Substrate processing apparatus
View Patent ↗A cell controller controls the operation of a transport robot to keep a substrate belonging to a succeeding lot carried into a heating part in the fourth transport cycle from being transported out of the heating part in the next or fifth transport cycle, thereby preventing interference between the transport of substrates belonging to the succeeding lot and the transport of substrates belonging to a preceding lot. If interference is likely to occur between the transport of the substrates belonging to the succeeding lot and the transport of the substrates belonging to the preceding lot, the cell controller causes the substrates belonging to the succeeding lot not to be transported but to remain in processing units. This allows the transport of the substrates belonging to the succeeding lot in consideration of only the next transport cycle.
1. A substrate processing apparatus comprising:
a plurality of locations to which substrates are transported;
a transport element configured for circulatingly transporting preceding substrates and succeeding substrates successively between said plurality of locations, said preceding substrates belonging to a preceding lot determined to follow a first transport sequence, said succeeding substrates belonging to a succeeding lot determined to follow a second transport sequence different from said first transport sequence, said preceding lot being immediately followed by said succeeding lot; and
an operation control element configured for controlling the operation of said transport element,
wherein said plurality of locations include one or more processing units each being configured for performing a predetermined process on a substrate, and
wherein said operation control element includes
a judging element configured for making a predictive judgment as to whether or not interference occurs between the transport of said succeeding substrates and the transport of said preceding substrates in a new transport cycle, based on information representing said first and second transport sequences,
an objective substrate determining element configured for determining an objective substrate, said objective substrate being one of said succeeding substrates occupying one of said one or more processing units and causing said interference when transported out of said one of said one or more processing units after being processed in said one of said one or more processing units, if said interference is predicted, and
a transport cycle correcting element configured for executing said new transport cycle while causing said objective substrate to remain in said one of said one or more processing units.
2. The substrate processing apparatus according to claim 1 , further comprising
a repeating element configured for activating said judging element each time a transport cycle is updated.
3. The substrate processing apparatus according to claim 2 , wherein
after a leading substrate belonging to said succeeding lot reaches the last one of said plurality of locations, said operation control element causes other substrates belonging to said succeeding lot to be transported in succession.
4. The substrate processing apparatus according to claim 1 , further comprising
a first substrate rest part,
wherein said plurality of locations include a second substrate rest part, and
wherein said transport element is configured to transports a substrate placed on said first substrate rest part to said plurality of locations, and places a substrate processed in said one or more processing units onto said second substrate rest part.
5. The substrate processing apparatus according to claim 1 , wherein
said one or more processing units include a heating part,
said heating part including
a heating element for performing a heating process on a substrate transported thereto, and
a holding arm configured for holding the substrate heated by said heating element and to perform a cooling process on the substrate.
6. The substrate processing apparatus according to claim 4 , wherein
said one or more processing units include a heating part,
said heating part including
a heating element for performing a heating process on a substrate transported thereto, and
a holding arm configured for holding the substrate heated by said heating element and to perform a cooling process on the substrate.
7. An apparatus for determining a transport plan for substrates in a substrate processing apparatus, comprising:
an element configured for acquiring a transport plan about the transport of preceding substrates and succeeding substrates between a plurality of locations, said preceding substrates belonging to a preceding lot determined to follow a first transport sequence, said succeeding substrates belonging to a succeeding lot determined to follow a second transport sequence different from said first transport sequence, said preceding lot being immediately followed by said succeeding lot;
an element configured for judging whether or not interference occurs between the transport of said succeeding substrates and the transport of said preceding substrates under said transport plan;
an element configured for determining an objective substrate, said objective substrate being one of said succeeding substrates occupying a processing unit and causing said interference when transported out of said processing unit after being processed in said processing unit, if said interference is predicted; and
an element configured for correcting said transport plan so as to execute a new transport cycle while causing said objective substrate to remain in said processing unit.