Apparatus and method for providing a signal port in a polishing pad for optical endpoint detection
View Patent ↗A method and apparatus for providing a substantially constant environment in the cavity surrounding the optical pathway during the chemical mechanical planarization (CMP) operation is provided. In one embodiment, a system for planarizing the surface of a substrate is provided. The system includes a platen configured to rotate about its center axis. The platen supports an optical view-port assembly for assisting in determining a thickness of a layer of the substrate. A polishing pad disposed over the platen is included. The polishing pad has an aperture overlying a window of the optical view-port assembly. A carrier for holding the substrate over the polishing pad is also included. A cavity defined between the surface of the substrate and the window is included. A fluid delivery system adapted to provide a stable environment in the cavity during a chemical mechanical planarization (CMP) operation is included.
1. A system for planarizing a surface of a substrate, the system comprising:
a polishing pad disposed over a platen, the polishing pad having an aperture defined therethrough;
a cavity defined below the surface of the substrate, when the substrate is disposed over the aperture; and
a fluid delivery system adapted to provide a stable environment in the cavity during the chemical mechanical planarization (CMP) operation, the fluid delivery system is configured to provide a fluid to the cavity.
2. The system of claim 1 , wherein the fluid delivery system delivers a flow of fluid to a bottom of the cavity through a fluid delivery line to maintain a filled cavity.
3. The system of claim 1 , wherein the fluid delivery system includes a pump in communication with a reservoir of de-ionized water.
4. The system of claim 1 , wherein the fluid delivery system includes a flow meter to control a gas flow to the cavity through a fluid delivery line.
5. The system of claim 1 , wherein optical characteristics of the stable environment in the cavity remain substantially constant throughout the CMP operation.
6. A system for measuring an endpoint of a chemical mechanical planarization (CMP) operation, the system comprising:
a polishing pad disposed over a platen, the polishing pad having an aperture defined therethrough;
a cavity defined below the substrate, the cavity within the aperture;
an endpoint detector including one of a laser interferometer and a broadband spectrometer adapted to apply a light beam directed at a surface of the semiconductor substrate through the cavity; and
a fluid delivery system configured to fill the cavity with a fluid during the CMP operation.
7. The system of claim 6 further comprising:
a window defined within the platen, the window having a raised portion adapted to fit in the cavity.
8. The system of claim 6 wherein the fluid delivery system transfers fluid to the cavity through fluid delivery lines, the fluid delivery lines defining a path from a bottom of the cavity radially inward toward a center of the platen, through a platen drive spool and a slip ring and to the fluid delivery system.
9. The system of claim 6 wherein the fluid delivery system fill the cavity with one of a gas and a liquid.
10. The system of claim 6 wherein filling of the cavity maintains a flow rate from a bottom of the cavity to a top of the cavity to prevent process slurry from entering the cavity.
11. The system of claim 10 wherein filling maintains a substantially constant environment having substantially constant optical characteristics throughout the CMP operation.