IP Library › Granted Patent US 7,184,849
Granted Patent B2
US 7,184,849 · App. 10/852,678 · Granted Feb 27, 2007

Method of planning tasks in a machine, method of controlling a machine, supervisory machine control system, lithographic apparatus, lithographic processing cell and computer program

Assignee: ASML Netherlands B.V.
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Quick Facts
Patent No.
US 7,184,849
App. No.
10/852,678
Granted
Feb 27, 2007
Kind
B2
Abstract

A method of planning tasks to be performed in a machine derives a precedence graph by linking subsidiary tasks to a sequence of key tasks to create a scheduling problem that can be solved by an automated scheduler.

Claims (71)

1. A method of planning and performing tasks in a machine, the machine being at least a sub-system of a lithographic apparatus or lithographic processing cell, the method comprising:

receiving an order for work to be carried out by the machine;

determining key tasks to be carried out to fulfill the order;

generating a key task sequence comprising the key tasks;

determining subsidiary tasks, including one or more logistic tasks, one or more pre-processing tasks and/or one or more post-processing tasks, to be carried out before or after each of the key tasks;

generating a scheduling problem instance comprising the subsidiary tasks linked to respective ones of the key tasks; and perform work by the machine.

2. A method according to claim 1 , wherein the one or more logistic tasks comprise tasks involved in moving materials used in the key tasks between resources of the machine.

3. A method according to claim 1 , wherein an order for work comprises printing of a given pattern onto a given lot of substrates.

4. A method according to claim 3 , wherein the key tasks comprise actual exposure tasks necessary to effect ordered printing.

5. A method according to claim 4 , wherein the subsidiary tasks comprise one or more tasks selected from the group comprising:

coating a substrate with a radiation-sensitive resist;

pre-alignment of a substrate;

measurement or characterization of a substrate;

a transportation task;

inspection of an exposed substrate;

post exposure bake; and

developing an exposed substrate.

6. A method according to claim 4 , wherein the subsidiary tasks comprise one or more tasks selected from the group comprising:

loading a mask;

cleaning a mask;

inspecting a mask;

storing a mask; and

unloading a mask.

7. A method according to claim 4 , wherein the subsidiary tasks comprise one or more tasks selected from the group comprising:

retrieval of a data file from a data storage device;

decompressing;

error checking;

rasterization; and

resetting a programmable patterning device.

8. A method according to claim 1 , wherein the scheduling problem instance comprises a precedence graph.

9. A method according to claim 8 , wherein generating a precedence graph comprises replacing all nodes in a first precedence graph that meet a given criteria by a sub-graph comprising linked nodes to generate a second precedence graph.

10. A method according to claim 8 , wherein generating a precedence graph comprises inserting a sub-graph at all nodes in a first precedence graph that meet a given criteria to generate a second precedence graph.

11. A method according to claim 1 , further comprising adding a precedence edge between at least two of the subsidiary tasks linked to different ones of the key tasks.

12. A method according to claim 11 , wherein adding a precedence edge comprises adding a precedence edge between all tasks involving a same material.

13. A method according to claim 11 , wherein adding a precedence edge comprises adding a precedence edge between all tasks of a same type.

14. A device manufacturing method comprising planning tasks to be performed by a lithographic projection apparatus according to the method of claim 1 , and performing the planned tasks, a task including projecting a patterned beam of radiation onto a target portion of a substrate.

15. A supervisory control system configured to control a machine, the machine being at least a sub-system of a lithographic apparatus or a lithographic processing cell, the control system comprising:

an input device configured to receive an order for work to be carried out by the machine;

a key task determining mechanism configured to determine key tasks to be carried out to fulfill the order;

a task sequence generator configured to generate a key task sequence comprising the key tasks;

a subsidiary task determining mechanism configured to determine subsidiary tasks, including one or more logistic tasks, one or more pre-processing tasks and/or one or more post-processing tasks, to be carried out before or after each of the key tasks; and

a scheduling problem instance generator configured to generate a scheduling problem instance comprising the subsidiary tasks linked to respective ones of the key tasks; and at least one resource configured to execute the generated scheduling problem instance.

