IP Library › Granted Patent US 7,077,722
Granted Patent B2
US 7,077,722 · App. 10/910,690 · Granted Jul 18, 2006

Systems and methods for actuating end effectors to condition polishing pads used for polishing microfeature workpieces

Assignee: Micron Technology, Inc.
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Quick Facts
Patent No.
US 7,077,722
App. No.
10/910,690
Granted
Jul 18, 2006
Kind
B2
Abstract

Systems and methods for activating end effectors used to condition microfeature workpiece polishing pads are disclosed. A system in accordance with one embodiment of the invention includes a rotatable end effector having a conditioning surface configured to condition a microfeature workpiece polishing medium, and a driver coupled to the end effector to rotate the end effector. The driver does not include a flexible, continuous belt coupled to the end effector. For example, the driver can include a motor-driven worm meshed with a worm gear. The system can further include a forcing element coupled to the end effector to apply a force to the end effector that is at least approximately normal to a conditioning surface of the end effector. The forcing element can include a first generally rigid member and a second generally rigid member coupled to the end effector and movable relative to the first generally rigid member to apply the force.

Claims (62)

1. A system including features for conditioning microfeature workpiece polishing media, the system comprising:

a rotatable end effector having a conditioning surface configured to condition a microfeature workpiece polishing medium, wherein the end effector includes a first shaft and a first pear carried by the first shaft; and

a motor having a second shaft and a second gear carried by the second shaft and directly engaged with the first gear.

2. The system of claim 1 , further comprising a forcing device coupled to the end effector, the forcing device including a first generally rigid member and a second generally rigid member, the second generally rigid member being coupled to the end effector and being movable relative to the first generally rigid member, and the first generally rigid member being movable relative to the second generally rigid member, to apply a force to the end effector that is at least approximately normal to the conditioning surface.

3. The system of claim 1 , further comprising the polishing medium, and wherein the polishing medium includes polishing pad material.

4. The system of claim 1 , further comprising:

a support;

the polishing medium, and wherein the polishing medium includes polishing pad material carried by the support;

a workpiece carrier positioned at least proximate to the polishing medium, the workpiece carrier being configured to releasably carry a microfeature workpiece; and

an actuator coupled to at least one of the support and the workpiece carrier to move the at least one of the support and the workpiece carrier relative to the other.

5. A system including features for conditioning microfeature workpiece polishing media, the system comprising:

an end effector having a head coupled to a first shaft, the head having a conditioning surface configured to condition a microfeature workpiece polishing medium;

a motor having a second shaft positioned at least proximate to the first shaft; and

a drive link coupled between the first and the second shaft to rotate the end effector, wherein the drive link includes a first gear element attached to the first shaftand a second gear element attached to the second shaft, and wherein the first gear element is meshed with the second gear element.

6. The system of claim 5 wherein the first gear element includes a worm and wherein the second gear element includes a worm gear engaged with the worm.

7. The system of claim 5 wherein the first gear is meshed with the second gear.

8. The system of claim 5 , further comprising:

a support;

the polishing medium, and wherein the polishing medium includes polishing pad material carried by the support;

a workpiece carrier positioned at least proximate to the polishing medium, the workpiece carrier being configured to releasably carry a microfeature workpiece; and

an actuator coupled to at least one of the support and the workpiece carrier to move the at least one of the support and the workpiece carrier relative to the other.

9. A system including features for conditioning polishing media for polishing microfeature workpieces, the system comprising:

a rotatable end effector having a conditioning surface configured to condition a microfeature workpiece polishing medium, wherein the end effector includes a first shaft carrying a first gear;

a motor, having a second shaft carrying a second gear; wherein the second gear is directly engaged with the first gear; and

a forcing device coupled to the end effector, the forcing device including a first generally rigid member and a second generally rigid member operatively coupled to the first generally rigid member, the second generally rigid member being coupled to the end effector and being movable relative to the first generally rigid member, and first generally rigid member being movable relative to the second generally rigid member, to apply a force to the end effector that is at least approximately normal to the conditioning surface, at least one of the generally rigid members being rotatable with the end effector.

10. The system of claim 9 wherein one of the first and second generally rigid members includes a cylinder and wherein the other of the first and second generally rigid members includes a piston received in the cylinder, the piston being slideable relative to the cylinder along a motion axis.

11. The system of claim 9 , further comprising:

a support;

the polishing medium, and wherein the polishing medium includes polishing pad material carried by the support;

a workpiece carrier positioned at least proximate to the polishing medium, the workpiece carrier being configured to releasably carry a microfeature workpiece; and

an actuator coupled to at least one of the support and the workpiece carrier to move the at least one of the support and the workpiece carrier relative to the other.

