IP Library Granted Patent US 7,052,366
Granted Patent B2
US 7,052,366 · App. 10/785,393 · Granted May 30, 2006

Endpoint detection system for wafer polishing

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Quick Facts
Patent No.
US 7,052,366
App. No.
10/785,393
Granted
May 30, 2006
Kind
B2
Abstract

An wafer polishing pad assembly for use in CMP includes an optical sensor for sensing reflectivity of the wafer during polishing, and produces a corresponding signal, and transmits the signal from the rotating pad to a stationary portion of the assembly. The signal is transmitting off the pad through non-contact couplings such inductive coupling or optical couplings after being converted into signal formats enabling non-contact transmission.

Claims (17)

1. A method of polishing a wafer, said method comprising the steps of:

providing a polishing pad for use in performing a polishing operation on a surface of the wafer and providing optical means within said polishing pad for sensing an optical characteristic of the surface during the polishing operation;

providing conductor means within the polishing pad for conducting an electrical signal from said optical means to a central portion of said polishing pad,

providing a wafer;

polishing the wafer with the polishing pad; and

sensing an optical characteristic of the surface during the polishing operation.

2. The method of claim 1 wherein the step of providing a polishing pad further comprises providing a means for transferring the electrical signal from the central portion of the polishing pad to a location remote from the polishing pad.

3. A method of polishing a wafer, said method comprising the steps of:

providing a polishing pad for use in performing a polishing operation on a surface of the wafer and providing optical means within said polishing pad for sensing an optical characteristic of the surface during the polishing operation;

providing a wafer;

polishing the wafer with the polishing pad;

sensing an optical characteristic of the surface during the polishing operation;

wherein the step of polishing the wafer comprises rotation of the pad while the pad is in contact with the wafer; and

the step of providing a polishing pad further comprises providing an inductive coupling system operable to inductively transfer an electrical signal from the pad during rotation to a stationary receiver, said inductive coupling system comprising a first transformer winding secured to the pad such that the first transformer winding rotates with the pad, and a second transformer winding within the stationary receiver, and a means to communicate the electrical signal from the optical sensor to the first transformer winding.

4. The method of claim 3 comprising the further step of transferring the electrical signal from the optical sensor to the first transformer winding.

5. The method of claim 4 comprising the further step of transferring the electrical signal from the first transformer winding to a second transformer winding.

6. The method of claim 5 comprising the further step of transferring the electrical signal from the second transformer winding to a signal processing circuit.

Assignments (4)
SECURITY INTEREST Recorded Feb 23, 2024
From: REVASUM, INC.
To: SQN VENTURE INCOME FUND II, LP
Reel/Frame 066545/0924 →
SECURITY INTEREST Recorded Dec 12, 2023
From: REVASUM, INC.
To: SQN VENTURE INCOME FUND II, LP
Reel/Frame 065849/0798 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 8, 2017
From: BFI BUSINESS FINANCE DBA CAPITALSOURCE BUSINESS FINANCE GROUP
To: REVASUM, INC.
Reel/Frame 041909/0687 →
SECURITY INTEREST Recorded Mar 7, 2017
From: STRASBAUGH AND R.H. STRASBAUGH
To: BFI BUSINESS FINANCE DBA CAPITALSOURCE BUSINESS FINANCE GROUP
Reel/Frame 041904/0158 →