IP Library Granted Patent US 8,303,713
Granted Patent B2
US 8,303,713 · App. 12/631,079 · Granted Nov 6, 2012

Chemical vapor deposition flow inlet elements and methods

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Quick Facts
Patent No.
US 8,303,713
App. No.
12/631,079
Granted
Nov 6, 2012
Kind
B2
Abstract

A flow inlet element ( 22 ) for a chemical vapor deposition reactor ( 10 ) is formed from a plurality of elongated tubular elements ( 64, 65 ) extending side-by-side with one another in a plane transverse to the upstream to downstream direction of the reactor. The tubular elements have inlets for ejecting gas in the downstream direction. A wafer carrier ( 14 ) rotates around an upstream to downstream axis. The gas distribution elements may provide a pattern of gas distribution which is asymmetrical with respect to a medial plane ( 108 ) extending through the axis.

Claims (6)

1. A flow inlet element for a chemical vapor deposition reactor comprising a structure having a downstream side and defining a downstream direction away from the downstream side, the structure defining a plurality of elongated base gas inlets open in the downstream direction and extending parallel to one another in an X horizontal direction perpendicular to the downstream direction, the base gas inlets being spaced apart from one another in a Y horizontal direction perpendicular to the X horizontal direction, the structure further including a plurality of elongated diffusers projecting downstream from the base gas outlets extending parallel to one another in the X horizontal direction between the base gas inlets, the diffusers tapering so that the dimension of each diffuser in the Y horizontal direction diminishes in the downstream direction to an edge downstream from the base gas outlets, at least some of the diffusers having additional gas inlets with openings at the edges of the diffusers.

2. A flow inlet element as claimed in claim 1 wherein each diffuser includes at least one coolant passage extending in the X direction within such diffuser, and wherein the structure includes a gas distribution channel extending in the X direction associated with each diffuser, the gas distribution channels being disposed upstream from the coolant passages and communicating with the additional gas inlets.

3. A flow inlet element as claimed in claim 2 wherein each diffuser has two coolant passages spaced apart from one another in the Y direction, and one or more connecting passages extending from the gas distribution channel associated with the diffuser to the opening of the additional gas inlet of the diffuser, the connecting passages of each diffuser extending between the coolant passages of such diffuser.

4. A flow inlet element as claimed in claim 3 wherein the structure defines an active region including the base gas inlets and additional gas inlets and one or more manifolds horizontally offset from the active region, at least some of the tubular elements extending to the one or more manifolds.

5. A flow inlet element as claimed in claim 2 wherein the structure includes a tubular element associated with each of the diffusers, the tubular element associated with each diffuser defining the gas distribution channel associated with such diffuser and structurally supporting such diffuser, the tubular elements extending parallel to one another in the X direction.

6. A flow inlet element as claimed in claim 5 wherein the base gas inlets extend between adjacent ones of the tubular elements.

Assignments (3)
SECURITY INTEREST Recorded Jun 16, 2025
From: VEECO INSTRUMENTS INC.
To: HSBC BANK USA, NATIONAL ASSOCIATION
Reel/Frame 071649/0225 →
PATENT SECURITY AGREEMENT Recorded Dec 16, 2021
From: VEECO INSTRUMENTS INC.
To: HSBC BANK USA, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 058533/0321 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 24, 2010
From: BELOUSOV, MIKHAIL; MITROVIC, BOJAN; MOY, KENG
To: VEECO INSTRUMENTS INC.
Reel/Frame 023988/0307 →