Method of manufacturing semiconductor device having oxide films with different thickness
View Patent ↗After a first gate oxide film ( 302 ) is formed on a substrate ( 301 ), a nitride layer ( 303 ) is formed by a first oxynitriding process. The first gate oxide film is selectively removed from a thinner film part area of the substrate. A second gate oxide film forming process forms a second gate oxide film ( 305 A) in the thinner film part area and a third gate oxide film ( 305 B) in a thicker film part area. By executing second oxynitriding process, nitride layers ( 306 A and 306 B) are formed at the thinner and the thicker part areas.
1. A method of manufacturing a semiconductor device, including a multi-oxidation process for forming oxide films with different thicknesses on a substrate, said method comprising:
executing a plurality of oxide film forming processes for forming said oxide films on said substrate; and
executing a plurality of oxynitriding processes for forming a nitride layer in said oxide films after the oxide film forming processes.
2. A method of manufacturing a semiconductor device as claimed in claim 1 , wherein the oxide film forming process comprises at least one of:
wet oxidization, dry oxidization and halogen oxidization using a vertical diffusion equipment;
one of rapid thermal oxidation (RTO), in-situ steam generation (ISSG) and water vapor generation (WVG) using a sheet-fed treatment equipment; and
plasma oxidization using a plasma treatment equipment.
3. A method of manufacturing a semiconductor device as claimed in claim 1 , wherein the oxynitriding processes comprise at least one of:
a NO treatment, a N 2 O treatment and a NH 3 treatment using a vertical diffusion equipment;
one of a NO treatment, a N 2 O treatment and a NH 3 treatment using a sheet-fed treatment equipment; and
plasma nitridation using a plasma treatment equipment.
4. A method of manufacturing a semiconductor device as claimed in claim 1 , wherein a treatment time, gas pressure and treatment temperature in the oxynitriding processes are decided according to an amount of nitrogen elements which should be introduced in each of said oxide films.
5. A method of manufacturing a semiconductor device as claimed in claim 1 , wherein on and after a second of said plurality of oxide film forming processes, one of ISSG using a sheet-fed treatment equipment and a plasma oxidation using a plasma treatment equipment is used to substantially keep a nitrogen profile formed in a previous oxynitriding process.
6. A method of manufacturing a semiconductor device as claimed in claim 1 , further comprises:
selectively etching a region of the oxide film, which is formed by a last oxide film forming process, between a last oxynitriding process and a succeeding oxide film forming process.
7. A method of manufacturing a semiconductor device as claimed in claim 1 , wherein each of said plurality of oxynitriding processes comprises using a different amount of nitrogen elements.
8. A method of manufacturing a semiconductor device as claimed in claim 1 , wherein said plurality of oxide film forming processes comprises forming a plurality of oxide films adjacent to one another on said substrate.
9. A method of manufacturing a semiconductor device as claimed in claim 8 , wherein one of said plurality of oxynitriding processes is executed after each of said plurality of oxide film forming processes.
10. A method of manufacturing a semiconductor device as claimed in claim 1 , wherein said nitride layer is formed at a vicinity of an interface between a first gate oxide film and said substrate.
11. A method of manufacturing a semiconductor device as claimed in claim 1 , wherein said nitride layer is formed at a vicinity of an upper surface of a first gate oxide film.
12. A method of manufacturing a semiconductor device as claimed in claim 1 , further comprising:
controlling an amount of nitrogen element introduced into said oxide films by changing an amount of nitrogen element included in said plurality of oxynitriding processes.
13. A semiconductor device having a substrate with a plurality of regions, comprising:
oxide films formed in said regions and having different thicknesses; and
a plurality of nitride layers formed at vicinities of interfaces between said oxide films and said substrate.
14. A semiconductor device as claimed in claim 13 , wherein said nitride layers are different from one another in an amount of nitrogen elements.
15. A method of manufacturing a semiconductor device, including a multi-oxidation process for forming oxide films with different thicknesses on a substrate, said method comprising:
executing an oxide film forming process for forming said oxide films on said substrate; and
executing a plurality of oxynitriding processes for forming a nitride layer in said oxide films after the oxide film forming process,
wherein on and after a second oxide film forming process, in-situ steam generation (ISSG) using at least one of a sheet-fed treatment equipment and a plasma oxidation using a plasma treatment equipment is used to substantially keep a nitrogen profile formed a previous oxynitriding process.
16. A method of manufacturing a semiconductor device, including a multi-oxidation process for forming oxide films with different thicknesses on a substrate, said method comprising:
executing an oxide film forming process for forming said oxide films on said substrate;
executing a plurality of oxynitriding processes for forming a nitride layer in said oxide films after the oxide film forming process; and
selectively etching a region of the oxide film, which is formed by a last oxide film forming process, between a last oxynitriding process and a succeeding oxide film forming process.
17. A semiconductor device having a substrate with a plurality of regions, comprising:
oxide films formed in said regions and having different thicknesses; and
nitride layers formed at vicinities of interfaces between said oxide films and said substrate,
wherein said nitride layers comprise different amounts of nitrogen elements.