SiGe layer having small poly grains
View Patent ↗A disclosed embodiment is a method for fabricating a structure in a semiconductor die, the method comprising depositing a silicon buffer layer over a single crystalline region and at least one isolation region at a first pressure, where the silicon buffer layer is continuous, i.e. comprises small poly grains, over the at least one isolation region. The method further includes forming a silicon germanium layer over the silicon buffer layer at a second pressure, where the silicon germanium layer is also continuous, i.e. comprises small poly grains, over the at least one isolation region. In one embodiment, the first pressure is less than the second pressure. In other embodiments, a structure is fabricated according to the above method.
1. A structure in a semiconductor die comprising:
a single crystalline region;
at least one isolation region situated adjacent to said single crystalline region;
a silicon buffer layer situated above said at least one isolation region and said single crystalline region, wherein said silicon buffer layer is continuous over said at least one isolation region, wherein said silicon buffer layer comprises single crystalline silicon over said single crystalline region;
a silicon germanium layer situated above said silicon buffer layer, wherein said silicon germanium layer is continuous over said at least one isolation region.
2. The structure of claim 1 wherein said at least one isolation region is a STI region.
3. The structure of claim 1 wherein said at least one isolation region comprises non-thermal oxide.
4. The structure of claim 1 wherein said single crystalline region comprises single crystalline silicon.
5. The structure of claim 1 wherein said single crystalline region comprises a collector.