IP Library › Patent Application 10401646
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App. No. 10/401,646 · Confirmation No. 4552

Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition

Abandoned -- Failure to Respond to an Office Action View Publication ↗
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 Code Description Pages PDF
2005-02-04 ABN Abandonment 2 View
2004-05-13 CTFR Final Rejection 5 View
2004-05-13 892 List of references cited by examiner 1 View
2004-02-13 A... Amendment/Request for Reconsideration-After Non-Final Rejection 1 View
2004-02-13 CLM Claims 1 View
2004-02-13 REM Applicant Arguments/Remarks Made in an Amendment 1 View
2004-02-13 XT/ Extension of Time 1 View
2004-02-13 LET. Miscellaneous Incoming Letter 2 View
2003-10-07 CTNF Non-Final Rejection 6 View
2003-10-07 892 List of references cited by examiner 1 View
2003-10-07 1449 List of References cited by applicant and considered by examiner 1 View
2003-03-27 TRNA Transmittal of New Application 3 View
2003-03-27 A.PE Preliminary Amendment 2 View
2003-03-27 SPEC Specification 21 View
2003-03-27 CLM Claims 1 View
2003-03-27 ABST Abstract 1 View
2003-03-27 DRW Drawings-only black and white line drawings 9 View
2003-03-27 OATH Oath or Declaration filed 2 View
2003-03-27 IIFW Issue Information including classification, examiner, name, claim, renumbering, etc. 1 View
2003-03-27 SRFW Search information including classification, databases and other search related notes 1 View
2003-03-27 FWCLM Index of Claims 1 View
2003-03-27 TRNA Transmittal of New Application 3 View
2003-03-27 DRW Drawings-only black and white line drawings 9 View
2003-03-27 SPEC Specification 21 View
2003-03-27 CLM Claims 1 View
2003-03-27 ABST Abstract 1 View
2003-03-27 OATH Oath or Declaration filed 2 View
2003-03-27 WFEE Fee Worksheet (SB06) 1 View
2003-03-27 WFEE Fee Worksheet (SB06) 1 View
2003-03-27 A... Amendment/Request for Reconsideration-After Non-Final Rejection 2 View
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Quick Facts
App. No.
10/401,646
Filed
2003-03-27
Pub. No.
US20030183171A1
Art Unit
2829