IP Library Granted Patent US 6,897,671
Granted Patent B1
US 6,897,671 · App. 10/791,241 · Granted May 24, 2005

System and method for reducing heat dissipation during burn-in

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Quick Facts
Patent No.
US 6,897,671
App. No.
10/791,241
Granted
May 24, 2005
Kind
B1
Abstract

Systems and methods for reducing temperature dissipation during burn-in testing are described. A plurality of devices under test are each subject to a body bias voltage. The body bias voltage is selected to substantially minimize leakage current associated with the plurality of devices under test. Accordingly, heat dissipation is reduced during burn-in.

Claims (28)

1. An apparatus for burn-in testing comprising:

a plurality of devices under test, each device under test subject to a body bias voltage;

a voltage supply for providing said body bias voltage to said devices under test, wherein said body bias voltage is selected from information comprising leakage current values indexed by body bias voltage values and wherein said body bias voltage is selected to substantially minimize leakage current associated with said devices under test; and

a wiring board for coupling said devices under test and said voltage supply.

2. The apparatus of claim 1 wherein said body bias voltage is selected to achieve a desired junction temperature at said devices under test.

3. The apparatus of claim 1 further comprising a test controller coupled to said devices under test via said wiring board.

4. The apparatus of claim 1 further comprising a second voltage supply for providing an operating voltage to said devices under test.

5. The apparatus of claim 1 wherein said devices under test comprise positive-channel metal-oxide semiconductor (PMOS) devices.

6. The apparatus of claim 5 wherein said body bias voltage is in the range of approximately zero to five volts.

7. The apparatus of claim 1 wherein said devices under test comprise negative-channel metal-oxide semiconductor (NMOS) devices.

8. The apparatus of claim 7 wherein said body bias voltage is in the range of approximately zero to minus ten volts.

9. A method of burn-in testing of a plurality of devices under test, said method comprising:

applying an operating voltage to said devices under test; and

applying a body bias voltage to said devices under test, wherein said body bias voltage is selected from information comprising leakage current values indexed by body bias voltage values and wherein application of said body bias voltage substantially minimizes leakage current associated with said devices under test.

10. The method of claim 9 wherein said body bias voltage is selected to achieve a desired junction temperature at said devices under test.

11. The method of claim 9 wherein said devices under test comprise positive-channel metal-oxide semiconductor (PMOS) devices.

12. The method of claim 11 wherein said body bias voltage is in the range of approximately zero to five volts.

13. The method of claim 9 wherein said devices under test comprise negative-channel metal-oxide semiconductor (NMOS) devices.

14. The method of claim 13 wherein said body bias voltage is in the range of approximately zero to minus ten volts.

15. A method of burn-in testing of a plurality of devices under test, said method comprising:

accessing a store of information comprising leakage current indexed by body bias voltage;

selecting a body bias voltage that substantially minimizes leakage current associated with said devices under test; and

applying said body bias voltage to said devices under test in addition to an operating voltage applied to said devices under test.

16. The method of claim 15 wherein said operating voltage in combination with said body bias voltage achieves a desired junction temperature at said devices under test.

17. The method of claim 15 wherein said devices under test comprise positive-channel metal-oxide semiconductor (PMOS) devices.

18. The method of claim 17 wherein said body bias voltage is in the range of approximately zero to five volts.

19. The method of claim 15 wherein said devices under test comprise negative-channel metal-oxide semiconductor (NMOS) devices.

20. The method of claim 19 wherein said body bias voltage is in the range of approximately zero to minus ten volts.

Assignments (7)
CORRECTIVE ASSIGNMENT TO CORRECT THE ASSIGNOR'S NAME PREVIOUSLY RECORDED AT REEL: 036711 FRAME: 0160. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER. Recorded Oct 6, 2015
From: INTELLECTUAL VENTURES FUNDING LLC
To: INTELLECTUAL VENTURES HOLDING 81 LLC
Reel/Frame 036797/0356 →
MERGER Recorded Sep 29, 2015
From: INTELLECTUAL VENTURE FUNDING LLC
To: INTELLECTUAL VENTURES HOLDING 81 LLC
Reel/Frame 036711/0160 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 22, 2009
From: TRANSMETA LLC
To: INTELLECTUAL VENTURE FUNDING LLC
Reel/Frame 023268/0771 →
MERGER Recorded Mar 26, 2009
From: TRANSMETA CORPORATION
To: TRANSMETA LLC
Reel/Frame 022454/0522 →
DOCUMENT RE-RECORDED TO CORRECT ERRORS CONTAINED IN PROPERTY NUMBER(S) 10/791,421 DOCUMENT PREVIOUSLY RECORDED ON REEL 017078 FRAME 0402. Recorded Jun 13, 2006
From: SHENG, ERIC CHIEN-LI
To: TRANSMETA CORPORATION
Reel/Frame 017992/0374 →
CORRECTIVE ASSIGNMENT TO CORRECT SPELLING OF INVENTOR NAME ERIC CHIEN-LI SHENG AND TO CORRECT EXECUTION DATE. Recorded Oct 11, 2005
From: SHENG, ERIC CHIEN-LI
To: TRANSMETA CORPORATION
Reel/Frame 017078/0402 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 1, 2004
From: SHENG, ERIC CHEN-LI; HOFFMAN, DAVID; NIVEN, JOHN LAURENCE
To: TRANSMETA CORPORATION
Reel/Frame 015048/0585 →