IP Library Assignment 066545/0924
Patent Assignment
Reel/Frame 066545/0924

Security Interest

Recorded: 2024-02-23 Pages: 12
Assignor
REVASUM, INC.
Executed: 2023-11-27
Assignee
SQN VENTURE INCOME FUND II, LP
320 BROAD STREET, SUITE #250, CHARLESTON, SOUTH CAROLINA, 29401
Covered Properties (32)
Method of Backgrinding Wafers While Leaving Backgrinding Tape on a Chuck
Patent: 7,059,942 →
Application: 10/717,032 →
Publication: US 2004/0157536
Devices and Methods for Optical Endpoint Detection During Semiconductor Wafer Polishing
Patent: 7,235,154 →
Application: 10/754,360 →
Publication: US 2005/0150599
Endpoint Detection System for Wafer Polishing
Patent: 7,052,366 →
Application: 10/785,393 →
Publication: US 2004/0229545
Polishing Pad with Built-in Optical Sensor
Patent: 6,986,701 →
Application: 10/850,346 →
Publication: US 2005/0009449
Chuck for Supporting Wafers with a Fluid
Patent: 7,160,808 →
Application: 10/860,381 →
Publication: US 2005/0009349
Chemical-Mechanical Planarization Tool Force Calibration Method and System
Patent: 7,040,955 →
Application: 11/046,502 →
Wafer Carrier with Pressurized Membrane and Retaining Ring Actuator
Patent: 7,033,252 →
Application: 11/055,550 →
Publication: US 2005/0215182
Independent Edge Control for Cmp Carriers
Patent: 7,063,604 →
Application: 11/072,636 →
Publication: US 2005/0202765
Retaining Ring for Wafer Carriers
Patent: 7,063,605 →
Application: 11/084,475 →
Publication: US 2005/0164617
Method, Apparatus and System for Use in Processing Wafers
Patent: 7,249,992 →
Application: 11/173,992 →
Publication: US 2006/0035563
Polishing Pad with Built-in Optical Sensor
Patent: 7,083,497 →
Application: 11/334,148 →
Publication: US 2006/0116051
Back Pressure Control System for Cmp and Wafer Polishing
Patent: 7,467,990 →
Application: 11/369,700 →
Publication: US 2006/0166611
Wafer Carrier with Pressurized Membrane and Retaining Ring Actuator
Patent: 7,131,892 →
Application: 11/410,440 →
Publication: US 2006/0194519
Endpoint Detection System for Wafer Polishing
Patent: 7,195,541 →
Application: 11/443,788 →
Publication: US 2006/0217038
Grinding Apparatus and Method
Patent: 7,458,878 →
Application: 11/548,213 →
Publication: US 2007/0128983
Wafer Carrier with Pressurized Membrane and Retaining Ring Actuator
Patent: 7,238,083 →
Application: 11/594,267 →
Publication: US 2007/0054603
Robot Calibration System and Method
Patent: 7,551,979 →
Application: 11/600,978 →
Publication: US 2007/0150100
Methods for Optical Endpoint Detection During Semiconductor Wafer Polishing
Patent: 7,549,909 →
Application: 11/768,873 →
Publication: US 2008/0032602
Method, Apparatus and System for Use in Processing Wafers
Patent: 8,052,504 →
Application: 11/829,798 →
Publication: US 2007/0269986
Flexible Membrane Assembly for a Cmp System and Method of Using
Patent: 7,959,496 →
Application: 11/969,175 →
Publication: US 2009/0176445
Cmp System with Wireless Endpoint Detection System
Patent: 8,182,312 →
Application: 12/205,861 →
Publication: US 2010/0062685
Grinding Apparatus Having an Extendable Wheel Mount
Patent: 8,133,093 →
Application: 12/287,550 →
Publication: US 2010/0093264
Endpoint Detection System for Wafer Polishing
Patent: 7,918,712 →
Application: 12/705,091 →
Publication: US 2010/0144244
Cmp Retaining Ring with Soft Retaining Ring Insert
Patent: 8,740,673 →
Application: 13/252,897 →
Publication: US 2012/0088366
Method, Apparatus and System for Use in Processing Wafers
Patent: 8,565,919 →
Application: 13/290,900 →
Publication: US 2012/0046781
System and Method for in Situ Monitoring of Top Wafer Thickness in a Stack of Wafers
Patent: 8,520,222 →
Application: 13/291,800 →
Publication: US 2013/0114090
Systems and Methods of Wafer Grinding
Patent: 8,968,052 →
Application: 13/656,514 →
Publication: US 2013/0102227
Method and apparatus for cleaning grinding work chuck using a vacuum
Patent: 8,915,771 →
Application: 13/694,723 →
Publication: US 2014/0187128
Systems and Methods of Processing Substrates
Patent: 9,393,669 →
Application: 13/740,101 →
Publication: US 2013/0130593
Methods and Systems for Use in Grind Shape Control Adaptation
Patent: 9,457,446 →
Application: 14/042,591 →
Publication: US 2014/0134923
Methods and Systems for Use in Grind Spindle Alignment
Patent: 9,610,669 →
Application: 14/042,600 →
Publication: US 2014/0134927
Method of Grinding Wafer Stacks to Provide Uniform Residual Silicon Thickness
Patent: 9,082,713 →
Application: 14/525,115 →
Publication: US 2015/0118826
Related Assignments (4)
Other recorded transfers of the patents in this record — the chain of ownership.
Security Interest Mar 7, 2017
From: STRASBAUGH AND R.H. STRASBAUGH
To: BFI BUSINESS FINANCE DBA CAPITALSOURCE BUSINESS FINANCE GROUP
Reel/Frame 041904/0158 →
Assignment of Assignor's Interest Mar 8, 2017
From: BFI BUSINESS FINANCE DBA CAPITALSOURCE BUSINESS FINANCE GROUP
To: REVASUM, INC.
Reel/Frame 041909/0687 →
Release of Security Interest May 10, 2022
From: AGILITY CAPITAL, LLC
To: STRASBAUGH
Reel/Frame 059913/0938 →
Security Interest Dec 12, 2023
From: REVASUM, INC.
To: SQN VENTURE INCOME FUND II, LP
Reel/Frame 065849/0798 →