Method of forming polysilicon layer in semiconductor device
View Patent ↗Disclosed herein is a method of forming a polysilicon film of a semiconductor device. Upon deposition process of a polysilicon film, the inflow of a gas is reduced to 150 sccm to 250 sccm to control abnormal deposition depending upon excessive inflow of the gas. Accordingly, the interfacial properties of the polysilicon film can be improved. It is thus possible to improve an operating characteristic of a device by prohibiting concentration of an electric field at the portion.
1. A method of forming a polysilicon film of a semiconductor device, the method comprising,
(a) loading a semiconductor substrate into a deposition chamber;
(b) flowing a SiH 4 or Si 2 H 6 gas into the deposition chamber at a flow rate of at least 1000 sccm and flowing a PH 3 gas into the deposition chamber to form a doped polysilicon film on the semiconductor substrate; and
(c) stopping the inflow of the PH 3 gas and reducing the inflow of the SiH 4 or Si 2 H 6 gas to 150 sccm to 250 sccm in order to form an undoped polysilicon film on the doped polysilicon film, while maintaining a temperature of the interior of the deposition chamber, in a range of 500° C. to 550° C. during steps (b) and (c).
2. The method of claim 1 , wherein the deposition chamber is a LPCVD chamber.