Method and device for treating flat and flexible work pieces
The device in accordance with the invention and the method serve to treat flat and flexible work pieces ( 1 ) with a fluid, preferably in electroplating plants and etching facilities. The device and the method permit to place foil-type work pieces ( 1 ) in particular in such a manner into the fluid, a wet-chemical or electrochemical processing fluid for example, that the work pieces ( 1 ) will not deform or hit the side walls of a processing tank ( 3 ) or other built-in components. For this purpose, the processing tank ( 3 ) is assigned a protective carrier ( 5 ) into which the work pieces ( 1 ) are lowered, said carrier ( 5 ) being in a largely empty condition. For treatment, the protective carrier ( 5 ) is for example lowered into a tank ( 3 ) which is filled with processing fluid, said processing fluid flowing into the protective carrier ( 5 ). Means are provided on the protective carrier ( 5 ) by means of which the processing fluid is allowed to controlledly flow into the protective carrier ( 5 ).
1 . A device for treating flat and flexible work pieces ( 1 ) with a fluid,
i. comprising at least one protective carrier ( 5 ) for holding the work pieces ( 1 ), said protective carrier ( 5 ) being adapted to be received, for treatment, by a tank ( 3 ) containing the fluid; and
ii. at least one means that permits the fluid to flow into the protective carrier ( 5 ) in such a manner that the work pieces ( 1 ) will not substantially deform and/or shift position, after the work pieces ( 1 ) have been received in the protective carrier ( 5 ).
2 . The device according to claim 1 , wherein the fluid is a wet-chemical or electrochemical processing fluid.
3 . The device according to claim 2 , wherein the means for admitting the processing fluid in the protective carrier ( 5 ) comprises at least one aperture ( 6 ) in the protective carrier ( 5 ).
4 . The device according to claim 3 , wherein the protective carrier ( 5 ) comprises side walls and a bottom wall, the apertures ( 6 ) being evenly spaced apart and distributed over the side and/or bottom walls.
5 . The device according to claim 3 , wherein the size of each aperture ( 6 ) ranges from 1 to 500 square millimeters.
6 . The device according to claim 5 , wherein the apertures ( 6 ) are provided with displaceable shutters and/or orifice plates for varying the size thereof.
7 . The device according to claim 4 , wherein the apertures ( 6 ) are not provided in the border regions of the walls of the protective carrier ( 5 ) or wherein they are smaller in diameter in the border regions and/or they are provided in a reduced number in the border regions than in the central regions for the purpose of achieving an electrical shield relative to a counter electrode.
8 . The device according to claim 4 , wherein the bottom wall has at least one drain baffle ( 27 ) or at least one drain gate.
9 . The device according to claim 2 , wherein at least one means for creating a difference in the levels of the processing fluid inside and outside the protective carrier ( 5 ) is provided, so that the processing fluid is allowed to flow into the protective carrier ( 5 ).
10 . The device according to claim 9 , wherein the means for creating the difference in the levels of the processing fluid inside and outside the protective carrier ( 5 ) comprises at least one reservoir ( 7 ) and at least one delivery system by means of which the processing fluid is circulatable from the reservoir ( 7 ) to a tank space located in the tank ( 3 ) and outside of the protective carrier ( 5 ).
11 . The device according to claim 9 , wherein the means for creating the difference in the levels of the processing fluid inside and outside the protective carrier ( 5 ) comprises at least one stationary protective carrier hoist which is associated with the tank ( 3 ) and by means of which the protective carrier ( 5 ) is conveyable into the tank ( 3 ).
12 . The device according to claim 9 , wherein the means for creating the difference in the levels inside and outside the protective carrier ( 5 ) comprises at least one protective carrier hoist which is mounted to a transport carriage for the work pieces ( 1 ) and by means of which the protective carrier ( 5 ) is conveyable into the tank ( 3 ).
13 . The device according to claim 12 , wherein the protective carrier ( 5 ) is made in at least two parts comprising a bottom baffle and two opposite side baffles which area automatically actuatable and can be opened before the protective carrier ( 5 ) is lifted out of the tank ( 3 ), the work pieces ( 1 ) remaining within the tank ( 3 ).
14 . A method of treating flat and flexible work pieces ( 1 ) with a fluid in a tank ( 3 ) comprising the following method steps:
i. receiving the work pieces ( 1 ) in a protective carrier ( 5 );
ii. conveying the protective carrier ( 5 ) to the tank ( 3 ) or disposing the protective carrier ( 5 ) in the tank ( 3 ); then
iii. filling the protective carrier ( 5 ) with the fluid in such a manner that the work pieces ( 1 ) will not substantially deform and/or shift position; and next
iv. treating the work pieces ( 1 ) with the fluid.
15 . The method according to claim 14 , wherein the fluid is a wet-chemical or electrochemical processing fluid and is supplied to the protective carrier ( 5 ) through at least one aperture ( 6 ) therein.
16 . The method according to claim 15 , wherein, for filling the protective carrier ( 5 ) with the processing fluid, a difference in the levels of the processing fluid is created inside and outside the protective carrier ( 5 ), said difference causing the processing fluid to flow into the protective carrier ( 5 ).
17 . The method according to claim 16 , wherein the difference in the levels of the processing fluid inside and outside the protective carrier ( 5 ) is created by conveying the protective carrier ( 5 ) to the tank ( 3 ) or disposing the protective carrier ( 5 ) in the tank ( 3 ) while the processing fluid is supplied to the tank ( 3 ).
18 . The method according to claim 16 , wherein the difference in the levels of the processing fluid inside and outside the protective carrier ( 5 ) is created by conveying the protective carrier ( 5 ) into the tank ( 3 ) holding the processing fluid.
19 . The method according to claim 17 , wherein the protective carrier ( 5 ) is conveyed to the tank ( 3 ) using a stationary protective carrier hoist associated with the tank ( 3 ).
20 . The method according to claim 17 , wherein the protective carrier ( 5 ) is conveyed to the tank ( 3 ) using a protective carrier hoist mounted to a transport carriage for the work pieces ( 1 ).
21 . The method according to claim 17 , wherein the processing fluid is circulated from a reservoir ( 7 ) into a tank space which is located in the tank ( 3 ) and outside the protective carrier ( 5 ).
22 . The method according to claim 15 , wherein the processing fluid is circulated through the apertures ( 6 ) of the protective carrier ( 5 ), said protective carrier ( 5 ) comprising side walls and a bottom wall and the apertures ( 6 ) being evenly spaced apart and distributed over said walls.
23 . The method according to claim 22 , wherein the apertures ( 6 ) are not provided in the border regions of the side walls of the protective carrier ( 5 ) or wherein they are smaller in diameter in the border regions and/or provided in a reduced number in the border regions for the purpose of achieving an electrical shield relative to a counter electrode.
24 . The method according to claim 22 , wherein, for filling the protective carrier ( 5 ) with fluid, the processing fluid is allowed to flow through the apertures ( 6 ) in two side walls of the protective carrier ( 5 ) only, said side walls being oriented parallel to the work pieces ( 1 ).
25 . The method according to claim 22 , for filling the protective carrier ( 5 ) with fluid, the size of the at least one aperture ( 6 ) is adjusted by means of a displaceable shutter and/or a orifice plate according to the mechanical sensitivity of the work pieces ( 1 ).
26 . The method according to claim 22 , wherein, for fast draining of the fluid from the protective carrier ( 5 ) after treatment, the bottom wall of the protective carrier ( 5 ) is provided with at least one drain baffle ( 27 ) or at least one drain gate which is opened and through which the processing fluid is allowed to exit.