Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel
View Patent ↗Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus can include a vessel and at least one ignition electrode adjacent to the vessel. A total length of a dimension of the at least one ignition electrode is greater than 10% of a length of the vessel's channel. The apparatus can include a dielectric toroidal vessel, a heat sink having multiple segments urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. A method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel. The gas is ignited in the channel while the remaining portion of the flow rate is directed away from the channel.
1. A method for igniting a plasma, the method comprising:
providing a vessel defining an enclosed channel;
providing a gas having a flow rate and a pressure outside of the channel;
directing a portion of the flow rate of the gas into the channel; and
igniting the gas in the channel while directing a remaining portion of the flow rate away from the channel.
2. The method of claim 1 , further comprising fixing the flow rate at a value of operation of the vessel prior to igniting the gas.
3. The method of claim 1 , wherein the flow rate is associated with an operational flow rate of the vessel.
4. The method of claim 1 , further comprising directing all of the flow rate into the channel after igniting the gas in the channel.
5. The method of claim 1 , wherein directing a portion of the flow rate into the channel comprises providing a gas pressure in the channel that is at least the same as a pressure in a process chamber to which an output of the vessel is connected.
6. The method of claim 5 , wherein the gas pressure in the channel is greater than 0.01 torr.
7. The method of claim 1 , wherein directing a remaining portion of the flow rate away from the channel comprises directing all of the flow rate away from the channel.
8. A method for plasma processing, the method comprising:
providing a toroidal vessel consisting essentially of a dielectric material and defining an enclosed channel;
providing a heat sink adjacent to the vessel;
providing a thermal interface disposed between and in mechanical communication with the vessel and the heat sink, wherein the thermal interface defines a space between the heat sink and the vessel that accommodates a movement of at least one of the thermal interface, the heat sink, and the vessel in response to thermally induced dimensional changes;
providing a transformer comprising a magnetic core and a primary winding that surround a portion of the vessel;
supplying power to the primary winding from an AC power supply to maintain the plasma in the toroidal vessel; and
directing activated gas species from the toroidal vessel to a process chamber defined by a process vessel.
9. The method of claim 8 , wherein the heat sink comprises at least two segments, and further comprising urging the at least two segments against the vessel by linking the at least two segments with a spring-loaded mechanism.
10. The method of claim 8 , further comprising maintaining a temperature of the vessel below 950° C.