Contact probe and probe device
A probe device having a contact probe including a film, a plurality of wiring patterns formed on the film with each wiring pattern having a front end portion projecting from the film so as to form contact pins, and a metal layer provided on the film. In one embodiment, the contact probe device includes first and second contact probes connected to each other, the first contact probe including a first film, and a plurality of first wiring patterns formed on the first film, each first wiring pattern having a front end portion projecting from the first film so as to form contact pins. The second contact probe includes a second film, and a plurality of second wiring patterns formed on the second film. The plurality of second wiring patterns are connected to the plurality of first wiring patterns, and the second contact probe is formed separately from the first contact probe.
1. A probe device comprising:
a first film;
a plurality of wiring patterns formed on a first surface of the first film, each wiring pattern having a front end portion projecting linearly from the first film to form straight contact pins, said straight contact pins arranged at an angle of substantially 90 degrees to a contact face of an object of measurement; and
a metal layer provided on a second surface of the first film.
2. The probe device recited in claim 1 , further comprising:
a second film having a second plurality of wiring patterns formed on a first surface of the second film, each wiring pattern having a front end portion projecting linearly from the second film to form second straight contact pins, said second straight contact pins arranged at an angle of substantially 90 degrees to the contact face of the object of measurement;
a second metal layer provided on a second surface of the second film; and,
an insulating spacer located between said first film and said second film.
3. The probe device recited in claim 2 , wherein said spacer comprises ceramic.
4. The probe device recited in claim 3 , further comprising a ceramic rod inserted into positioning holes in each of said first film and said second film.
5. The probe device recited in claim 4 , wherein said metal layer comprises a half-etched portion.
6. The probe device recited in claim 5 , wherein a direction of bending of the contact pins when a buckling load is applied is configured to be substantially constant.
7. The probe device recited in claim 6 , wherein a position of buckling points in axial line directions of the contact pins is configured to be substantially constant.
8. The probe device recited in claim 2 , further comprising a ceramic rod inserted into positioning holes in each of said first film and said second film.
9. The probe device recited in claim 1 , wherein said metal layer comprises a half-etched portion.
10. The probe device recited in claim 1 , wherein a direction of bending of the contact pins when a buckling load is applied is configured to be substantially constant.
11. The probe device recited in claim 1 , wherein a position of buckling points in axial line directions of the contact pins is configured to be substantially constant.
12. A probe device comprising:
a first film;
a plurality of wiring patterns formed on a first surface of the first film, each wiring pattern having a front end portion projecting from the first film to form contact pins, said contact pins arranged at an angle of substantially 90 degrees to a contact face of an object of measurement;
a metal layer provided on a second surface of the first film;
a second film having a second plurality of wiring patterns formed on a first surface of the second film, each wiring pattern having a front end portion projecting from the second film to form second contact pins, said second contact pins arranged at an angle of substantially 90 degrees to the contact face of the object of measurement;
a second metal layer provided on a second surface of the second film;
a ceramic insulating spacer located between said first film and said second film; and
a ceramic rod inserted into positioning holes in each of said first film and said second film.
13. The probe device recited in claim 12 , wherein said metal layer comprises a half-etched portion.
14. The probe device recited in claim 13 , wherein a direction of bending of the contact pins when a buckling load is applied is configured to be substantially constant.
15. The probe device recited in claim 14 , wherein a position of buckling points in axial line directions of the contact pins is configured to be substantially constant.
16. A probe device comprising:
a first film;
a plurality of wiring patterns formed on a first surface of the first film, each wiring pattern having a front end portion projecting from the first film to form contact pins, said contact pins arranged at an angle of substantially 90 degrees to a contact face of an object of measurement;
a metal layer provided on a second surface of the first film;
a second film having a second plurality of wiring patterns formed on a first surface of the second film, each wiring pattern having a front end portion projecting from the second film to form second contact pins, said second contact pins arranged at an angle of substantially 90 degrees to the contact face of the object of measurement;
a second metal layer provided on a second surface of the second film;
an insulating spacer located between said first film and said second film; and
a ceramic rod inserted into positioning holes in each of said first film and said second film.