Laser thermal annealing of lightly doped silicon substrates
View Patent ↗Apparatus and method for performing laser thermal annealing (LTA) of a substrate using an annealing radiation beam that is not substantially absorbed in the substrate at room temperature. The method takes advantage of the fact that the absorption of long wavelength radiation (1 micron or greater) in some substrates, such as undoped silicon substrates, is a strong function of temperature. The method includes heating the substrate to a critical temperature where the absorption of long-wavelength annealing radiation is substantial, and then irradiating the substrate with the annealing radiation to generate a temperature capable of annealing the substrate.
1. An apparatus for preheating a substrate having a surface in order to perform laser thermal annealing of the substrate with an annealing radiation beam that is not substantially absorbed by the substrate at room temperature, the apparatus comprising:
a preheating radiation source adapted to emit preheating radiation that is substantially absorbed by the substrate at room temperature;
a relay lens adapted to receive the preheating radiation from said preheating radiation source and form a preheating radiation beam that forms a first image at the substrate, wherein the first image is scanned over the substrate surface to preheat a portion of the surface that is in front of or that partially overlaps with a scanned second image formed by the annealing radiation beam; and
a recycling optical system arranged to receive preheating radiation reflected from the substrate and direct the reflected preheating radiation back to the substrate as a recycled radiation beam.
2. The apparatus of claim 1 , wherein the recycling optical system includes a collecting/focusing lens and a corner cube reflector.
3. The apparatus of claim 2 , wherein the recycled radiation beam and the preheating radiation beam have respective incident angles, the recycling optical system has an optical axis, and wherein the corner cube reflector is displaced relative to the optical axis so as to at least partially separate the incidence angles of the recycled and preheating radiation beams.
4. The apparatus of claim 1 , wherein the recycling optical system includes a telecentric relay and a diffraction grating.
5. An apparatus for preheating a substrate having a surface in order to perform laser thermal annealing of the substrate with an annealing radiation beam that is not substantially absorbed by the substrate at room temperature, the apparatus comprising:
first and second preheating optical systems each arranged to irradiate a portion of the substrate with respective first and second preheating radiation beams each having a wavelength that is substantially absorbed by the substrate at room temperature; and
wherein said first and second preheating radiation beams form respective first and second scanned images that are maintained ahead of a third scanned image formed by the annealing radiation beam when the preheating radiation beams and the annealing radiation beam are scanned relative to the substrate surface.
6. The apparatus of claim 5 , wherein first and second preheating radiation beams are p-polarized and intercept the substrate surface at an angle that minimizes variation in absorption from structures present on the substrate surface.
7. The apparatus of claim 5 , wherein first and second preheating radiation beams have equal and opposite incident angles.
8. An apparatus for preheating a substrate having a surface in order to perform laser thermal annealing of the substrate with an annealing radiation beam that is not substantially absorbed by the substrate at room temperature, the apparatus comprising:
multiple preheating optical systems each arranged to irradiate a portion of the substrate with multiple preheating radiation beams each having a wavelength that is substantially absorbed by the substrate at room temperature; and
wherein said multiple preheating radiation beams form respective images that are maintained ahead of an annealing radiation beam image when the preheating radiation beams and the annealing radiation beam are scanned relative to the substrate surface.