IP Library Assignment 058533/0321
Patent Assignment
Reel/Frame 058533/0321

Patent Security Agreement

Recorded: 2021-12-16 Pages: 69
Assignor
VEECO INSTRUMENTS INC.
Executed: 2021-12-16
Assignee
HSBC BANK USA, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
95 WASHINGTON STREET, FLOOR 2SOUTH, BUFFALO, NEW YORK, 14203
Covered Properties (212)
Ion Beam Deposition of a Low Resistivity Metal
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Apparatus and Method for Die Stack Flux Removal
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Enhanced Cathodic Arc Source for Arc Plasma Deposition
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Molecular Beam Epitaxy Systems with Variable Substrate-to-Source Arrangements
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Publication: US US20210115588A1
CVD Reactor Single Substrate Carrier and Rotating Tube for Stable Rotation
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Publication: US US20210095374A1
Melt Detection Systems and Methods of Using the Same
Application: 16/946,648 →
Publication: US US20210013070A1
Deposition System with Integrated Carrier Cleaning Modules
Application: 16/870,110 →
Publication: US US20200354828A1
Rotating Disk Reactor with Self-Locking Carrier-to-Support Interface for Chemical Vapor Deposition
Application: 16/752,661 →
Publication: US US20200248307A1
Semiconductor Wafer Processing Chamber
Application: 16/656,037 →
Publication: US US20200161146A1
System and Method for Self-Cleaning Wet Treatment Process
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Publication: US US20200013641A1
High Pressure Spray Head
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Publication: US US20190381533A1
High-Efficiency Line-Forming Optical Systems and Methods Using A Serrated Spatial Filter
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Publication: US US20190339536A1
Chemical Vapor Deposition Apparatus with Multi-Zone Injection Block
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Publication: US US20190316258A1
Wafer Carrier Having Retention Pockets with Compound Radii for Chemical Vapor Deposition Systems
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Publication: US US20190169745A1
Semiconductor Wafer Processing Chamber
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Publication: US US20180308718A1
Ion Beam Deposition of a Low Resistivity Metal
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Publication: US US20210404051A1
Automated Batch Production Thin Film Deposition Systems and Methods of Using the Same
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Publication: US US20220076976A1
Reactor with Centering Pin for Epitaxial Deposition
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Publication: US US20220068700A1
Wafer Carrier Assembly with Pedestal and Cover Restraint Arrangements That Control Thermal Gaps
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Adaptive Controller for Ion Source
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Grid Transparency and Grid Hole Pattern Control for Ion Beam Uniformity
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Grid Transparency and Grid Hole Pattern Control for Ion Beam Uniformity
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Grid Providing Beamlet Steering
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Fault Tolerant Ion Source Power System
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Fluid-Cooled Ion Source
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Minimal Force Air Bearing for Lapping Tool
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Bridge Row Tool
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Apparatus for Cathodic Vacuum-Arc Coating Deposition
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Charged Particle Source and Operation Thereof
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Ion Sources and Methods for Generating an Ion Beam with a Controllable Ion Current Density Distribution
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Methods of Operating an Electromagnet of an Ion Source
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Ion Sources and Methods for Generating an Ion Beam with Controllable Ion Current Density Distribution
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Method and Apparatus for Controlling Film Profiles on Topographic Features
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Method and Apparatus for Surface Processing of a Substrate
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Pulsed Operation of Hall-Current Ion Sources
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Film Deposition Assisted by Angular Selective Etch on a Surface
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Method for Increased Target Utilization in Ion Beam Deposition Tools
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Ion Beam Etching of Stt-Ram Structures
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Ion Sources and Methods for Generating Ion Beams with Controllable Ion Current Density Distributions Over Large Treatment Areas
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Ion Beam Materials Processing System with Grid Short Clearing System for Gridded Ion Beam Source
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Ion Beam Etching
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Vapor Deposition Systems and Methods
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Vapor Deposition Systems and Methods
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Reaction Chamber with Removable Liner
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System and Method for Thin Film Deposition
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Ald Systems and Methods
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Formation of Heteroepitaxial Layers with Rapid Thermal Processing to Remove Lattice Dislocations
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Plasma Enhanced Ald System
