Method for making a semiconductor device including band-engineered superlattice having 3/1-5/1 germanium layer structure
View Patent ↗A semiconductor device includes a superlattice that, in turn, includes a plurality of stacked groups of layers. The device may also include regions for causing transport of charge carriers through the superlattice in a parallel direction relative to the stacked groups of layers. Each group of the superlattice may include a plurality of stacked base semiconductor monolayers defining a base semiconductor portion and an energy band-modifying layer thereon. Moreover, the energy-band modifying layer may include at least one non-semiconductor monolayer constrained within a crystal lattice of adjacent base semiconductor portions. Accordingly, the superlattice may have a higher charge carrier mobility in the parallel direction than would otherwise be present.
1. A method for making a semiconductor device comprising:
forming a superlattice comprising a plurality of stacked groups of layers;
each group of layers of the superlattice comprising a plurality of stacked base germanium monolayers defining a base germanium portion and an energy band-modifying layer thereon;
the groups of layers arranged in an alternating pattern of first and second groups of layers, with each first group of layers comprising three base germanium monolayers, and each second group of layers comprising five base germanium monolayers;
the energy-band modifying layer comprising at least one non-semiconductor monolayer constrained within a crystal lattice of adjacent base germanium portions.
2. The method of claim 1 wherein the superlattice has a common energy band structure therein.
3. The method of claim 1 wherein the superlattice has a higher charge carrier mobility in at least one direction than would otherwise be present.
4. The method of claim 3 wherein the higher charge carrier mobility results from a lower conductivity effective mass for the charge carriers in a parallel direction than would otherwise be present.
5. The method of claim 4 wherein the lower conductivity effective mass is less than two-thirds the conductivity effective mass that would otherwise occur.
6. The method of claim 3 wherein the charge carriers having the higher mobility comprise at least one of electrons and holes.
7. The method of claim 1 wherein each energy band-modifying layer comprises oxygen.
8. The method of claim 1 wherein each energy band-modifying layer is a single monolayer thick.
9. The method of claim 1 wherein forming the superlattice comprises forming a base germanium cap layer on an uppermost group of layers.
10. The method of claim 1 wherein each non-semiconductor monolayer is thermally stable through deposition of a next layer.
11. The method of claim 1 wherein each energy band-modifying layer comprises a non-semiconductor selected from the group consisting of oxygen, nitrogen, fluorine, and carbon-oxygen.
12. The method of claim 1 wherein forming the superlattice comprises forming the superlattice adjacent a substrate.
13. The method of claim 1 further comprising implanting at least one type of conductivity dopant in the superlatice.
14. The method of claim 1 wherein the superlattice defines a channel of a transistor.
15. A method for making a semiconductor device comprising:
providing a substrate; and
forming a superlattice comprising a plurality of stacked groups of layers adjacent the substrate;
each group of layers of the superlattice comprising a plurality of stacked base germanium monolayers defining a base germanium portion and an energy band-modifying layer thereon;
the groups of layers arranged in an alternating pattern of first and second groups of layers, with each first group of layers comprising three base germanium monolayers, and each second group of layers comprising five base germanium monolayers;
the energy-band modifying layer comprising at least one non-semiconductor monolayer constrained within a crystal lattice of adjacent base germanium portions, the superlattice thereby having a higher charge carrier mobility in at least one direction than would otherwise be present.
16. The method of claim 15 wherein the superlattice has a common energy band structure therein.
17. The method of claim 15 wherein the higher charge carrier mobility results from a lower conductivity effective mass for the charge carriers in a parallel direction than would otherwise be present.
18. The method of claim 17 wherein the lower conductivity effective mass is less than two-thirds the conductivity effective mass that would otherwise occur.
19. The method of claim 15 wherein the charge carriers having the higher mobility comprise at least one of electrons and holes.
20. The method of claim 15 wherein each energy band-modifying layer comprises oxygen.
21. The method of claim 15 wherein each energy band-modifying layer is a single monolayer thick.
22. The method of claim 15 wherein forming the superlattice further comprises forming a base germanium cap layer on an uppermost group of layers.
23. The method of claim 15 wherein each non-semiconductor monolayer is thermally stable through deposition of a next layer.
24. The method of claim 15 wherein each energy band-modifying layer comprises a non-semiconductor selected from the group consisting of oxygen, nitrogen, fluorine, and carbon-oxygen.
25. The method of claim 15 further comprising implanting at least one type of conductivity dopant in the superlattice.
26. The method of claim 15 wherein the superlattice defines a channel of a transistor.