Bonding method, device produced by this method, and bonding device
View Patent ↗Conventional heat bonding and anodic bonding require heating at high temperature and for a long time, leading to poor production efficiency and occurrence of a warp due to a difference in thermal expansion, resulting in a defective device. Such a problem is solved. An upper wafer 7 made of glass and a lower wafer 8 made of Si are surface-activated using an energy wave before performing anodic bonding, thereby performing bonding at low temperature and increasing a bonding strength. In addition, preliminary bonding due to surface activation is performed before main bonding due to anodic bonding is performed in a separate step or device, thereby increasing production efficiency, and enabling bonding of a three-layer structure without occurrence of a warp.
1. A bonding method which comprises performing anodic bonding of objects to be bonded after subjecting bonding surfaces of both the objects to be bonded to a surface activation treatment using a plasma, wherein the surface activation treatment causes OH groups to covalently adhere to the bonding surfaces, wherein the anodic bonding of the objects causes H 2 O to be released and covalent bonds to be formed between the bonding surfaces, and wherein both the objects to be bonded are heated at less than 400° C. during or after bonding.
2. The bonding method according to claim 1 , wherein both the objects to be bonded are heated at less than 400° C. to form the covalent bonds between the bonding surface.
3. The bonding method according to claim 1 , wherein after said surface activation treatment, the anodic bonding of both the objects to be bonded is performed without exposure to the atmospheric air.
4. The bonding method according to claim 3 , wherein said plasma is a low-pressure plasma, and continuously after said surface activation treatment, the objects to be bonded are contacted with each other in a vacuum in the same chamber used to perform the anodic bonding.
5. The bonding method according to claim 1 , wherein an amount of etching using said plasma is 1 nm or more.
6. The bonding method according to claim 1 , wherein, after performing preliminary bonding due to surface activation at room temperature, main bonding due to the anodic bonding is performed in a separate step or device.
7. The bonding method according to claim 6 , wherein a single step of performing said preliminary bonding is balanced with a plurality steps of performing said main bonding.
8. The bonding method according to claim 6 , wherein three or more objects to be bonded are stacked and bonded together, and objects to be bonded having the same coefficient of linear expansion sandwich an object to be bonded having a different coefficient of linear expansion from both sides thereof.
9. The bonding method according to claim 6 , wherein said preliminary bonding is performed in a low-pressure chamber under a low pressure or in a replacing gas, and said main bonding is performed in the atmospheric air.
10. The bonding method according to claim 6 , wherein said plasma is a low-pressure plasma, and continuously after said surface activation treatment, the objects to be bonded are contacted with each other in a vacuum in the same chamber used to perform said preliminary bonding.
11. The bonding method according to claim 1 , wherein, during or after said surface activation treatment using said plasma, said preliminary bonding is performed after introducing and mixing a gas containing H 2 O or H and OH groups.
12. The bonding method according to claim 1 , wherein, in said surface activation treatment using said plasma, a physical treatment using an increased ion strike force is performed and thereafter, without exposure to the atmospheric air, a chemical treatment using a reduced ion strike force is performed.
13. The bonding method according to claim 12 , wherein said physical treatment is performed using an Ar or CF 4 plasma.
14. The bonding method according to claim 12 , wherein said chemical treatment is performed using an oxygen or nitrogen plasma.
15. The bonding method according to claim 1 , wherein at least one of the objects to be bonded is made of Si or an oxide including glass, SiO 2 and ceramics.
16. A device, such as a semiconductor device, a MEMS device or the like, which is produced using the bonding method according to claim 1 and in which the object to be bonded is a wafer or a chip cut off from the wafer.
17. The bonding method according to claim 7 , wherein said preliminary bonding is performed in a low pressure chamber under a low pressure or in a replacing gas, and said main bonding is performed in the atmospheric air.
18. The bonding method according to claim 8 , wherein said preliminary bonding is performed in a low pressure chamber under a low pressure or in a replacing gas, and said main bonding is performed in the atmospheric air.
19. The bonding method according to claim 6 , wherein, during or after said surface activation treatment using said plasma, said preliminary bonding is performed after introducing and mixing a gas containing H 2 O or H and OH groups.
20. The bonding method according to claim 6 , wherein, in said surface activation treatment using said plasma, a physical treatment using an increased ion strike force is performed and thereafter, without exposure to the atmospheric air, a chemical treatment using a reduced ion strike force is performed.
21. The bonding method according to claim 6 , wherein at least one of the objects to be bonded is made of Si or an oxide including glass, SiO 2 and ceramics.
22. A device, such as a semiconductor device, a MEMS device or the like, which is produced using the bonding method according to claim 6 and in which the object to be bonded is a wafer or a chip cut off from the wafer.