wherein an area of each of the second electrodes over of the surface of the metal oxide layer is less than 0.01 cm 2 .