Programming and erasing structure for a floating gate memory cell and method of making
View Patent ↗A floating gate memory cell has a floating gate in which there are two adjacent floating gate layers. The top layer is made to have a contour while leaving the lower layer substantially unchanged. An interlevel dielectric and a control gate follow the contour of the floating gate to increase capacitance between the control gate and the floating gate. The two layers of the floating gate can be polysilicon in which the top layer has the contour formed therein by use of a sacrificial layer. The sacrificial layer is formed over the bottom polysilicon layer and etched. The top polysilicon layer is formed over the sacrificial layer. Subsequent processing of the top polysilicon layer exposes the remaining portion of the sacrificial layer so it can be removed; leaving the contour in the top polysilicon layer for the interlevel dielectric and the control gate.
1. A method for forming a floating gate device, the method comprising:
providing a semiconductor substrate;
forming a gate dielectric layer over the semiconductor substrate;
forming a first floating gate layer over the gate dielectric layer;
forming an etch stop layer over the first floating gate layer;
forming a sacrificial layer over the first floating gate layer and the etch stop layer;
removing a portion of the sacrificial layer wherein the removing the portion of the sacrificial layer leaves a remaining portion of the sacrificial layer over the first floating gate layer;
forming a second floating gate layer over the first floating gate layer and the remaining portion of the sacrificial layer;
removing a portion of the second floating gate layer to expose a top surface of the remaining portion of the sacrificial layer;
removing the remaining portion of the sacrificial layer;
forming an interlevel dielectric layer over the second floating gate layer and the first floating gate layer; and
forming a control gate layer over the interlevel dielectric layer.
2. The method of claim 1 , wherein the etch stop layer has a thickness in a range of approximately 15 to 20 Angstroms.
3. The method of claim 1 , wherein the etch stop layer is substantially electrically transparent between the first and second floating gate layers.
4. The method of claim 1 , wherein the etch stop layer comprises one of a nitride or an oxide.
5. The method of claim 1 , wherein the sacrificial layer comprises one of an oxide or a nitride.
6. The method of claim 1 , wherein the remaining portion of the sacrificial layer comprises a plurality of separate portions.
7. The method of claim 1 , wherein the removing the portion of the second floating gate layer comprises polishing the second floating gate layer to expose the top surface of the remaining portion of the sacrificial layer.
8. The method of claim 1 , wherein the semiconductor substrate comprises isolation regions, wherein the first floating gate layer and the remaining portion of the sacrificial oxide layer are between sidewalls of two isolation regions.
9. The method of claim 1 , wherein the removing the portion of the second floating gate layer comprises anisotropic etching of the second floating gate layer to expose the top surface of the remaining portion of the sacrificial layer.
10. The method of claim 9 , wherein the anisotropic etching of the second floating gate layer results in a spacer portion of the second floating gate adjacent a sidewall of the remaining portion of the sacrificial layer.
11. The method of claim 9 , wherein:
the semiconductor substrate includes isolation regions, wherein the first floating gate layer and the remaining portion of the sacrificial layer are between sidewalls of two isolation regions, and
the anisotropic etching of the second floating gate layer results in a first spacer portion of the second floating gate adjacent a sidewall of the remaining portion of the sacrificial layer and a second spacer portion of the second floating gate adjacent a sidewall of an isolation region.
12. The method of claim 1 , wherein the first floating gate layer and the second floating gate layer have substantially different etch selectivities.
13. The method of claim 1 , wherein the first floating gate layer comprises polysilicon and the second floating gate layer comprises a metal.
14. The method of claim 1 , wherein the semiconductor substrate comprises isolation regions, and wherein the method further comprises forming openings through the first gate dielectric layer over the isolation regions.
15. A method for forming a floating gate device, the method comprising:
providing a semiconductor substrate;
an isolation region having a first edge and a second edge;
forming a gate dielectric layer over the semiconductor substrate and between the first edge and the second edge;
forming a first floating gate layer over the gate dielectric layer;
forming a sacrificial layer over the first floating gate layer;
removing a portion of the sacrificial layer to expose a first portion of the first floating gate layer, wherein the removing the portion of the sacrificial layer leaves a remaining first portion of the sacrificial layer over the first floating gate layer disposed at least between the first portion of the first floating gate layer and the first edge and a remaining second portion of the sacrificial layer over the first floating gate layer and disposed at least between the first portion of the first floating gate layer and the second edge;
forming a second floating gate layer over the first portion of the first floating gate layer and the remaining first portion and the remaining second portion of the sacrificial layer;
polishing the second floating gate layer to expose the remaining first portion and the remaining second portion of the sacrificial layer;
removing the remaining first portion and the remaining second portion of the sacrificial layer to expose a second portion and a third portion of the first floating gate layer;
forming an interlevel dielectric layer over the second floating gate layer and the second portion and the third portion of the first floating gate layer; and
forming a control gate layer over the interlevel dielectric layer.
16. The method of claim 15 , wherein the sacrificial layer comprises one of an oxide or a nitride.
17. The method of claim 15 , wherein the polishing comprises performing a chemical mechanical polish (CMP).
18. The method of claim 15 , further comprising forming openings through the first and second gate dielectric layers over the isolation region.
19. A method for forming a floating gate device, the method comprising:
providing a semiconductor substrate;
forming a gate dielectric layer over the semiconductor substrate;
forming a first floating gate layer over the gate dielectric layer;
forming an etch stop layer over the first floating gate layer;
forming a sacrificial layer over the etch stop layer;
removing a portion of the sacrificial layer wherein the removing the portion of the sacrificial layer leaves a remaining portion of the sacrificial layer over the etch stop layer;
forming a second floating gate layer over the etch stop layer and the remaining portion of the sacrificial layer;
etching the second floating gate layer using the etch stop layer to expose a top surface of the remaining portion of the sacrificial layer, wherein after etching, a portion of the second floating gate layer remains adjacent sidewalls of the remaining portion of the sacrificial layer;
removing the remaining portion of the sacrificial layer;
forming an interlevel dielectric layer over the first floating gate layer and the remaining portion of the second floating gate layer; and
forming a control gate layer over the interlevel dielectric layer.
20. The method of claim 19 , wherein the semiconductor substrate comprises isolation regions, wherein the first floating gate layer and the remaining portion of the sacrificial oxide layer are between sidewalls of two isolation regions.
21. The method of claim 19 , wherein the etching comprises anisotropic etching of the second floating gate layer.
22. The method of claim 19 , wherein:
the semiconductor substrate includes isolation regions, wherein the first floating gate layer and the remaining portion of the sacrificial layer are between sidewalls of two isolation regions, and
the etching comprises anisotropic etching of the second floating gate layer which results in a second portion of the second floating gate adjacent a sidewall of an isolation region.
23. The method of claim 19 , wherein the semiconductor substrate comprises isolation regions, and wherein the method further comprises forming openings through the first and second gate dielectric layers over the isolation regions.