Method for fabricating integrated circuit package with solder bumps
View Patent ↗A semiconductor package with solder bumps and a method for making the same are described. One embodiment comprises a flip-chip design with a rectangular semiconductor die with a relatively large aspect ratio bonded to a substantially square substrate through solder bumps. In one embodiment, active bumps are concentrated in an area relatively close to the neutral point of the die, for example, in a substantially square area about the neutral point.
1. A method for fabricating an integrated circuit (“IC”) package, comprising:
applying bumps to a semiconductor die, wherein the die has an aspect ratio greater than 1.3, wherein applying bumps comprises,
applying active bumps to a first region of a surface of the die, wherein the first region includes a substantially square area about a neutral point of the die; and
applying non-active bumps to a second region of the die, wherein the second region includes the surface of the die that is not part of the first region; and
bonding the die to a substrate though the bumps.
2. The method of claim 1 , wherein active bumps carry signals that are not redundant.
3. The method of claim 2 , wherein the non-active bumps include bumps that carry redundant signals and bumps that carry no signals.
4. The method of claim 1 , wherein:
there is a first pitch between adjacent bump centers in the first region; and
there is a second pitch between adjacent bump centers in the second region.
5. The method of claim 4 , wherein the first pitch and the second pitch are the same.
6. The method of claim 4 , wherein the first pitch is greater than the second pitch.
7. The method of claim 4 , wherein the second pitch is greater than the first pitch.
8. The method of claim 1 , wherein:
there is a first pitch between adjacent bump centers along one axis of the die; and
there is a second pitch between adjacent bump centers along another axis of the die.
9. The method of claim 8 , wherein:
the first pitch is approximately 230 micron; and
the second pitch is approximately 300 micron.
10. The method of claim 9 , wherein:
the first pitch is along a longer axis of the die; and
the second pitch is along a shorter axis of the die.
11. The method of claim 1 , wherein the aspect ratio is approximately 2.
12. The method of claim 1 , further comprising applying an underfill material around the bumps between the die and the substrate.
13. The method of claim 1 , wherein the substrate comprises a ball grid array.
14. The method of claim 1 , further comprising coupling a heat dissipating lid to a surface of the die opposite the surface on which the bumps are arranged.
15. A method for fabricating an integrated circuit (“IC”) package, comprising:
a semiconductor die having an aspect ratio greater than 1.3; and
attaching a plurality of solder bumps to a surface of a semiconductor die, comprising,
attaching active bumps arranged regularly on a first region of the surface, wherein the active bumps carry non-redundant signal, and wherein the first region comprises a substantially square area about a neutral point of the surface of the die; and
attaching non-active bumps regularly about the first region, wherein the non-active bumps include bumps that carry redundant signals and bumps that carry no signals, wherein the semiconductor die has an aspect ratio greater than 1.3.
16. The method of claim 15 , further comprising:
coupling a substrate to the die through the plurality of solder bumps, wherein the substrate comprises a ball grid array;
applying an underfill layer such that the underfill layer surrounds the plurality of bumps and is coupled to the die and the substrate; and
coupling a lid with heat dissipating characteristics to a surface of the die opposite the surface on which the plurality of solder bumps are arranged.
17. The method of claim 15 , further comprising arranging the active bumps regularly with a first pitch, and arranging the non-active bumps regularly with a second pitch.
18. The method of claim 17 , wherein the first pitch and the second pitch are the same.
19. The method of claim 17 , wherein the first pitch is greater than the second pitch.
20. The method of claim 17 , wherein the second pitch is greater than the first pitch.
21. The method of claim 20 , further comprising arranging the plurality of solder bumps regularly on the surface such that there is a first pitch between solder bumps along one axis of the die, and a second pitch between solder bumps along another axis of the die.
22. The method of claim 20 , wherein the first pitch is approximately 230 microns, and the second pitch is approximately 300 microns.
23. The method of claim 22 , wherein the first pitch is along a longer axis of the die, and the second pitch is along a shorter axis of the die.
24. The method of claim 22 , wherein the first pitch is along a shorter axis of the die, and the second pitch is along a longer axis of the die.
25. The method of claim 15 , wherein the aspect ratio is approximately 2.