Two-level tape frame rinse assembly

1. A two-level tape frame rinse assembly for use in processing a wafer comprising:

a rotatable chuck assembly,

a plurality of grippers associated with the chuck assembly for selectively grasping the wafer, each gripper having a pivotable gripper finger, each gripper finger being movable between an open position and a closed position; the grippers including a plurality of lifter pins each being movable between an up position and a down position, the plurality of grippers being spaced circumferentially;

a rotatable backside support plate associated with the chuck assembly for supporting the wafer, the backside support plate having a plurality of openings formed therethrough, the backside support plate being disposed internally between the plurality of grippers; and

an annular shaped frame on which the grippers are disposed and fixed, the rotatable backside support plate being disposed internally within the annular shaped frame, each gripper protruding upwardly from the annular shaped frame, wherein the annular shaped frame is connected to a center hub by a plurality of spoke shaped supports;

wherein in a first wafer position, the lifter pins are in the up position for supporting the wafer such that a gap is formed between a backside of the wafer and a top surface of the backside support plate,

wherein in a second wafer position, the lifter pins are in the down position for allowing the wafer to seat against and be supported by the backside support plate;

wherein in a third wafer position, the lifter pins are in the down position and the gripper fingers are in the closed position for grasping the wafer such that the gap is formed between the backside of the wafer and the top surface of the backside support plate to allow for a rinse tool to pass through one opening of the backside support plate and treat the backside of the wafer.

2. The two-level tape frame rinse assembly of claim 1 , wherein each gripper finger is connected to a linkage that is coupled to a first actuator such that movement of the first actuator is translated into the gripper finger moving between the open position and the closed position.

3. The two-level tape frame rinse assembly of claim 1 , wherein each gripper finger includes a notch formed along an inner side edge thereof that faces the backside support plate and is located proximate a distal end thereof, the notch being configured to receive a peripheral edge of the wafer for locking and holding the wafer in place.

4. The two-level tape frame rinse assembly of claim 1 , wherein the lifter pins are independently operable relative to the gripper fingers.

5. The two-level tape frame rinse assembly of claim 1 , wherein in the second wafer position, the gripper fingers contact and hold a peripheral edge of the wafer.

6. The two-level tape frame rinse assembly of claim 1 , wherein the backside support plate is formed of a flexible material and is disposed on and fixed to a rigid support substrate that includes a plurality of holes that are in alignment with the plurality of openings formed in the backside support plate.

7. The two-level tape frame rinse assembly of claim 1 , wherein the lifter pins are located radially inward relative to the gripper fingers.

8. A two-level tape frame rinse assembly for use in processing a wafer comprising:

a rotatable chuck assembly,

a plurality of grippers associated with the chuck assembly for selectively grasping the wafer, each gripper having a pivotable gripper finger, each gripper finger being movable between an open position and a closed position; the grippers including a plurality of lifter pins each being movable between an up position and a down position, the plurality of grippers being spaced circumferentially; and

a rotatable backside support plate associated with the chuck assembly for supporting the wafer, the backside support plate having a plurality of openings formed therethrough, the backside support plate being disposed internally between the plurality of grippers;

wherein in a first wafer position, the lifter pins are in the up position for supporting the wafer such that a gap is formed between a backside of the wafer and a top surface of the backside support plate,

wherein in a second wafer position, the lifter pins are in the down position for allowing the wafer to seat against and be supported by the backside support plate;

wherein in a third wafer position, the lifter pins are in the down position and the gripper fingers are in the closed position for grasping the wafer such that the gap is formed between the backside of the wafer and the top surface of the backside support plate to allow for a rinse tool to pass through one opening of the backside support plate and treat the backside of the wafer; wherein the pivotable gripper finger protrudes upwardly from a top surface of the gripper and each gripper includes one or more of the lifter pins that protrude upwardly from the top surface in at least the up position.

9. The two-level tape frame rinse assembly of claim 8 , wherein the top surface further includes one or more upstanding fixed supports that support the wafer when the wafer is in the second wafer position.