12. A system including features for conditioning polishing media for polishing microfeature workpieces, the system comprising:

rotatable conditioning means for conditioning a microfeature workpiece polishing medium, wherein the rotatable conditioning means includes a first shaft and a first gear carried by the first shaft; and

drive means for rotating the conditioning means, the drive means being coupled to the conditioning means, wherein the drive means does not include a flexible, continuous belt coupled to the conditioning means and wherein the drive means includes an electric motor having a second shaft and a second gear carried by the second shaft, the second gear being directly engaged with the first gear.

13. The system of claim 12 wherein the conditioning means includes an end effector having a conditioning surface configured to contact the microfeature workpiece polishing medium.

14. The system of claim 12 , wherein the conditioning means includes a head having a conditioning surface, wherein the system further comprises a forcing device coupled to the conditioning means, the forcing device including a first generally rigid member and a second generally rigid member operatively coupled to the first generally rigid member, the second generally rigid member being coupled to the conditioning means and being movable relative to the first generally rigid member, and the first generally rigid member being movable relative to the second generally rigid member, to apply a force to the conditioning means that is at least approximately normal to the conditioning surface, at least one of the generally rigid members being rotatable with the conditioning means.

15. The system of claim 12 wherein the drive means includes a rotatable impeller coupled to the conditioning means, the drive means further including a conduit in fluid communication with the impeller and coupleable to a source of high pressure fluid.

16. The system of claim 12 , further comprising the polishing medium, and wherein the polishing medium includes polishing pad material.

17. The system of claim 12 , further comprising:

a support;

the polishing medium, and wherein the polishing medium includes polishing pad material carried by the support;

a workpiece carrier positioned at least proximate to the polishing medium, the workpiece carrier being configured to releasably carry a microfeature workpiece; and

an actuator coupled to at least one of the support and the workpiece carrier to move the at least one of the support and the workpiece carrier relative to the other.

18. A system including features for conditioning microfeature workpiece polishing media, the system comprising:

a rotatable end effector rotatable around a first rotation axis and having a conditioning surface configured to condition a microfeature workpiece polishing medium;

a rotatable arm rotatable around a second rotation axis proximate to a first end of the rotatable arm and carrying the rotatable end effector proximate to a second end of the rotatable arm; and

a driver coupled to the end effector to rotate the end effector, the driver including:

an electric motor carried by the rotatable arm, the motor having a shaft that is not parallel with either the first or the second rotation axis; and

a drive link coupled between the motor and the end effector.

19. A method for manufacturing a system having features for conditioning microfeature workpiece polishing media, the method comprising:

providing a rotatable end effector having a conditioning surface configured to condition a microfeature workpiece polishing medium, wherein the end effector includes a first shaft and a first gear attached to the first shaft; and

coupling a motor having a second shaft carrying a second gear to the end effector to rotate the end effector by engaging the second gear directly with the first gear.

20. The method of claim 19 wherein the first gear includes a worm gear and the second gear includes a worm and wherein the method further comprises:

coupling a forcing device to the end effector by coupling a piston of the forcing device to the end effector, the piston being received in and movable relative to a cylinder to apply a force to the end effector that is at least approximately normal to the conditioning surface.

21. The method of claim 19 wherein coupling a motor driver includes:

attaching a worm to a motor;

attaching a worm gear to the end effector; and

engaging the worm gear with the worm.

22. The method of claim 19 , further comprising:

positioning the end effector at least proximate to a support for a polishing medium;

positioning a workpiece carrier at least proximate to the support, the workpiece carrier being configured to releasably carry a microfeature workpiece; and

coupling an actuator to at least one of the support and the workpiece carrier to move the at least one of the support and the workpiece carrier relative to the other.

Assignments (8)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 9, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050937/0001 →
RELEASE OF SECURITY INTEREST Recorded Aug 23, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 047243/0001 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REPLACE ERRONEOUSLY FILED PATENT #7358718 WITH THE CORRECT PATENT #7358178 PREVIOUSLY RECORDED ON REEL 038669 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTEREST. Recorded Jun 8, 2017
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 043079/0001 →
PATENT SECURITY AGREEMENT Recorded Jun 2, 2016
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 038954/0001 →
SECURITY INTEREST Recorded May 12, 2016
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 038669/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 2, 2004
From: MAYES, BRETT A.; BARNHART, GUNNAR A.; MEADOWS, MICHAEL E.; DRINGLE, CHARLES K.
To: MICRON TECHNOLOGY, INC.
Reel/Frame 015659/0081 →
Continuity (1)
Related Publication 20060025054A1 · Feb 2, 2006