IP Library Granted Patent US 7,078,709
Granted Patent B2
US 7,078,709 · App. 10/974,829 · Granted Jul 18, 2006

Apparatus and method for proof of outgassing products

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Quick Facts
Patent No.
US 7,078,709
App. No.
10/974,829
Granted
Jul 18, 2006
Kind
B2
Abstract

Outgassing products, which are formed during the exposure of photoresist systems by laser irradiation, are adsorbed on a proof plate for further analysis.

Claims (45)

1. An apparatus for proof of outgassing products, comprising:

a radiation source for emitting radiation;

beamforming optics;

a substrate holder; and

a proof plate operable to adsorb outgassing products that are emitted from a substrate attached to a substrate holder, wherein the proof plate is fixed by the holder in immediate vicinity of and apart from the substrate, and wherein a nitrogen flow flows around the proof plate.

2. The apparatus as claimed in claim 1 , further comprising: a detector for measuring the radiation.

3. The apparatus as claimed in claim 1 , wherein the substrate comprises a photoresist.

4. The apparatus as claimed in claim 3 , wherein the photoresist comprises a chemically enhanced photoresist.

5. The apparatus as claimed in claim 3 , wherein the photoresist is applied to a wafer.

6. The apparatus as claimed in claim 1 , wherein the radiation is at a wavelength less than 200 nm.

7. The apparatus as claimed in claim 1 , wherein the nitrogen flows around the proof plate in an annular shape.

8. The apparatus as claimed in claim 1 , wherein the proof plate is disposed 0.3 mm in front of the substrate.

9. The apparatus as claimed in claim 1 , wherein the substrate holder is at least one of rotatable and movable.

10. A method for proof of outgassing products, comprising:

providing an apparatus for outgassing products including:

a radiation source for emitting radiation;

beamforming optics for forming a beam from the emitted radiation;

a substrate holder; and

a proof plate for adsorption of the outgassing products emitted from a substrate;

attaching the substrate to the substrate holder;

fixing the proof plate to a proof plate holder to dispose the proof plate in immediate vicinity of and apart from the substrate;

generating a nitrogen flow around the proof plate;

irradiating an area on the substrate via the beam by passing the beam through the proof plate; and

adsorbing on the proof plate outgassing products generated by the irradiation of the substrate area by the beam.

11. An apparatus for collecting outgassing products comprising:

a radiation source;

beamforming optics configured to focus the radiation emitted by the radiation source and align the radiation with a desired irradiation area;

a substrate holder; and

a proof plate disposed between the radiation source and the substrate holder, wherein the proof plate is capable of adsorbing outgassing products released by a substrate positioned on the substrate holder.

12. The apparatus of claim 11 , wherein the focused radiation passes though the proof plate.

13. The apparatus of claim 11 , wherein the proof plate is arranged proximate the substrate.

14. The apparatus of claim 11 , wherein the proof plate is arranged a short distance in front of the substrate.

15. The apparatus of claim 11 further comprising a nitrogen source configured to direct a flow of nitrogen around the proof plate.

16. A method of collecting outgassing products comprising:

(a) providing an apparatus including:

a radiation source,

beamforming optics configured to focus the radiation emitted by the radiation source and align the radiation with a desired irradiation area,

a substrate holder, and

a proof plate disposed between the radiation source and the substrate holder;

(b) receiving a substrate on the substrate holder;

(c) directing the radiation emitted by the radiation source through the beamforming optics to form a beam of radiation; and

(d) directing the beam of radiation onto the substrate to form outgassing products,

wherein the proof plate is positioned such that the outgassing products released by the substrate are precipitated on the proof plate via adsorption.

17. The method of claim 1 , wherein the apparatus further comprises a nitrogen source and the method further comprises flowing nitrogen around the proof plate to minimize substrate contamination.

18. The method of claim 1 , wherein the method further comprises (e) chemically analyzing the adsorbed outgassing precipitates.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 16, 2015
From: INFINEON TECHNOLOGIES AG
To: POLARIS INNOVATIONS LIMITED
Reel/Frame 036877/0513 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →