Semiconductor integrated circuit with dummy patterns
View Patent ↗A semiconductor integrated circuit includes a plurality of layers provided on a semiconductor substrate, wires provided in a first layer that is one of the plurality of layers, and wire dummies provided in a second layer different from the first layer and having an arrangement that avoids areas overlapping positions of the wires.
1. A semiconductor integrated circuit, comprising:
a plurality of layers provided on a semiconductor substrate;
signal wires provided in a first layer that is one of said plurality of layers;
a power supply wire provided in the first layer or another layer that is one of said plurality of layers; and
wire dummies provided in a second layer different from the first layer and said another layer by avoiding areas that are directly above or below positions of said signal wires provided in said first layer, at least some of said wire dummies being positioned in areas that are directly above or below positions of said power supply wire.
2. The semiconductor integrated circuit as claimed in claim 1 , wherein the first layer is a layer immediately above or immediately below the second layer.
3. A semiconductor integrated circuit, comprising:
a plurality of layers provided on a semiconductor substrate;
wires provided in a first layer that is one of said plurality of layers;
polysilicon wires;
diffusion regions; and
wire dummies provided in a second layer different from the first layer by avoiding areas that are directly above or below positions of said wires provided in said first layer, wherein said wire dummies further avoid areas that are directly above positions of polysilicon wires or diffusion regions.