Programming and erasing structure for a floating gate memory cell and method of making
View Patent ↗A floating gate memory cell has a floating gate in which there are two floating gate layers. The top layer is etched to provide a contour in the top layer while leaving the lower layer unchanged. The control gate follows the contour of the floating gate to increase capacitance therebetween. The two layers of the floating gate can be polysilicon separated by a very thin etch stop layer. This etch stop layer is thick enough to provide an etch stop during a polysilicon etch but preferably thin enough to be electrically transparent. Electrons are able to easily move between the two layers. Thus the etch of the top layer does not extend into the lower layer but the first and second layer have the electrical effect for the purposes of a floating gate of being a continuous conductive layer.
1. A method for forming a floating gate device, the method comprising:
providing a semiconductor substrate;
forming a gate dielectric layer over the semiconductor substrate;
forming a first floating gate layer over the gate dielectric layer;
forming an etch stop layer over the first floating gate layer,
forming a second floating gate layer over the first floating gate and the etch stop layer;
forming a patterned masking layer over the second floating gate layer;
using the patterned masking layer to remove a portion of the second floating gate layer, removing a portion of the etch stop layer;
forming an interlevel dielectric layer over the second floating gate layer and the first floating gate layer after the step of removing; and
forming a control gate layer over the interlevel dielectric layer.
2. The method of claim 1 , wherein the etch stop layer has a thickness in a range of approximately 15 to 20 Angstroms.
3. The method of claim 1 , wherein the etch stop layer is substantially electrically transparent between the first and second floating gate layers.
4. The method of claim 1 , wherein the etch stop layer comprises one of a nitride or an oxide.
5. The method of claim 1 , wherein the using the patterned masking layer to remove the portion of the second floating gate layer leaves a plurality of separate portions of the second floating gate layer over the first floating gate layer.
6. The method of claim 1 , wherein the floating gate device is a self-aligned floating gate device.
7. The method of claim 1 , wherein the first floating gate layer and the second floating gate layer have substantially different etch selectivities.
8. The method of claim 1 , wherein the first floating gate layer comprises polysilicon and the second floating gate layer comprises a metal.
9. The method of claim 1 , wherein the using the patterned masking layer to remove the portion of the second floating gate layer results in increased coupling between the floating gates and the control gate.
10. The method of claim 1 , wherein the substrate comprises isolation regions, and wherein the method further comprises forming openings through the first and second gate dielectric layers over the isolation regions.
11. The method of claim 1 , wherein forming a patterned masking layer comprises:
forming a masking layer over the second floating gate layer;
forming an opening in the masking layer; and
forming spacers within the opening in the masking layer, wherein the opening corresponds to a sublithographic feature.
12. The method of claim 11 , wherein the using the patterned masking layer to removed the portion of the second floating gate layer comprises removing a sublithographic portion of the second floating gate layer defined by the opening in the masking layer.
13. A method for forming a floating gate device, the method comprising:
providing a semiconductor substrate;
forming a gate dielectric layer over the semiconductor substrate;
forming a first floating gate layer over the gate dielectric layer;
forming an etch stop layer over the first floating gate layer;
forming a second floating gate layer over the etch stop layer;
forming an opening in the second floating gate layer extending to the etch stop layer;
forming an interlevel dielectric layer over the second floating gate layer and within the opening over the first floating gate layer; and
forming a control gate layer over the interlevel dielectric layer.
14. The method of claim 13 , wherein forming the opening in the second floating gate layer comprises extending the opening through the etch stop layer to expose a portion of the first floating gate layer.
15. The method of claim 13 , wherein forming the opening in the second floating gate layer comprises forming a plurality of openings, and wherein the interlevel dielectric layer is formed within the plurality of openings.
16. The method of claim 13 , wherein the etch stop layer has a thickness in a range of approximately 15 to 20 Angstroms.
17. The method of claim 13 , wherein the etch stop layer is substantially electrically transparent between the first and second floating gate layers.
18. The method of claim 13 , wherein the etch stop layer comprises one of a nitride or an oxide.
19. The method of claim 13 , wherein the floating gate device is a self-aligned floating gate device.
20. The method of claim 19 , wherein the self-aligned floating gate device comprises isolation regions, wherein the opening in the second floating gate layer is formed between two isolation regions.
21. The method of claim 13 , wherein the substrate comprises isolation regions, and wherein the method further comprises forming openings through the first and second gate dielectric layers over the isolation regions.
22. A method for forming a floating gate device, the method comprising:
providing a semiconductor substrate having isolation trenches, a gate dielectric layer over the semiconductor substrate between the isolation regions, and a first floating gate layer over the gate dielectric layer between the isolation regions;
forming an etch stop layer over the first floating gate layer;
forming a second floating gate layer over the etch stop layer;
removing a portion of the second floating gate layer to expose a first portion of the etch stop layer over the first floating gate layer;
removing at least a portion of the first portion of the etch stop layer;
forming an interlevel dielectric layer over the second floating gate layer and the first floating gate layer after the step of removing at least a portion; and
forming a control gate layer overlying the interlevel dielectric layer.
23. The method of claim 22 , wherein the isolation regions extend above a top surface of the first floating gate layer.
24. The method of claim 23 , wherein the removing the portion of the second floating gate layer comprises anisotropic etching of the second floating gate layer.
25. The method of claim 24 , wherein the anisotropic etching results in spacer portions of the second floating gate layer adjacent sidewalls of isolation regions.
26. The method of claim 24 , wherein the anisotropic etching results in spacer portions of the second floating gate layer adjacent sidewalls of the isolation regions and a remaining portion of the second floating gate layer between the spacer portions.
27. The method of claim 23 , wherein the removing the portion of the second floating gate layer results in a remaining portion of the second floating gate layer between the isolation regions.
28. The method of claim 23 , wherein the etch stop layer is substantially electrically transparent between the first and second floating gate layers.