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App. No. 10/876,442 · Confirmation No. 2668

Endpoint determination of process residues in wafer-less auto clean process using optical emission spectroscopy

Abandoned -- Failure to Respond to an Office Action View Publication ↗
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2007-11-02 WFEE Fee Worksheet (SB06) 1 View
2007-10-23 ABN Abandonment 2 View
2007-02-14 CTFR Final Rejection 8 View
2007-02-14 SRFW Search information including classification, databases and other search related notes 1 View
2007-02-14 FWCLM Index of Claims 1 View
2007-01-04 A... Amendment/Request for Reconsideration-After Non-Final Rejection 2 View
2007-01-04 CLM Claims 4 View
2007-01-04 REM Applicant Arguments/Remarks Made in an Amendment 4 View
2007-01-04 WFEE Fee Worksheet (SB06) 1 View
2006-09-25 CTNF Non-Final Rejection 7 View
2006-09-25 892 List of references cited by examiner 1 View
2006-09-25 FOR Foreign Reference 19 View
2006-09-25 SRFW Search information including classification, databases and other search related notes 1 View
2006-09-25 BIB Bibliographic Data Sheet 1 View
2006-09-25 FWCLM Index of Claims 1 View
2004-06-25 TRNA Transmittal of New Application 2 View
2004-06-25 SPEC Specification 32 View
2004-06-25 CLM Claims 4 View
2004-06-25 ABST Abstract 1 View
2004-06-25 DRW Drawings-only black and white line drawings 10 View
2004-06-25 OATH Oath or Declaration filed 3 View
2004-06-25 WFEE Fee Worksheet (SB06) 1 View
2004-06-25 WFEE Fee Worksheet (SB06) 1 View
2004-06-25 136A Authorization for Extension of Time all replies 2 View
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Quick Facts
App. No.
10/876,442
Filed
2004-06-25
Pub. No.
US20040235303A1
Art Unit
1792