Method and apparatus for defining mask patterns utilizing a spatial frequency doubling technique
A method of generating a mask for use in printing a target pattern on a substrate. The method includes the steps of: (a) determining a target pattern representing a circuit design to be printed on a substrate; (b) generating a first pattern by scaling the target pattern by a factor of 0.5; and (c) generating a second pattern by performing a Boolean operation which combines the target pattern and the first pattern. The second pattern is then utilized to print the target pattern on the substrate.
1. A method of generating a mask for use in an imaging system, said method comprising the steps of:
(a) determining a target pattern representing a circuit design to be printed on a substrate;
(b) generating a first pattern by scaling said target pattern by a factor of less than 1; and
(c) generating a second pattern by performing a Boolean operation which combines said target pattern and said first pattern.
2. The method of claim 1 , wherein said target pattern is scaled by a factor of 0.5 to generate said first pattern.
3. The method of claim 2 , wherein said target pattern has spatial frequency components, and said first pattern has spatial frequency components which are double the spatial frequency components of said target pattern.
4. The method of claim 1 , wherein said target pattern is a line-space pattern having a plurality of lines and spaces, each said line and said space having an equal width dimension.
5. The method of claim 1 , wherein said second pattern represents a mask pattern for printing said target pattern.
6. The method of claim 1 , wherein said first pattern is combined with a same portion of said target pattern that is utilized to generate said first pattern.
7. An apparatus for generating a mask for use in printing a target pattern on a substrate, said method comprising the steps of:
means for determining a target pattern representing a circuit design to be printed on a substrate;
means for generating a first pattern by scaling said target pattern by a factor of less than 1; and
means for generating a second pattern by performing a Boolean operation which combines said target pattern and said first pattern.
8. The apparatus of claim 7 , wherein said target pattern is scaled by a factor of 0.5 to generate said first pattern.
9. The apparatus of claim 8 , wherein said target pattern has spatial frequency components, and said first pattern has spatial frequency components which are double the spatial frequency components of said target pattern.
10. The apparatus of claim 7 , wherein said target pattern is a line-space pattern having a plurality of lines and spaces, each said line and said space having an equal width dimension.
11. The method of claim 7 , wherein said second pattern represents a mask pattern for printing said target pattern.
12. The apparatus of claim 7 , wherein said first pattern is combined with a same portion of said target pattern that is utilized to generate said first pattern.
13. A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to generate at least one file corresponding to a mask for use in a lithographic imaging process, said generation of said file comprising the steps of:
(a) determining a target pattern representing a circuit design to be printed on a substrate;
(b) generating a first pattern by scaling said target pattern by a factor of less than 1; and
(c) generating a second pattern by performing a Boolean operation which combines said target pattern and said first pattern.
14. The computer program product of claim 13 , wherein said target pattern is scaled by a factor of 0.5 to generate said first pattern.
15. The computer program product of claim 14 , wherein said target pattern has spatial frequency components, and said first pattern has spatial frequency components which are double the spatial frequency components of said target pattern.
16. The computer program product of claim 13 , wherein said target pattern is a line-space pattern having a plurality of lines and spaces, each said line and said space having an equal width dimension.
17. The computer program product of claim 14 , wherein said second pattern represents a mask pattern for printing said target pattern.
18. The computer program product of claim 13 , wherein said first pattern is combined with a same portion of said target pattern that is utilized to generate said first pattern.