IP Library Granted Patent US 7,071,011
Granted Patent B2
US 7,071,011 · App. 10/707,824 · Granted Jul 4, 2006

Method of defect review

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Quick Facts
Patent No.
US 7,071,011
App. No.
10/707,824
Granted
Jul 4, 2006
Kind
B2
Abstract

A method of defect review. First, a wafer with a plurality of defects is provided. A defect inspection is performed to detect the defects. An automatic defect classification is then performed to divide the defects into different defect types according to a predetermined database. A defect review is performed to review different defect types of defects which are sampled in different weights according to yield killing ratios of each defect types.

Claims (14)

1. A method of defect review comprising following steps:

providing a wafer with a plurality of defects;

performing a defect inspection to detect the defects;

performing an automatic defect classification according to a database to separate the defects into a plurality of defect types;

adjusting sampling ratios according to an influence degree each defect type has on process yield; and

performing a defect review using the adjusted sampling ratios.

2. The method of claim 1 wherein the database comprises information about the plurality of defect types and defect information corresponding to each defect type.

3. The method of claim 2 wherein the defect information comprises the influence degree of the process yield of each defect type.

4. The method of claim 3 wherein the database separates the defect types into killer defects and non-killer defects according to the influence degree of the process yield.

5. The method of claim 4 wherein the sampling ratio of the killer defects in the defect review is larger than that of the non-killer defects.

6. The method of claim 3 wherein the database separates the defects into pre-layer defects and adding defects, and further separates the adding defects into killer defects and non-killer defects.

7. The method of claim 6 wherein the defect review focuses on the adding defects.

8. The method of claim 1 wherein after finishing the defect inspection, a judgment of cluster defects is performed and a defect review with a high sampling ratio is performed on the cluster defects if the cluster defects exist.

9. The method of claim 1 wherein the database is updated according to the result of the defect review after finishing the defect review.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 12, 2019
From: POWERCHIP TECHNOLOGY CORPORATION
To: POWERCHIP SEMICONDUCTOR MANUFACTURING CORPORATION
Reel/Frame 049732/0147 →
CHANGE OF NAME Recorded Jun 24, 2019
From: POWERCHIP SEMICONDUCTOR CORP.
To: POWERCHIP TECHNOLOGY CORPORATION
Reel/Frame 049562/0151 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 15, 2004
From: LIN, LONG-HUI
To: POWERCHIP SEMICONDUCTOR CORP.
Reel/Frame 014273/0921 →