This invention relates to a shutter for use in physical vapour deposition apparatus having a chamber. The shutter, generally indicated at 5 , is located in a side housing 6 of the vacuum chamber 7 , whilst sputtering is taking place. Once the substrate 2 is treated, the substrate is removed from the chamber and the shutter is brought in to an operative position above a wafer pedestal or support 1. The shutter is mounted on an arm 8 using a fixing boss 10 , the arm and the boss being magnetically coupled.
1. A shutter for use in a deposition apparatus having a chamber, the shutter including a shutter blade, a movable support arm for supporting the shutter blade and for moving the shutter blade between an operative position and an inoperative position, characterised in that the shutter blade is secured to the movable support arm magnetically.
2. A shutter as claimed in claim 1 wherein the shutter blade is non-magnetic and is secured to the movable support arm by a ferromagnetic boss and the movable support arm carries one or more magnets.
3. A shutter as claimed in claim 2 wherein a part of the blade is sandwiched between the boss and the movable support arm.
4. A shutter as claimed in claim 2 wherein the boss includes a peripheral portion which shadows any interface between the boss and the shutter blade to prevent deposited material adhering to the boss and the shutter blade together.
5. A shutter as claimed in claim 4 wherein the peripheral portion is a flange which extends above and is spaced from the shutter blade.
6. A shutter for use in a deposition apparatus having a chamber, the shutter including a shutter blade, a support for supporting the shutter blade during movement between an operative position and an inoperative position characterized in that the shutter blade is secured to the support magnetically, wherein the shutter blade is non-magnetic and is secured by a ferromagnetic boss and the support carries one or more magnets.
7. A shutter as claimed in claim 6 wherein a part of the blade is sandwiched between the boss and the support.
8. A shutter as claimed in claim 6 wherein the boss includes a peripheral portion which shadows any interface between the boss and the shutter blade to prevent deposited material adhering to the boss and the shutter blade together.
9. A shutter as claimed in claim 8 wherein the peripheral portion is a flange which extends above and is spaced from the shutter blade.