Neutral particle beam processing apparatus
A neutral particle beam processing apparatus comprises a workpiece holder ( 20 ) for holding a workpiece (X), a plasma generator for generating a plasma in a vacuum chamber ( 3 ), an orifice electrode ( 5 ) disposed between the workpiece holder ( 20 ) and the plasma generator, and a grid electrode ( 4 ) disposed upstream of the orifice electrode ( 5 ) in the vacuum chamber ( 3 ). The orifice electrode ( 5 ) has orifices ( 5 a ) defined therein. The neutral particle beam processing apparatus further comprises a voltage applying unit for applying a voltage between the orifice electrode ( 5 ) and the grid electrode ( 4 ) via a dielectric ( 5 b ) to extract positive ions from the plasma generated by the plasma generator and pass the extracted positive ions through the orifices ( 5 a ) in the orifice electrode ( 5 ).
1. A neutral particle beam processing apparatus comprising:
a workpiece holder for holding a workpiece;
a plasma generator for generating a plasma in a vacuum chamber;
an orifice electrode disposed between said workpiece holder and said plasma generator, said orifice electrode having orifices defined therein;
a grid electrode disposed upstream of said orifice electrode in said vacuum chamber; and
a voltage applying unit for applying a voltage between said orifice electrode and said grid electrode via a dielectric to extract positive ions from the plasma generated by said plasma generator and pass the extracted positive ions through said orifices in said orifice electrode.
2. A neutral particle beam processing apparatus according to claim 1 , wherein said dielectric comprises a dielectric film covering a surface of said orifice electrode.
3. A neutral particle beam processing apparatus comprising:
a workpiece holder for holding a workpiece;
a plasma generator for generating a plasma in a vacuum chamber;
an orifice electrode disposed between said workpiece holder and said plasma generator, said orifice electrode having orifices defined therein;
a grid electrode disposed upstream of said orifice electrode in said vacuum chamber; and
a voltage applying unit for applying a high-frequency voltage between said orifice electrode and said grid electrode via a dielectric to generate a plasma between said orifice electrode and said grid electrode and to extract positive ions from the generated plasma and pass the extracted positive ions through said orifices in said orifice electrode.
4. A neutral particle beam processing apparatus according to claim 3 , wherein said dielectric comprises a dielectric film covering a surface of said orifice electrode.