10. A two-level tape frame rinse assembly for use in processing a wafer comprising:

a rotatable chuck assembly,

a plurality of grippers associated with the chuck assembly for selectively grasping the wafer, each gripper having a pivotable gripper finger, each gripper finger being movable between an open position and a closed position; the grippers including a plurality of lifter pins each being movable between an up position and a down position, the plurality of grippers being spaced circumferentially; and

a rotatable backside support plate associated with the chuck assembly for supporting the wafer, the backside support plate having a plurality of openings formed therethrough, the backside support plate being disposed internally between the plurality of grippers;

wherein in a first wafer position, the lifter pins are in the up position for supporting the wafer such that a gap is formed between a backside of the wafer and a top surface of the backside support plate,

wherein in a second wafer position, the lifter pins are in the down position for allowing the wafer to seat against and be supported by the backside support plate;

wherein in a third wafer position, the lifter pins are in the down position and the gripper fingers are in the closed position for grasping the wafer such that the gap is formed between the backside of the wafer and the top surface of the backside support plate to allow for a rinse tool to pass through one opening of the backside support plate and treat the backside of the wafer;

wherein each gripper finger is connected to a linkage that is coupled to a first actuator such that movement of the first actuator is translated into the gripper finger moving between the open position and the closed position; wherein movement of the first actuator in a first direction toward a center hub of the chuck assembly causes a respective gripper finger to move to the closed position, while movement of the actuator in a second direction away from the center hub causes the respective gripper finger to move to the open position.

11. The two-level tape frame rinse assembly of claim 10 , wherein the first actuator is coupled to a drive rod that is centrally disposed within the center hub, whereby upward movement of the drive rod toward the center hub causes the first actuator to move in the first direction and downward movement of the drive rod away from the center hub causes the first actuator to move in the second direction.

12. A two-level tape frame rinse assembly for use in processing a wafer comprising:

a rotatable chuck assembly,

a plurality of grippers associated with the chuck assembly for selectively grasping the wafer, each gripper having a pivotable gripper finger, each gripper finger being movable between an open position and a closed position; the grippers including a plurality of lifter pins each being movable between an up position and a down position, the plurality of grippers being spaced circumferentially; and

a rotatable backside support plate associated with the chuck assembly for supporting the wafer, the backside support plate having a plurality of openings formed therethrough, the backside support plate being disposed internally between the plurality of grippers;

wherein in a first wafer position, the lifter pins are in the up position for supporting the wafer such that a gap is formed between a backside of the wafer and a top surface of the backside support plate,

wherein in a second wafer position, the lifter pins are in the down position for allowing the wafer to seat against and be supported by the backside support plate;

wherein in a third wafer position, the lifter pins are in the down position and the gripper fingers are in the closed position for grasping the wafer such that the gap is formed between the backside of the wafer and the top surface of the backside support plate to allow for a rinse tool to pass through one opening of the backside support plate and treat the backside of the wafer;

wherein the plurality of openings are circumferentially spaced apart and are defined by angled side walls to permit a tool to be inserted therethrough at an angle other than 90 degrees relative to the backside support plate.

13. The two-level tape frame rinse assembly of claim 12 , wherein the openings are spaced radially about a center of the backside support plate.

14. A two-level tape frame rinse assembly for use in processing a wafer comprising:

a rotatable chuck assembly,

a plurality of grippers associated with the chuck assembly for selectively grasping the wafer, each gripper having a pivotable gripper finger, each gripper finger being movable between an open position and a closed position; the grippers including a plurality of lifter pins each being movable between an up position and a down position, the plurality of grippers being spaced circumferentially;

a rotatable backside support plate associated with the chuck assembly for supporting the wafer, the backside support plate having a plurality of openings formed therethrough, the backside support plate being disposed internally between the plurality of grippers; and

fixed protrusions that protrude upwardly from top surfaces of the grippers, wherein in the second wafer position, the wafer rests on the fixed protrusions;

wherein in a first wafer position, the lifter pins are in the up position for supporting the wafer such that a gap is formed between a backside of the wafer and a top surface of the backside support plate,

wherein in a second wafer position, the lifter pins are in the down position for allowing the wafer to seat against and be supported by the backside support plate;

wherein in a third wafer position, the lifter pins are in the down position and the gripper fingers are in the closed position for grasping the wafer such that the gap is formed between the backside of the wafer and the top surface of the backside support plate to allow for a rinse tool to pass through one opening of the backside support plate and treat the backside of the wafer.