Charged particle source and operation thereof
View Patent ↗A charged particle source utilizes a novel plasma processing chamber, RF coil and ion optics, to achieve high uniformity. The plasma processing chamber has a re-entrant vessel which is movable, and which includes extensions of adjustable shape or position, to make more uniform the plasma contained within the chamber. One or more magnets, which may be static or moving, may be included within the re-entrant vessel. The ion optics include a grid with a number of apertures, and tuning features each surrounding an aperture. These tuning features either reduce the diameter of the associated aperture, or increase the length of that aperture, to create more uniform beamlets emerging from the grid. The RF coil includes a flux concentrator positioned adjacent to the winding in at least one angular region thereof to tune the magnetic field produced thereby.
1. A plasma processing apparatus, comprising:
an evacuated chamber for containing a plasma,
a radio frequency source for exciting said plasma using radio frequency energy, and
a re-entrant vessel positioned within the chamber to shape and make more uniform said plasma contained within the chamber,
wherein the re-entrant vessel is movable within the chamber in at least a first direction to adjust the plasma uniformity, and the re-entrant vessel includes extensions of adjustable shape or position, which is altered to further adjust and unify said plasma within said chamber.
2. The apparatus of claim 1 , further comprising a radio frequency emitting coil within said re-entrant vessel.
3. The ion source of claim 1 further comprising an optical grid within the chamber having a plurality of apertures, ions from the plasma passing through said apertures of said optical grid.
4. An ion source for bombarding a substrate, comprising
an evacuated chamber for containing a plasma,
an optical grid within the chamber having a plurality of apertures, ions from the plasma passing through said apertures of said optical grid to bombard said substrate,
a radio frequency source for exciting said plasma using radio frequency energy,
a re-entrant vessel, positioned within the chamber to shape and make more uniform said plasma contained within the chamber,
one or more magnets, positioned within the re-entrant vessel, and
an actuator for moving said magnets.
5. The apparatus of claim 1 or 4 wherein said re-entrant vessel is not evacuated.
6. The ion source of claim 4 wherein the re-entrant vessel is movable within the chamber in at least a first direction to adjust the plasma uniformity.
7. The ion source of claim 4 wherein the re-entrant vessel includes extensions of adjustable shape or position, which is altered to further adjust and unify said plasma within said chamber.
8. The ion source of claim 4 further comprising a radio frequency emitting coil within said re-entrant vessel.