Nonvolatile memory device and method for manufacturing the same
View Patent ↗The present invention discloses a nonvolatile memory device which can improve the data storage capacity without increasing the surface area of the device, and a method for manufacturing the same. The nonvolatile memory device comprises: a gate of a stack type structure formed on an active region of a semiconductor substrate; a source/drain formed in the substrate at both sides of the gate of the stack type structure; an interlayer insulating film formed on the substrate where the source/drain is formed and covering the gate of the stack type structure; a contact connected to the source/drain through the interlayer insulating film; a plurality of conductive patterns formed in the interlayer insulating film of the region not adjacent to the contact; and an electrode pad formed on the conductive patterns.
1. A method for manufacturing a nonvolatile memory device, comprising the steps of:
forming gates of a stack type structure on an active region of a semiconductor substrate;
forming a source/drain in the substrate at both sides of the gate of the stack type structure;
forming a first interlayer insulating film on the entire surface of substrate where the source/drain is formed;
forming a plurality of trenches having a predetermined depth in the first interlayer insulating film of the region not adjacent to a contact forming region;
depositing a conductive material on the entire surface of the substrate where the trenches are formed;
forming a conductive pattern by selectively etching the conductive material;
forming a second interlayer insulating film on the first interlayer insulating film where the conductive pattern is formed;
forming a first contact hole connecting to parts of the source/drain and a second contact hole connecting to the conductive pattern by selectively etching the second interlayer insulating film; and
forming an electrode pad and a contact by burying the first contact hole and the second contact hole with a conductive material.
2. The method of claim 1 , wherein the gate of the stack type structure has a structure in which a floating gate and a control gate are sequentially stacked.
3. The method of claim 1 , wherein the second interlayer insulating film is formed using a BPSG film.
4. The method of claim 1 , wherein the conductive pattern is formed in the region corresponding to the trenches.