IP Library Granted Patent US 7,015,703
Granted Patent B2
US 7,015,703 · App. 10/837,396 · Granted Mar 21, 2006

Radio frequency Langmuir probe

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Quick Facts
Patent No.
US 7,015,703
App. No.
10/837,396
Granted
Mar 21, 2006
Kind
B2
Abstract

A Langmuir probe for measuring characteristics of a plasma driven by radio frequency (RF) power comprises an elongated conductor 10 having an exposed tip 1 for insertion into an RF plasma and an outer end 3 for connection to external measuring circuitry. In order to reduce distortion over a range of RF frequencies, the probe includes an RF voltage divider 11, 12, 13, 14 in series between the tip and outer end of the conductor.

Claims (6)

1. A Langmuir probe for measuring characteristics of a plasma driven by radio frequency (RF) power, the probe comprising an elongated conductor having an exposed tip for insertion into an RF plasma and an outer end for connection to external measuring circuitry, and an RF voltage divider in series between the tip and outer end of the conductor, wherein the conductor is surrounded by a hollow dielectric tube, and wherein the voltage divider comprises at least two impedances disposed in series with the conductor and respective shunt capacitances, at least one impedance being located within the tube and at least one capacitance being in the form of an electrode on an outside surface of the tube, the impedances and capacitances alternating in the longitudinal direction of the tube.

2. A Langmuir probe as claimed in claim 1 , wherein the impedances are inductors.

3. A Langmuir probe as claimed in claim 1 , wherein the electrodes surrounds the tube.

4. A method of measuring plasma characteristics in a plasma system having a variable RF driving frequency comprising: providing a Langmuir probe according to claim 1 , inserting said exposed tip of said probe into a plasma generated by a plasma system, applying a voltage to said conductor of said probe, and measuring the current at said outer end of the conductor.

5. A method of measuring plasma characteristics in a plasma system having a plurality of different RF driving frequencies comprising: providing a Langmuir probe according to claim 1 , inserting said exposed tip of said probe into a plasma generated by a plasma system, applying a voltage to said conductor of said probe, and measuring the current at said outer end of the conductor.

6. A method of measuring plasma characteristics in different plasma systems having different RF driving frequencies comprising: providing a Langmuir probe according to claim 1 , and performing the following steps for each of said different plasma systems: inserting said exposed tip of said probe into a plasma generated by a plasma system, applying a voltage to said conductor of said probe, and measuring the current at said outer end of the conductor.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 15, 2011
From: LAM RESEARCH INTERNATIONAL SARL
To: LAM RESEARCH CORPORATION
Reel/Frame 026755/0613 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 12, 2010
From: SCIENTIFIC SYSTEMS RESEARCH LIMITED
To: LAM RESEARCH INTERNATIONAL SARL
Reel/Frame 024066/0969 →