Semiconductor wafer treatment member
View Patent ↗There is provided a semiconductor wafer treatment member in which the occurrence of slippage thereof is prevented and which has an adequate cohesiveness onto the semiconductor wafer and an excellent durability. The semiconductor wafer treatment member A of the present invention has at least a surface formed with a silicon carbide (SiC) film thereon, comprising a support portion for receiving a semiconductor wafer, said support portion being composed of salients with which said semiconductor wafer substantially comes into contact; and depressions formed with the silicon carbide (SiC) film to provide a coverage area between said salients, said salients being formed with top surfaces having a surface roughness Ra of 0.05 μm to 1.3 μm.
1. A semiconductor wafer treatment member having at least a surface formed with a silicon carbide (SiC) film thereon, comprising a support portion for supporting a semiconductor wafer, said support portion being composed of salients with which said semiconductor wafer substantially comes into contact; and depressions formed with the silicon carbide (SiC) film to provide a coverage area between said salients, said salients being formed with upper surfaces having a surface roughness Ra of 0.05 μm to 1.3 μm, and wherein said depressions have surfaces having a surface roughness Ra of 3 μm or more when measured for a length of 300 μm.
2. The semiconductor wafer treatment member as set forth in claim 1 , wherein said coverage area has a ratio of 20 to 90% to a total area of said depressions.
3. The semiconductor wafer treatment member as set forth in claim 1 , wherein said upper surfaces of the salients and said surfaces of the depressions have boundary portions in the form of curves.
4. The semiconductor wafer treatment member as set forth in claim 1 , wherein boundary portions connecting said upper surfaces of the salients and said surfaces of the depressions are in the form of curves.
5. The semiconductor wafer treatment member as set forth in claim 2 , wherein said upper surfaces of the salients and said surfaces of the depressions have boundary portions in the form of curves.