Radio-frequency microelectromechanical systems and method of manufacturing such systems

1. A MEMS device comprising:

a substrate;

a first electrode at an upper surface of the substrate; and

a second electrode spaced from the first electrode by an air gap, the second electrode comprising a free-standing thin film consisting of one single layer of an alloy of aluminum and at least magnesium, wherein the magnesium content is between 0.1 and 10 atomic weight percent.

2. The MEMS device as claimed in claim 1 , wherein the alloy comprises an alloy of aluminum, magnesium and at least one further material.

3. The MEMS device as claimed in claim 2 , wherein said at least one further material comprises one or more of copper, manganese, silicon, nickel, chromium, and lithium.

4. The MEMS device as claimed in claim 3 , wherein said one further material comprises copper in an amount between 0.1 and 8 atomic weight percent.

5. The MEMS device as claimed in claim 3 , wherein the sum of the contents of magnesium, copper and manganese is between 2.5 and 10 atomic weight percent.

6. The MEMS device as claimed in claim 3 , wherein the alloy comprises an alloy selected from the group consisting of Al v Mg w Cu x Mn y , Al v Mg w Mn y , Al v Mg w Cu x Si z1 Ni z2 , Al v Mg w Cu x , Al v Mg w Cu x Si z1 , Al v Mg w Cu x Zn z3 Cr z4 , Al v Mg w Cu x Li z5 , with 80≦v≦99.8; and 0.1≦w≦8.0, 0.1≦x≦8.0, 0.1≦y≦4.0 and z1,z2,z3,z4,z5 each smaller than 20.

7. A MEMS device as claimed in claim 6 , wherein z1, z2, z3, Z4, z5 are each smaller than 5.

8. A MEMS device as claimed in claim 1 , wherein the substrate comprises a body and an insulating layer over the body, the first electrode formed over a surface of the insulating layer, wherein the first electrode is embedded in a passive network that comprises additional components.

9. A MEMS device as claimed in claim 1 , further comprising a thin film capacitor at a surface of the substrate and laterally spaced from the first electrode.

10. A method of manufacturing a MEMS device, the method comprising: forming a first electrode at an upper surface of a substrate, and forming a second electrode spaced from the first electrode by an air gap, the second electrode comprising a free standing thin film, the thin film consisting of one single layer of an alloy of aluminum and at least magnesium, wherein the magnesium content is between 0.1 and 10 atomic weight percent.

11. The method as claimed in claim 10 , wherein manufacturing the MEMS device comprises:

providing a mechanical layer of material on a sacrificial release layer;

structuring said mechanical layer to define the film; and

removing said release layer to render said film free-standing, wherein the film comprises the alloy of aluminum and at least magnesium.

12. The method according to claim 11 , wherein said release layer is patterned prior to provision of said mechanical layer thereon.

13. The method as claimed in claim 11 , wherein the alloy comprises an alloy of aluminum, magnesium and at least one further material.

14. The method as claimed in claim 13 , wherein the at least one further material comprises one or more of copper, manganese, silicon, nickel, chromium, and lithium.

15. A method as claimed in claim 14 , wherein the one further material comprises copper in an amount between 0.1 and 8 atomic weight percent.

16. A method as claimed in claim 14 , wherein the sum of the contents of magnesium, copper and manganese is between 2.5 and 10 atomic weight percent.

17. A method as claimed in claim 14 , wherein the alloy comprises an alloy selected from the group consisting of Al v Mg w Cu x Mn y , Al v Mg w Mn y , Al v Mg w Cu x Si z1 Ni z2 , Al v Mg w Cu x , Al v Mg w Cu x Si z1 , Al v Mg w Cu x Zn z3 Cr z4 , Al v Mg w Cu x Li z5 , with 80≦v≦99.8; and 0.1≦w≦8.0, 0.1≦x≦8.0, 0.1≦y≦4.0 and z1,z2,z3,z4,z5 each smaller than 20.

18. The MEMS device as claimed in claim 11 , wherein the Mg content is between 0.1 and 10 atomic weight percent.