Non-volatile semiconductor memory with single layer gate structure
View Patent ↗A semiconductor device of this invention is a single-layer gate nonvolatile semiconductor memory in which a floating gate having a predetermined shape is formed on a semiconductor substrate. This floating gate opposes a diffusion layer serving as a control gate via a gate oxide film and is capacitively coupled with the diffusion layer by using the gate oxide film as a dielectric film. The diffusion layer immediately below the dielectric film is insulated from the semiconductor substrate by an insulating film such as a silicon oxide film. A pair of diffusion layers are formed in surface regions of the semiconductor substrate on the two sides of the floating gate extending on a tunnel oxide film. This invention can realize a reliable semiconductor device which is a single-layer gate semiconductor device by which a low-cost process is possible, has a control gate which can well withstand a high voltage applied when data is erased or written, and can prevent an operation error by minimizing variations in the threshold value.
1. A semiconductor device comprising:
a semiconductor substrate in which a first and a second element active regions are demarcated by means of element isolation structure;
the first element active region comprising:
a first and a second conductive regions formed at a surface region of the semiconductor substrate;
a first electrode formed on the semiconductor substrate between the first and the second conductive regions via a first insulating film forming a transistor with said first and second conductive regions;
the second element active region comprising:
a third conductive region formed at the surface region of the semiconductor substrate;
a fourth conductive region formed to cover over side surfaces to a lower surface of said third conductive region, said fourth conductive region having a conductivity type opposite to that of the third conductive region;
a second electrode formed on said third conductive region via a second insulating film,
wherein said second electrode serves as a floating gate and is capacitively coupled with said third conductive region serving as a control gate by using said second insulating film serving as a dielectric film; and
wherein said first electrode and the second electrode are electrically connected and a third electrode is connected to the semiconductor substrate to apply a predetermined electric potential to the semiconductor substrate in said first element active region to control the threshold voltage of said transistor and to said fourth conductive region.
2. The semiconductor device of claim 1 , further comprising a fifth conductive region formed to cover over side surfaces to a lower surface of said third conductive region,
wherein said fourth conductive region is formed to cover over side surfaces to a lower surface of said fifth conductive region.