16. A supervisory control system according to claim 15 , wherein the scheduling problem instance comprises a precedence graph.

17. A supervisory control system according to claim 15 , wherein the scheduling problem instance generator comprises a replacing unit configured to replace all nodes in a first precedence graph that meet a given criteria by a sub-graph comprising linked nodes to generate a second precedence graph.

18. A supervisory control system according to claim 15 , wherein the scheduling problem instance generator comprises an inserting unit configured to insert a sub-graph at all nodes in a first precedence graph that meet a given criteria to generate a second precedence graph.

19. A supervisory control system according to claim 15 , further comprising a precedence edge adder configured to add a precedence edge to between at least two of the subsidiary tasks linked to different ones of the key tasks.

20. A supervisory control system according to claim 19 , wherein the precedence edge adder is configured to add a precedence edge between all tasks involving a same material.

21. A supervisory control system according to claim 19 , wherein the precedence edge adder is configured to add a precedence edge between all tasks of a same type.

22. A lithographic apparatus comprising:

an illuminator configured to condition a beam of radiation;

a support structure configured to hold a patterning device, the patterning device serving to impart the beam with a pattern in it cross section;

a substrate table configured to hold a substrate;

a projection system configured to project the patterned beam onto a target portion of the substrate; and

a supervisory control system according to claim 15 .

23. A track unit comprising a substrate handling device, a pre- and post-processing device and a supervisory control system according to claim 15 .

24. A lithographic processing cell comprising a lithographic apparatus, a track unit and a control system according to claim 15 .

25. A computer readable medium containing computer-executable instructions configured to control a machine, the machine being at least a part of a lithographic apparatus or a lithographic processing cell, wherein the computer-executable instructions are configured to instruct a computer system to perform a method, the method comprising:

receiving an order for work to be carried out by the machine;

determining key tasks to be carried out to fulfill the order;

generating a key task sequence comprising the key tasks;

determining subsidiary tasks, including one or more logistics tasks, one or more pre-processing tasks and/or one or more post-processing tasks, to be carried out before or after each of the key tasks;

generating a scheduling problem instance comprising the subsidiary tasks linked to respective ones of the key tasks; and executing the generated scheduling problem instance.

26. A computer readable medium according to claim 25 , wherein the one or more logistic tasks comprise tasks involved in moving materials used in the key tasks between resources of the machine.

27. A computer readable medium according to claim 25 , wherein an order for work comprises printing of a given pattern onto a given lot of substrates.

28. A computer readable medium according to claim 27 , wherein the key tasks comprise actual exposure tasks necessary to effect ordered printing.

29. A computer readable medium according to claim 25 , wherein the scheduling problem instance is in the form of a precedence graph.

30. A computer readable medium according to claim 29 , wherein generating a precedence graph comprises replacing all nodes in a first precedence graph that meet a given criteria by a sub-graph comprising linked nodes to generate a second precedence graph.

31. A computer readable medium according to claim 29 , wherein generating a precedence graph comprises inserting a sub-graph at all nodes in a first precedence graph that meet a given criteria to generate a second precedence graph.

32. A computer readable medium according to claim 25 , further comprising adding a precedence edge between at least two of the subsidiary tasks linked to different ones of the key tasks.

33. A computer readable medium according to claim 32 , wherein adding a precedence edge comprises adding a precedence edge between all tasks involving a same material.

34. A computer readable medium according to claim 32 , wherein adding a precedence edge comprises adding a precedence edge between all tasks of a same type.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 21, 2004
From: VAN DEN NIEUWELAAR, NORBERTUS JOSEPHUS MARTINUS; ONVLEE, JOHANNES; BOUMEN, ROEL; VAN LIEROP, HENRICUS PETRUS JOHANNES; DUMONT, ROBERT JOZEF; ROODA, JACOBUS EELKMAN
To: ASML NETHERLANDS B.V.
Reel/Frame 015825/0980 →
Continuity (1)
Related Publication 20050278049A1 · Dec 15, 2005