Method of grinding wafer stacks to provide uniform residual silicon thickness
View Patent ↗A method of processing a device wafer in a wafer stack by chucking the wafer stack device side down and grinding the exposed side of the carrier wafer to parallel with the device wafer, and thereafter flipping the wafer stack and chucking the wafer stack carrier side down and grinding residual silicon from the device wafer.
1. A method of processing a device wafer comprising the steps of:
gluing a carrier wafer to a front side of a device wafer to provide a wafer stack, leaving a backside of the device wafer exposed;
mounting the wafer stack to a chuck, with the device wafer backside pulled down on the chuck, leaving an exposed side of the carrier wafer exposed to a grinder;
grinding the exposed side of the carrier wafer till flat and smooth, and parallel to the backside of the device wafer;
removing the wafer stack from the chuck, and thereafter mounting the wafer stack to the chuck with the exposed side of the carrier wafer pulled down on the chuck, so that the device wafer backside is exposed to the grinder;
grinding the device wafer backside to remove silicon from the device wafer backside without exposing a copper thru silicon via in the device wafer.