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Method and Apparatus for Forming Device Quality Gallium Nitride Layers on Silicon Substrates
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Laser-Assisted Atomic Layer Deposition of 2D Metal Chalcogenide Films
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Methods of forming an ALD-inhibiting layer using a self-assembled monolayer
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Chuck Systems and Methods Having Enhanced Electrical Isolation For Substrate-Biased ALD
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Transportable Semiconductor Wafer Rack
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Transportable Semiconductor Wafer Rack
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Deposition of High Vapor Pressure Materials
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Vacuum Deposition Sources Having Heated Effusion Orifices
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Electrical Contacts for Use with Vacuum Deposition Sources
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Electrical Contacts for Use with Vacuum Deposition Sources
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Thermally Isolated Cryopanel for Vacuum Deposition Systems
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Bellows-Free Retractable Vacuum Deposition Sources
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Density-matching alkyl push flow for vertical flow rotating disk reactors
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Publication: US US20070134419A1
Alkyl Push Flow for Vertical Flow Rotating Disk Reactors
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Publication: US US20180237943A1
Chemical Vapor Deposition Flow Inlet Elements and Methods
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Publication: US US20140116330A1
Chemical Vapor Deposition Flow Inlet Elements and Methods
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Publication: US US20100143588A1
Gas Treatment Systems
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Publication: US US20080173735A1
Gas Treatment Systems
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Publication: US US20110091648A1
Method and Apparatus for Measuring the Curvature of Reflective Surfaces
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Publication: US US20050286058A1
Method for Improving Performance of a Substrate Carrier
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Publication: US US20110129947A1
Method For Improving Performance Of A Substrate Carrier
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Method For Improving Performance Of A Substrate Carrier
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Processing Methods and Apparatus with Temperature Distribution Control
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Processing Methods and Apparatus with Temperature Distribution Control
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Reactor Having a Movable Shutter
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Reactor Having a Movable Shutter
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Wafer Carrier with Sloped Edge
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Exhaust for Cvd Reactor
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Gas Injection System for Chemical Vapor Deposition Using Sequenced Valves
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Methods and Systems for in-Situ Pyrometer Calibration
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Wafer Processing with Carrier Extension
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Methods of Wafer Processing with Carrier Extension
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Publication: US US20160251758A1
Heated Wafer Carrier Profiling
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Keyed Wafer Carrier
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Rotating Disk Reactor with Ferrofluid Seal for Chemical Vapor Deposition
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Radiation Thermometer Using Off-Focus Telecentric Optics
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Control of Stray Radiation in a Cvd Chamber
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Control of Stray Radiation In A CVD Chamber
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TEMPERATURE CONTROL FOR GaN BASED MATERIALS
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Wafter Carrier for Chemical Vapor Deposition Systems
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Apparatus and Method for Improved Acoustical Transformation
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Self-Cleaning Shutter for Cvd Reactor
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Wafer Carrier Having Provisions for Improving Heating Uniformity in Chemical Vapor Deposition Systems
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Terminal for Mechanical Support of a Heating Element
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Wafer Carrier Having Thermal Cover for Chemical Vapor Deposition Systems
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Wafer Carrier Having Retention Pockets with Compound Radii for Chemical Vapor Desposition Systems
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Enhanced Enclosures for Acoustical Gas Concentration Sensing and Flow Control
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Wafer Carrier with a 31-Pocket Configuration
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Wafer Carrier with a 14-Pocket Configuration
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Wafer Carrier with a 14-Pocket Configuration
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Wafer Carrier with a Multi-Pocket Configuration
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Wafer Carrier with a Multi-Pocket Configuration
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Self-Centering Wafer Carrier System for Chemical Vapor Deposition
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Periphery Purge Shutter and Flow Control Systems and Methods
