IP Library Granted Patent US 7,151,695
Granted Patent B2
US 7,151,695 · App. 10/991,879 · Granted Dec 19, 2006

Integrated circuit having a non-volatile memory with discharge rate control and method therefor

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Quick Facts
Patent No.
US 7,151,695
App. No.
10/991,879
Granted
Dec 19, 2006
Kind
B2
Abstract

An integrated circuit includes a memory ( 10 ). The memory ( 10 ) includes an array ( 12 ) of non-volatile memory cells. Each memory cell ( 14 ) of the array ( 12 ) includes a plurality of terminals comprising: a control gate, a charge storage region, a source, a drain, a well terminal, and a deep well terminal. Following an erase operation of the array ( 12 ), the erase voltages are discharged from each of the memory cells. A discharge rate control circuit ( 11 ) controls the discharging of terminals of the memory cell. The discharge rate control circuit ( 11 ) includes a reference current generator ( 34 ) for providing a reference current. A first current mirror ( 46 ) is coupled to the reference current generator ( 34 ) and provides a first predetermined discharge current for discharging the control gate, drain, and source. A second current mirror ( 36 ) is coupled to the reference current generator ( 34 ) and provides a second predetermined discharge current for discharging the well terminals after the erase operation.

Claims (50)

1. An integrated circuit, comprising:

an array of non-volatile memory cells, each memory cell of the array having a charge storage region and a plurality of terminals comprising a control gate, a drain, and a source; and

a discharge rate control circuit for controlling a discharge rate of the control gate, the drain, and the source of an erased memory cell, the discharge rate control circuit comprising:

a reference current generator for providing a reference current; and

a first current mirror, coupled to the reference current generator, for providing a first predetermined discharge current for discharging the control gate, the drain, and the source after the erase operation.

2. The integrated circuit of claim 1 , wherein the discharge rate control circuit provides a discharge rate determined to reduce voltage overshoot due to capacitive coupling between one or more of the plurality of terminals.

3. Tho integrated circuit of claim 2 , wherein the plurality of terminals further comprises a a well terminal.

4. The integrated circuit of claim 1 , wherein the discharge rate includes a first discharge rate for a first predetermined time period and a second discharge rate for a second predetermined time period, wherein the second discharge rate is higher than the first discharge rate.

5. The integrated circuit of claim 3 , wherein the well terminal is discharged at a first rate for a first predetermined time period and discharged at a second rate for a second predetermined time period, wherein the second rate is higher than the first rate.

6. The integrated circuit of claim 1 , further comprising a second current mirror, coupled to the reference current generator, for providing a second predetermined discharge current for discharging a a well terminal of each memory cell of the array after the erase operation.

7. The integrated circuit of claim 6 , wherein the second current mirror comprises:

a first transistor having a first current electrode and a control electrode both coupled to the reference current generator, and a second current electrode coupled to a first supply voltage terminal;

a second transistor having a first current electrode capable of being selectively coupled to the well terminal of each of the array of memory cells, a control electrode coupled to the reference current generator, and a second current electrode coupled to the first supply voltage terminal.

8. The integrated circuit of claim 1 , wherein the first current mirror comprises:

a first transistor having a first current electrode and a control electrode both coupled to the reference current generator, and a second current electrode selectively coupled to the source and drain of each memory cell of the array of memory cells; and

a second transistor having a having a first current electrode coupled to a source of each memory cell of the array of memory cells, a control electrode coupled to the reference current generator, and a second current electrode selectively coupled to the control gate of each memory cell of the array of memory cells.

9. The integrated circuit of claim 1 , further comprising a second current mirror, the second current mirror having an input for receiving a second predetermined discharge current, the second current mirror providing a discharge path from a well terminal of each memory cell of the array, for recycling charge from the the well terminal to a supply voltage terminal.

10. The integrated circuit of claim 6 , wherein the discharge rate control circuit further comprises a second reference current generator coupled to the first and second current mirrors.

11. The integrated circuit of claim 1 , wherein the drain of each of the memory cells of the array is coupled to a corresponding bit line and all of the sources of the array are coupled together.

12. The integrated circuit of claim 1 , wherein the charge storage region is a floating gate of a flash memory cell.

13. An integrated circuit, comprising:

an array of non-volatile memory cells, each memory cell of the array having a control gate, a source, a drain, and a well terminal;

a reference current generator for providing a reference current;

a first current mirror, coupled to the reference current generator, for providing a first predetermined discharge current for discharging the control gate of each memory cell of the array of non-volatile memory cells after an erase operation of the array; and

a second current mirror, coupled to the reference current generator, for providing a second predetermined discharge current for discharging the well terminal of each memory cell of the array of non-volatile memory cells after the erase operation of the array.

14. The integrated circuit of claim 13 , wherein the array is erased by applying a positive voltage to the well terminal of each memory cell while applying a negative voltage to the control gate of each memory cell.

15. The integrated circuit of claim 13 , wherein the array comprises a plurality of flash memory cells.

16. The integrated circuit of claim 13 , wherein the control gate, the drain, the source and the well terminal are all discharged at a rate whereby a discharge voltage overshoot, caused by capacitive coupling between one or more memory cell terminals, is minimized.

