Radio frequency semiconductor device and method of manufacturing the same
View Patent ↗The present invention discloses a high frequency device including a first wafer providing an inductor having via contact plugs passing through the first wafer and a second wafer bonded to the first wafer, wherein the second wafer provides logic devices and inductor connection lines on an upper side thereof.
1. A method of fabricating a high frequency device, comprising the steps of:
a) providing a first wafer, including the steps of:
a1) forming a via hole in the first wafer;
a2) forming an insulating layer on the first wafer having the via hole;
a3) forming a plurality of first trenches and second trenches in the insulating layer by patterning the insulating layer, wherein the second trenches connect to the via hole;
a4) forming an inductor by filling conductive material in the first trenches and forming via contact plugs by filling the conductive material in the second trenches; and
a5) exposing a bottom region of the via contact plug by grinding a back side of the first wafer;
b) providing a second wafer, including the steps of:
b1) forming logic devices on the second wafer; and
b2) forming a inductor connection lines on the second wafer; and
c) bonding the first wafer and the second wafer, wherein the via contact plugs and the inductor interconnection lines are connected to each other.
2. The method of claim 1 , wherein diameter of the via hole ranges from 0.5 μm to 50 μm, and depth of the via hole ranges from 1 μm to 300 μm.
3. The method of claim 1 , wherein the insulating layer is formed with LTO or HTO.
4. The method of claim 1 , further comprising steps of:
forming a diffusion barrier layer on the first wafer having the first trenches and the second trenches; and
forming a seed layer on the diffusion barrier layer.
5. The method of claim 4 , wherein the diffusion barrier layer is formed with at least one selected form a group consisting of ionized PVD TiN, CVD TiN, MOCVD TiN, ionized PVD Ta, ionized PVD TaN, CVD Ta, CVD TaN, CVD WN, PVD TiAiN, PVD TiSiN, PVD TaSiN, CVD TiAiN, CVD TiSiN and CVD TaSiN.
6. The method of claim 4 , wherein the seed layer is formed with one selected form a group consisting of Cu, Ag, Au, Ti and Al.
7. The method of claim 4 , wherein the seed layer is formed with one selected form a group consisting of PVD method, CVD method, ALD method, electro plating and electroless plating.
8. The method of claim 4 , wherein the conductive material is one selected from a group consisting of Cu, Al and W.
9. The method of claim 1 , wherein at the step of c), pressure ranging from 100 mbar to 10000 mbar is applied to the first and second wafers.
10. The method of claim 9 , wherein at the step of c), a thermal process is performed at temperature ranging from 200° C. to 500° C. for 1 min. to 2 hrs.
11. The method of claim 9 , wherein the thermal process is performed in an ambient of Ar gas, N 2 gas, a mixture gas of H 2 and Ar or a mixture gas of H 2 and N 2 .