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Gas Concentration Sensors and Systems
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Wafer Handling Assembly
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Seal for Wafer Processing Assembly
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Filter Element for Wafer Processing Assembly
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Chemical Vapor Deposition Wafer Carrier with Thermal Cover
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Chemical Vapor Deposition Wafer Carrier with Thermal Cover
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Chemical Vapor Deposition Wafer Carrier with Thermal Cover
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Chemical Vapor Deposition Wafer Carrier with Thermal Cover
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Chemical Vapor Deposition Wafer Carrier with Thermal Cover
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Micro-LED Transfer Methods Using Light-Based Debonding
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Mid-Filament Spacer
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Multi-Filament Heater Assembly
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Keyed Wafer Carrier
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Multi-Keyed Wafer Carrier
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Multi-Keyed Spindle
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Keyed Spindle
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Keyed Spindle
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Spindle Key
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Spindle Key
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Wafer Carrier Having Pockets
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Wafer Carrier Having Pockets
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Wafer Carrier Having Pockets
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Wafer Carrier Having Pockets
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Wafer Carrier Having Pockets
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Self-Centering Wafer Carrier For Chemical Vapor Deposition
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Wafer Carrier with a 33-Pocket Configuration
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System and Method for Performing a Wet Etching Process
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Apparatus and Method to Remove Undissolved Solids from Post Process Dry Film Strip Solvents
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Collection Chamber Apparatus to Separate Multiple Fluids During the Semiconductor Wafer Processing Cycle
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Collection Chamber Apparatus to Separate Multiple Fluids During the Semiconductor Wafer Processing Cycle
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Apparatus for Dual Speed Spin Chuck
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Apparatus and Method to Reduce and Control Resistivity of Deionized Water
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Method of Etching the Back of a Wafer to Expose Tsvs
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Two Etch Method for Achieving a Wafer Thickness Profile
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Silicon Germanium Heterojunction Bipolar Transistor Structure and Method
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Improvements in Grounding and Thermal Dissipation for Integrated Circuit Packages
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Selective Filling of Electrically Conductive Vias for Three Dimensional Device Structures
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Method for Forming Solder Connections on a Circuitized Substrate
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Selective C4 Connection in Ic Packaging
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Method of Forming a Lead-Free Tin-Silver-Copper Based Solder Alloy on an Electronic Substrate.
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Negative Volume Expansion Lead-Free Electrical Connection
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Ball Grid Array Module and Method of Manufacturing Same
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Dual-Solder Flip-Chip Solder Bump
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Lead-Free Alloys for Column/Ball Grid Arrays, Organic Interposers and Passive Component Assembly
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Through Silicon via Lithographic Alignment and Registration
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Unit magnification large-format catadioptric lens for microlithography
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Wafer Chuck Apparatus With Micro-Channel Regions
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Laser Thermal Annealing of Lightly Doped Silicon Substrates
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Laser Thermal Annealing of Lightly Doped Silicon Substrates
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Substrate Processing with Reduced Warpage and/or Controlled Strain
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Activating Gan Leds by Laser Spike Annealing and Flash Annealing
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Two-Beam Laser Annealing with Improved Temperature Performance
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Two-Beam Laser Annealing with Improved Temperature Performance
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Related Assignments (19)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Apr 15, 2015
From: KRISHNAN, SANDEEP; MOY, KENG; GURARY, ALEXANDER I.; KING, MATTHEW
To: VEECO INSTRUMENTS INC.
Reel/Frame 035414/0004 →
Assignment of Assignor's Interest Jul 16, 2018
From: BREINGAN, WILLIAM GILBERT; HOFMEISTER, CHRIS; RAPOPORT, LEV; TADDEI, JOHN
To: VEECO PRECISION SURFACE PROCESSING LLC
Reel/Frame 046355/0631 →
Assignment of Assignor's Interest Jul 15, 2019
From: ANIKITCHEV, SERGEUI
To: ULTRATECH, INC.
