Device addressing gas contamination in a wet process
View Patent ↗A device for wet processing of a semiconductor-containing substrate that addresses contamination in the wet process by removing undesired sources of gas contamination, the method involving pumping a processing liquid through a degasifier, exposing the semiconductor wafer, in a vessel, to the degasified processing liquid; and optionally recirculating the processing liquid through the degasifier and back into the vessel.
1. A wet process system, comprising:
an in-fab degasifier;
a process tank in fluid communication with said in-fab degasifier; and
an overflow tank in fluid communication with said process tank and with said in-fab degasifier.
2. The wet process system of claim 1 , further comprising a liquid pump coupled to said in-fab degasifier.
3. The wet process system of claim 2 , wherein said liquid pump is interposed between said overflow tank and said in-fab degasifier.
4. The wet process system of claim 3 , further comprising a vacuum pump coupled to said in-fab degasifier.
5. A wet bench, comprising:
a wet-process chemical circulation apparatus; and
a degasifier coupled to said wet-process chemical circulation apparatus, wherein said degasifier defines a portion of said wet bench;
a first tank in fluid communication with said degasifier and configured to receive a gasified liquid; and
a second tank in fluid communication with said degasifier and with said first tank and configured to receive a degasified liquid.
6. The wet bench in claim 5 , wherein said second tank is in fluidic overflow communication with said first tank and in fluidic upwelling communication with said degasifier.
7. A device for a semiconductor fabrication edifice, comprising:
a processing apparatus configured to hold a semiconductor workpiece;
a first conduit configured to carry a liquid and a gas away from said processing apparatus;
a degasifier within said semiconductor fabrication edifice and coupled to said first conduit;
a second conduit coupled to said degasifier and said processing apparatus, wherein said second conduit is configured to carry said liquid from said degasifier to said processing apparatus; and
an overflow apparatus coupled to said first conduit and configured to hold said liquid from said processing apparatus and further configured to hold said gas.