Vacuum deposition sources having heated effusion orifices
View Patent ↗The present invention provides deposition sources that can efficiently and controllably provide vaporized material for deposition of thin film materials. Deposition sources described herein can be used to deposit any desired material and are particularly useful for depositing high melting point materials at high evaporation rates. An exemplary application for deposition sources of the present invention is deposition of copper, indium, and gallium in the manufacture of copper indium gallium diselenide based photovoltaic devices.
1. A vacuum deposition source comprising:
a base flange configured to mount the vacuum deposition source to a vacuum chamber;
a crucible operatively supported relative to the base flange and configured to hold vacuum deposition material, the crucible comprising a cylindrical body portion, a conical portion, and an effusion orifice;
a heater operatively supported relative to the base flange and at least partially surrounding the crucible, the heater comprising a cylindrical body portion configured and positioned to provide thermal radiation to at least a portion of the cylindrical body portion of the crucible, the heater comprising a layered structure comprising a pyrolytic graphite electrically resistive layer positioned between pyrolytic boron nitride electrically insulative layers; and
a cooling enclosure operatively attached to the base flange at a first end of the cooling enclosure and extending along and at least partially surrounding the heater and the crucible, the cooling enclosure having an internal surface,
wherein the internal surface of the cooling enclosure is spaced from the heater by plural support elements each providing plural openings circumferentially spaced from one another along each of the support elements that the openings and space between the heater and the internal surface of the cooling enclosure define an annular conductance channel.
2. The vacuum deposition source of claim 1 , wherein the crucible comprises pyrolytic boron nitride.
3. The vacuum deposition source of claim 1 , wherein the crucible comprises a second conical portion.
4. The vacuum deposition source of claim 1 , comprising a crucible support assembly comprising a support flange removably mounted to the base flange and a crucible support cup supported relative to the support flange, wherein an end of the crucible opposite the effusion orifice is supported by the support cup.
5. The vacuum deposition source of claim 4 , wherein the crucible support assembly comprises an adjustment device configured to adjust the distance between the support flange and the support cup.
6. The vacuum deposition source of claim 1 , comprising a heater support assembly having a support base operatively supported relative to the base flange and engaged with an end of the heater.
7. The vacuum deposition source of claim 6 , wherein the heater support assembly comprises an adjustment device configured to adjust the distance between the base flange and the support base.
8. The vacuum deposition source of claim 1 , comprising a liquid cooling enclosure operatively attached to the base flange at a first end of the liquid cooling enclosure and at least partially surrounding the crucible.
9. The vacuum deposition source of claim 8 , comprising a conical cover positioned at a second end of the liquid cooling enclosure opposite the first end of the liquid cooling enclosure, the conical cover comprising an opening at an end of the conical cover positioned relative to an end of the crucible and an end of the conical portion of the heater.
10. The vacuum deposition source of claim 9 , wherein the conical cover comprises pyrolytic boron nitride.
11. The vacuum deposition source of claim 9 , comprising plural layers of conical heat shielding material positioned adjacent to the conical cover.
12. The vacuum deposition source of claim 9 , wherein the end of the conical portion of the heater extends past the end of the conical cover.
13. The vacuum deposition source of claim 9 , wherein the end of the crucible extends past the end of the conical portion of the heater.
14. A vacuum deposition source comprising:
a base flange configured to mount the vacuum deposition source to a vacuum chamber;
a crucible operatively supported relative to the base flange and configured to hold vacuum deposition material, the crucible comprising a cylindrical body portion, a conical portion, and an effusion orifice;
a heater operatively supported relative to the base flange and at least partially surrounding the crucible, the heater comprising a cylindrical body portion configured and positioned to provide thermal radiation to at least a portion of the cylindrical body portion of the crucible and a conical portion configured and positioned to provide thermal radiation to at least a portion of the conical portion of the crucible, the heater comprising a layered structure comprising a pyrolytic graphite electrically resistive layer positioned between pyrolytic boron nitride electrically insulative layers;
a liquid cooling enclosure operatively attached to the base flange at a first end of the liquid cooling enclosure and extending along at least partially surrounding the crucible, the cooling enclosure having an internal surface; and
a conical cover positioned at a second end of the liquid cooling enclosure opposite the first end of the cooling enclosure, the conical cover comprising an opening positioned relative to the effusion orifice of the crucible;
wherein the internal surface of the liquid cooling enclosure is spaced from the heater by plural support elements each providing plural openings circumferentially spaced from one another along each of the support elements so that the openings and space between the heater and the internal surface of the cooling enclosure define an annular conductance channel.
15. The vacuum deposition source of claim 14 , wherein the heater comprises a first heating zone associated with the cylindrical body portion of the heater and a second heating zone associated with the conical portion of the heater.
16. The vacuum deposition source of claim 14 , comprising a crucible support assembly comprising a support flange removably mounted to the base flange and a crucible support cup supported relative to the support flange, wherein an end of the crucible opposite the effusion orifice is supported by the support cup and wherein the crucible support assembly comprises an adjustment device configured to adjust the distance between the support flange and the support cup.
17. The vacuum deposition source of claim 14 , comprising a heater support assembly having a support base operatively supported relative to the base flange and engaged with an end of the heater and an adjustment device configured to adjust the distance between the base flange and the support base.
18. The vacuum deposition source of claim 14 , comprising a cylindrical heat shield assembly at least partially surrounding the heater.
19. A vacuum deposition source comprising:
a base flange configured to mount the vacuum deposition source to a vacuum chamber;
a crucible support assembly comprising a support flange removably mounted to the base flange and a crucible support cup supported relative to the support flange;
a crucible operatively supported by the support cup of the crucible support assembly and configured to hold vacuum deposition material, the crucible comprising a cylindrical body portion, a conical portion, and an effusion orifice; and
a heater operatively supported relative to the base flange independent of the mounting of the crucible support flange to the base flange and at least partially surrounding the crucible, the heater comprising a cylindrical body portion configured and positioned to provide thermal radiation to at least a portion of the cylindrical body portion of the crucible, the heater being operatively supported relative to the base flange by a heater support assembly having a support base operatively supported relative to the base flange and engaged with an end of the heater, wherein the heater support assembly comprises an adjustment device configured to adjust the distance between the base flange and the support base of the heater support assembly and for moving the heater relative to the crucible; a cooling enclosure operatively attached to the base flange at a first end of the liquid cooling enclosure extending along and at least partially surrounding the crucible, the liquid cooling enclosure having an internal surface;
wherein the internal surface of the cooling enclosure is spaced from the heater by plural support elements each providing plural openings circumferentially spaced from one another along each of the support elements so that the openings and space between the heater and the internal surface of the cooling enclosure define an annular conductance channel.
20. The vacuum deposition source of claim 19 , wherein the crucible support assembly comprises an adjustment device configured to adjust the distance between the support flange and the support cup, independently of adjustment of the heater relative to the base flange.
21. The vacuum deposition source of claim 19 , comprising a conical cover positioned at a second end of the liquid cooling enclosure opposite the first end of the liquid cooling enclosure, the conical cover comprising an opening at an end of the conical cover positioned relative to an end of the crucible and an end of the conical portion of the heater.