Reel/Frame 049749/0275 →
Assignment of Assignor's Interest Jul 16, 2019
From: HONIGMAN, STEVEN; NULMAN, KENJI
To: VEECO PRECISION SURFACE PROCESSING LLC
Reel/Frame 049766/0930 →
Assignment of Assignor's Interest Dec 4, 2019
From: NULMAN, KENJI MICHAEL; YANNUZZI, MARK; TYLER, PHILLIP; FIJAL, JONATHAN
To: VEECO PRECISION SURFACE PROCESSING LLC
Reel/Frame 051178/0736 →
Assignment of Assignor's Interest Dec 30, 2019
From: ULTRATECH, INC.
To: VEECO INSTRUMENTS INC.
Reel/Frame 051446/0476 →
Assignment of Assignor's Interest Dec 30, 2019
From: VEECO PRECISION SURFACE PROCESSING LLC
To: VEECO INSTRUMENTS INC.
Reel/Frame 051383/0549 →
Assignment of Assignor's Interest Feb 5, 2020
From: GOLDBERG, DAVID; BIRD, SIMON; BREINGAN, WILLIAM GILBERT; TADDEI, JOHN
To: VEECO PRECISION SURFACE PROCESSING LLC
Reel/Frame 051723/0057 →
Assignment of Assignor's Interest Jun 30, 2020
From: REED, MATTHEW EARL WALLACE
To: VEECO INSTRUMENTS INC.
Reel/Frame 053090/0042 →
Assignment of Assignor's Interest Nov 23, 2020
From: DRUZ, BORIS L.; KANAROV, VIKTOR; YEVTUKHOV, YURIY N.; KOHLI, SANDEEP
To: VEECO INSTRUMENTS INC.
Reel/Frame 054442/0864 →
Assignment of Assignor's Interest Feb 19, 2021
From: TADDEI, JOHN; NULMAN, KENJI; FIJAL, JONATHAN; TYLER, PHILLIP
To: VEECO INSTRUMENTS INC.
Reel/Frame 055334/0511 →
Assignment of Assignor's Interest Mar 11, 2021
From: SRINIVASAN, NARASIMHAN; HENRY, TANIA; CERIO, FRANK; TURNER, PAUL
To: VEECO INSTRUMENTS INC.
Reel/Frame 055560/0613 →
Assignment of Assignor's Interest Aug 17, 2021
From: PACIER, MICHAEL W; SERSHEN, MICHAEL J; BERTUCH, ADAM F; LECORDIER, LAURENT
To: VEECO INSTRUMENTS INC.
Reel/Frame 057205/0349 →
Assignment of Assignor's Interest Sep 2, 2021
From: KRISHNAN, SANDEEP; URBAN, LUKAS
To: VEECO INSTRUMENTS INC.
Reel/Frame 057370/0005 →
Assignment of Assignor's Interest Sep 14, 2021
From: SRINIVASAN, NARASIMHAN; HENRY, TANIA; CERIO, FRANK; TURNER, PAUL
To: VEECO INSTRUMENTS INC.
Reel/Frame 057481/0020 →
Assignment of Assignor's Interest Mar 29, 2022
From: MITROVIC, BOJAN; KUNSCH, IAN; GAMARRA, JUAN; DESHPANDE, MANDAR
To: VEECO INSTRUMENTS INC.
Reel/Frame 059429/0949 →
Assignment of Assignor's Interest Nov 29, 2022
From: GURARY, ALEXANDER I.; DESHPANDE, MANDAR; PARANJPE, AJIT
To: VEECO INSTRUMENTS INC.
Reel/Frame 061909/0563 →
Security Interest Jun 16, 2025
From: VEECO INSTRUMENTS INC.
To: HSBC BANK USA, NATIONAL ASSOCIATION
Reel/Frame 071649/0225 →
Security Interest Feb 13, 2026
From: VEECO INSTRUMENTS INC.
To: HSBC BANK USA, NATIONAL ASSOCIATION
Reel/Frame 073780/0494 →