Resist for photolithography having reactive groups for subsequent modification of the resist structures
View Patent ↗A photoresist contains a polymer that has no silicon-containing groups. Consequently, no expulsion of silicon-containing compounds in gaseous form occurs on exposure to short-wave radiation. The polymer is obtained by terpolymerization of a first comonomer having a group cleavable under acid catalysis, a second comonomer having an anchor group, and a monounsaturated hydrocarbon, in which individual carbon atoms of the carbon skeleton may also be replaced by oxygen, as a third comonomer. The polymer has a low glass transition temperature, and the photoresist therefore has a good layer quality on film formation and good structurability.
1. A chemically amplified photoresist, comprising:
a film-forming polymer obtained by copolymerizing:
a first comonomer having a group cleavable under acid catalysis, said group being selected from the group consisting of a monocyclic alkyl group, a straight-chain alkyl group, and a branched alkyl group,
a second comonomer having an anchor group for binding amplification agents, and
a third comonomer having a non-vinylic carbon-carbon double bond capable of free radical polymerization and formed by a moiety selected from the group consisting of a straight-chain alkene and a branched alkene, said alkene of said third comonomer of said film-forming polymer having a carbon atom replaced by an oxygen atom;
a photo acid generator; and
a solvent.
2. A chemically amplified photoresist, comprising:
a film-forming polymer obtained by copolymerizing:
a first comonomer having a group cleavable under acid catalysis, said group being selected from the group consisting of a monocyclic alkyl group, a straight-chain alkyl group, and a branched alkyl group,
a second comonomer having an anchor group for binding amplification agents, and
a third comonomer having a non-vinylic carbon-carbon double bond capable of free radical polymerization and formed by a moiety selected from the group consisting of a straight-chain alkene and a branched alkene, said third comonomer being selected from the group consisting of a straight-chain hydrocarbon and a branched hydrocarbon, said straight-chain hydrocarbon and said branched hydrocarbon each including a respective non-terminal polymerizable carbon-carbon double bond;
a photo acid generator; and
a solvent.
3. A chemically amplified photoresist, comprising:
a film-forming polymer obtained by copolymerizing;
a first comonomer having a group cleavable under acid catalysis, said group being selected from the group consisting of a monocyclic alkyl group, a straight-chain alkyl group, and a branched alkyl group,
a second comonomer having an anchor group for binding amplification agents, and
a third comonomer having a non-vinylic carbon-carbon double bond capable of free radical polymerization and formed by a moiety selected from the group consisting of a straight-chain alkene and a branched alkene, said third comonomer being an ether with an oxygen forming an ether bond and having a monounsaturated alkenyl radical bonded to said oxygen of said ether bond, and a substituent further bonded to said oxygen of said ether bond and selected from the group consisting of a straight-chain alkyl radical, branched alkyl radical, and alkoxyalkylene radical;
a photo acid generator; and
a solvent.
4. The chemically amplified photoresist according to claim 3 , wherein said monounsaturated alkenyl radical is an allyl radical.
5. The chemically amplified photoresist according to claim 3 , wherein:
said ether has a structure of CH 2 ═CR 1 —R 2 —O—R 3 ;
R 1 is a substituent selected from the group consisting of a hydrogen atom, a methyl group, and a cyano group;
R 2 is a substituent selected from the group consisting of a single bond, a divalent linear alkylene group having from one to ten carbon atoms, and a divalent branched alkylene group having from one to ten carbon atoms, R 2 not being said single bond when R 1 is said hydrogen atom; and
R 3 is a monovalent alkyl group having from one to ten carbon atoms.
6. A chemically amplified photoresist, comprising:
a film-forming polymer obtained by copolymerizing:
a first comonomer having a group cleavable under acid catalysis, said group being selected from the group consisting of a monocyclic alkyl group, a straight-chain alkyl group, and a branched alkyl group,
a second comonomer having an anchor group for binding amplification agents, said anchor group of said second comonomer being a carboxylic anhydride group that is nucleophilically attackable, and
a third comonomer having a non-vinylic carbon-carbon double bond capable of free radical polymerization and formed by a moiety selected from the group consisting of a straight-chain alkene and a branched alkene;
a photo acid generator; and
a solvent.
7. The chemically amplified photoresist according to claim 6 , wherein said carboxylic anhydride group of said second comonomer is selected from the group consisting of a maleic anhydride, an itaconic anhydride, a cyclohexenedicarboxylic anhydride, a norbornenedicarboxylic anhydride, and a methacrylic anhydride.
8. A chemically amplified photoresist, comprising:
a film-forming polymer obtained by copolymerizing:
a first comonomer having a group cleavable under acid catalysis, said group being selected from the group consisting of a monocyclic alkyl group, a straight-chain alkyl group, and a branched alkyl group,
a second comonomer having an anchor group for binding amplification agents, and
a third comonomer having a nonvinylic carbon-carbon double bond capable of free radical polymerization and formed by a moiety selected from the group consisting of a straight-chain alkene and a branched alkene; said third comonomer being an ether with an oxygen forming an ether bond and having a monounsaturated alkenyl radical bonded to said oxygen of said ether bond, and a substituent further bonded to said oxygen of said ether bond and selected from the group consisting of a straight-chain alkyl radical and a branched alkyl radical; said ether having a structure of CH 2 ═CR 1 —R 2 —O—R 3 ; R 1 being a substituent selected from the group consisting of a hydrogen atom, a methyl group, and a cyano group; R 2 being a substituent selected from the group consisting of a single bond, a divalent linear alkylene group having from one to ten carbon atoms, and a divalent branched alkylene group having from one to ten carbon atoms, R 2 not being said single bond when R 1 is said hydrogen atom; and R 3 being a monovalent alkyl group having from one to ten carbon atoms;
a photo acid generator; and
a solvent.