17. The integrated circuit of claim 13 , wherein the control gate is discharged at a first rate for a first predetermined time period and discharged at a second rate for a second predetermined time period, wherein the second rate is higher than the first rate.

18. The integrated circuit of claim 13 , wherein the control gate and the well terminal are both discharged at a first rate for a first predetermined time period and discharged at a second rate for a second predetermined time period, wherein the second rate is higher than the first rate.

19. The integrated circuit of claim 13 , wherein each of the memory cells further comprises a deep well terminal coupled to the second current mirror, wherein the deep well terminal is discharged by second discharge current after the erase operation.

20. An integrated circuit comprising:

an array of non-volatile memory cells, each memory cell of the array having a control gate, a source, a drain, a first well terminal, and a second well terminal; and

a discharge rate control circuit for controlling discharging of erase voltages from the control gate, the source, the drain, the first well terminal and the second well terminal of an erased memory cell after an erase operation of the array of non-volatile memory cells.

21. The integrated circuit of claim 20 , wherein the discharge rate control circuit comprises:

a reference current generator for providing a reference current; and

a plurality of current mirrors for providing a plurality of discharge currents in response to the reference current, the plurality of current mirrors for discharging the erase voltages at a plurality of predetermined rates.

22. The integrated circuit of claim 20 , wherein a discharge rate of the erase voltages is determined to reduce voltage overshoot due to capacitive coupling between one or more of the control gate, the source, the drain, the first well terminal and the second well terminal.

23. The integrated circuit of claim 20 , wherein the array of non-volatile memory cells comprises an array of flash memory cells.

24. The integrated circuit of claim 20 , wherein the control gate is discharged at a first rate for a first predetermined time period and discharged at a second rate for a second predetermined time period, wherein the second rate is higher than the first rate.

25. The integrated circuit of claim 20 , wherein the control gate and the first well terminal are both discharged at a first rate for a first predetermined time period and discharged at a second rate for a second predetermined time period, wherein the second rate is higher than the first rate.

26. A method for controlling a discharge rate of an erase voltage applied to a non-volatile memory cell, the non-volatile memory cell having a plurality of terminals, the method comprising:

providing a reference current;

mirroring the reference current to provide a first mirrored current for discharging a first terminal of the plurality of terminals at a first discharge rate for a first predetermined time; and

mirroring the reference current to provide a second mirrored current for discharging a second terminal of the plurality of terminals at a second discharge rate for a second predetermined time.

27. The method of claim 26 , wherein the plurality of terminals comprises a control gate, a floating gate, a source, a drain, and a well region, the well region being in a semiconductor substrate.

28. The method of claim 26 , wherein the first discharge rate is approximately equal to the second discharge rate and the first predetermined time is approximately equal to the second predetermined time.

29. The method of claim 26 , further comprising:

discharging the first terminal at a third discharge rate for a third predetermined time; and

discharging the second terminal at a fourth discharge rate for a fourth predetermined time.

Assignments (18)
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040925 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Feb 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V. F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 052917/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040928 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Jan 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 052915/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 037486 FRAME 0517. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Dec 10, 2019
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 053547/0421 →
RELEASE OF SECURITY INTEREST Recorded Sep 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
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CORRECTIVE ASSIGNMENT TO CORRECT THE TO CORRECT THE APPLICATION NO. FROM 13,883,290 TO 13,833,290 PREVIOUSLY RECORDED ON REEL 041703 FRAME 0536. ASSIGNOR(S) HEREBY CONFIRMS THE THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS.. Recorded Feb 20, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: SHENZHEN XINGUODU TECHNOLOGY CO., LTD.
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CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE PATENTS 8108266 AND 8062324 AND REPLACE THEM WITH 6108266 AND 8060324 PREVIOUSLY RECORDED ON REEL 037518 FRAME 0292. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Feb 1, 2017
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
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CORRECTIVE ASSIGNMENT TO CORRECT THE NATURE OF CONVEYANCE LISTED CHANGE OF NAME SHOULD BE MERGER AND CHANGE PREVIOUSLY RECORDED AT REEL: 040652 FRAME: 0180. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER AND CHANGE OF NAME. Recorded Jan 12, 2017
From: FREESCALE SEMICONDUCTOR INC.
To: NXP USA, INC.
Reel/Frame 041354/0148 →
CHANGE OF NAME Recorded Nov 8, 2016
From: FREESCALE SEMICONDUCTOR INC.
To: NXP USA, INC.
Reel/Frame 040652/0180 →
RELEASE OF SECURITY INTEREST Recorded Nov 7, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 040928/0001 →
RELEASE OF SECURITY INTEREST Recorded Sep 21, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V., F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 040925/0001 →
SUPPLEMENT TO THE SECURITY AGREEMENT Recorded Jun 16, 2016
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To: MORGAN STANLEY SENIOR FUNDING, INC.
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ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 13, 2016
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To: MORGAN STANLEY SENIOR FUNDING, INC.
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ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 12, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037486/0517 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
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PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037354/0225 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
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SECURITY AGREEMENT Recorded Nov 6, 2013
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To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
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From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
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