Patent Assignment
Reel/Frame 024066/0969
Assignment of Assignor's Interest
Recorded: 2010-03-12
Pages: 6
Assignor
SCIENTIFIC SYSTEMS RESEARCH LIMITED
Executed: 2009-01-30
Assignee
LAM RESEARCH INTERNATIONAL SARL
AVENUE EDOUARD-DUBOIS 20, NEUCHATEL, CH-2000, SWITZERLAND
Covered Properties
(13)
Apparatus for Sensing Rf Current Delivered to a Plasma with Two Inductive Loops
Patent:
5,808,415 →
Application:
08/820,914 →
Apparatus for Sensing Rf Current Delivered to a Plasma with Two Inductive Loops
Patent:
6,061,006 →
Application:
09/094,883 →
Rf Current Sensor
Patent:
6,501,285 →
Application:
09/650,256 →
Method of Processing a High Frequency Signal Containing Multiple Fundamental Frequencies
Patent:
6,469,488 →
Application:
09/650,272 →
Method for Fault Identification in a Plasma Process
Patent:
6,441,620 →
Application:
09/650,277 →
Endpoint Detection in the Etching of Dielectric Layers
Fault Classification in a Plasma Process Chamber
Plasma Chamber Cleaning
Plasma Chamber Conditioning
Patent:
6,656,848 →
Application:
10/133,931 →
Method for Fault Detection in a Plasma Process
Method for Process Control of Semiconductor Manufactiring Equipment
Radio Frequency Langmuir Probe
Method for Transferring Process Control Models Between Plasma Processing Chambers
Related Assignments
(1)
Other recorded transfers of the patents in this record — the chain of ownership.