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App. No. 10/387,389 · Confirmation No. 1834

Method and system for compensating exposure value for exposure process as well as exposure system and semiconductor manufacturing system

Abandoned -- Failure to Respond to an Office Action View Publication ↗
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 Code Description Pages PDF
2004-08-13 ABN Abandonment 2 View
2004-01-12 CTNF Non-Final Rejection 7 View
2004-01-12 1449 List of References cited by applicant and considered by examiner 3 View
2004-01-12 892 List of references cited by examiner 1 View
2004-01-12 SRFW Search information including classification, databases and other search related notes 1 View
2004-01-12 FWCLM Index of Claims 1 View
2003-06-16 IDS Information Disclosure Statement (IDS) Form (SB08) 2 View
2003-06-16 FOR Foreign Reference 11 View
2003-06-16 FOR Foreign Reference 12 View
2003-04-01 IDS Information Disclosure Statement (IDS) Form (SB08) 3 View
2003-04-01 FOR Foreign Reference 4 View
2003-03-14 TRNA Transmittal of New Application 2 View
2003-03-14 ADS Application Data Sheet 4 View
2003-03-14 SPEC Specification 19 View
2003-03-14 CLM Claims 9 View
2003-03-14 ABST Abstract 1 View
2003-03-14 DRW Drawings-only black and white line drawings 5 View
2003-03-14 OATH Oath or Declaration filed 2 View
2003-03-14 WFEE Fee Worksheet (SB06) 1 View
2003-03-14 WFEE Fee Worksheet (SB06) 1 View
2003-03-14 FRPR Certified Copy of Foreign Priority Application 2 View
2003-03-14 IDS Information Disclosure Statement (IDS) Form (SB08) 3 View
2003-03-14 FOR Foreign Reference 6 View
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Quick Facts
App. No.
10/387,389
Filed
2003-03-14
Pub. No.
US20030164932A1
Art Unit
2851