Semiconductor component and method of manufacture
View Patent ↗An insulated gate semiconductor device ( 100 ) having reduced gate resistance and a method for manufacturing the semiconductor device ( 100 ). A gate structure ( 112 ) is formed on a major surface ( 104 ) of a semiconductor substrate ( 102 ). Successive nitride spacers ( 118, 128 ) are formed adjacent the sidewalls of the gate structure ( 112 ). The nitride spacers ( 118, 128 ) are etched and recessed using a single etch to expose the upper portions ( 115 A, 117 A) of the gate structure ( 112 ). Source ( 132 ) and drain ( 134 ) regions are formed in the semiconductor substrate ( 102 ). Silicide regions ( 140, 142, 144 ) are formed on the top surface ( 109 ) and the exposed upper portions ( 115 A, 117 A) of the gate structure ( 112 ) and the source region ( 132 ) and the drain region ( 134 ). Electrodes ( 150, 152, 154 ) are formed in contact with the silicide ( 140, 142, 144 ) of the respective gate structure ( 112 ), source region ( 132 ), and the drain region ( 134 ).
1. A semiconductor component, comprising:
a semiconductor material of a first conductivity type and having a major surface;
a gate structure over a portion of the major surface, the gate structure having a top surface and first and second sides;
a first nitride spacer adjacent the first side of the gate structure, the first nitride spacer spaced apart from the gate structure by an oxide layer having a thickness of less than 100 Angstroms;
a first doped region in the semiconductor material and aligned to the first nitride spacer;
a second nitride spacer adjacent the first nitride spacer;
a second doped region in the semiconductor material and aligned to the second nitride spacer; and
a third doped region in the semiconductor material and aligned to the second side of the gate structure.
2. The semiconductor component of claim 1 , further comprising a third nitride spacer adjacent the second side of the gate structure, the third nitride spacer spaced apart from the gate structure by the oxide layer having a thickness less than 100 Angstroms.
3. The semiconductor component of claim 2 , further including a fourth nitride spacer adjacent the third nitride spacer.
4. The semiconductor component of claim 3 , further including silicide along a portion of the first side and a portion of the second side of the gate structure and silicide on the top surface of the gate structure.
5. The semiconductor component of claim 4 , wherein the first nitride spacer is spaced apart from the second nitride spacer by a first portion of a thermally grown oxide layer and wherein the third nitride spacer is spaced apart from the fourth nitride spacer by a second portion of the thermally grown oxide layer.
6. The semiconductor component of claim 4 , wherein the third doped region is adjacent the third nitride spacer and further including a fourth doped region, the fourth doped region adjacent the fourth nitride spacer.
7. A semiconductor component having sidewall spacers, comprising:
a semiconductor material having a gate structure disposed thereon, the gate structure having a top surface and first and second sides;
a first oxide layer on the first side of the gate structure and a second oxide layer on the second side of the gate structure;
a first nitride spacer in contact with the first oxide layer and a second nitride spacer in contact with the second oxide layer;
a third nitride spacer adjacent the first nitride spacer; and
a fourth nitride spacer adjacent the second nitride spacer.
8. The semiconductor component of claim 7 , further including:
a first doped region aligned to the first nitride spacer; and
a second doped region aligned to the second nitride spacer.
9. The semiconductor component of claim 8 , further including:
a third doped region aligned to the third nitride spacer; and
a fourth doped region aligned to the fourth nitride spacer.
10. The semiconductor component of claim 8 , further including silicide formed from the top surface of the gate structure, a portion of the first side of the gate structure, and a portion of the second side of the gate structure.
11. The semiconductor component of claim 10 , wherein the suicide is a suicide selected from the group of suicides consisting of cobalt suicide, titanium suicide, platinum suicide, and nickel suicide.
12. The semiconductor component of claim 7 , further including a third oxide layer between the first and third nitride spacers and a fourth oxide layer between the second and fourth nitride spacers.
13. The semiconductor component of claim 7 , wherein the first oxide layer and the second oxide layer each have a thickness ranging from 10 Angstroms to 60 Angstroms.
14. A semiconductor component, comprising:
a semiconductor material having a major surface, the semiconductor material of a first conductivity type;
a gate structure disposed on the major surface, the gate structure having a top surface and first and second sides;
a first dielectric material disposed on a first portion of the first side of the gate structure;
a second dielectric material disposed on a first portion of the second side of the gate structure;
a first nitride spacer adjacent the first dielectric material;
a second nitride spacer adjacent the second dielectric material;
a third nitride spacer adjacent the first dielectric material; and
a fourth nitride spacer adjacent the second nitride spacer.
15. The semiconductor component of claim 14 , further including silicide formed from the top surface of the gate structure and from a second portion of the first side of the gate structure and a second portion of the second side of the gate structure, the first and second portions adjacent the top surface of the gate structure.
16. The semiconductor component of claim 14 , further including oxide between the first and third nitride spacers.
17. The semiconductor component of claim 16 , further including oxide between the second and fourth nitride spacers.
18. The semiconductor component of claim 14 , further including first and second doped regions in the semiconductor material, the first doped region aligned to the first nitride spacer, the second doped region aligned to the second nitride spacer, and wherein the first and second doped regions are of a second conductivity type.
19. The semiconductor component of claim 18 , further including third and fourth doped regions in the semiconductor material, the third doped region aligned to the third nitride spacer, the fourth doped region aligned to the fourth nitride spacer, and wherein the third and fourth doped regions are of the second conductivity type.
20. The semiconductor component of claim 14 , wherein the first and second dielectric material are oxide.