IP Library Granted Patent US 7,034,315
Granted Patent B2
US 7,034,315 · App. 11/058,695 · Granted Apr 25, 2006

Particle source with selectable beam current and energy spread

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Quick Facts
Patent No.
US 7,034,315
App. No.
11/058,695
Granted
Apr 25, 2006
Kind
B2
Abstract

The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 13 eccentrically through a lens 6 . As a result of this, energy dispersion will occur in an image 15 formed by the lens 6 . By projecting this image 15 onto a diaphragm 7 , it is possible to only allow particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam 16 will have a reduced energy spread. By adding a deflection unit 10 , this particle beam 16 can be deflected toward the optical axis 2 . One can also elect to deflect a beam 12 going through the middle of the lens 6 —and having, for example, greater current—toward the optical axis.

Claims (25)

1. A particle-optical apparatus equipped with a particle source, which particle source is embodied to generate at least one beam of electrically charged particles ( 16 ) and which particle source is provided with:

a particle-emitting surface for emission of the electrically charged particles;

a lens for formation of an image of the particle-emitting surface;

a beam-limiting diaphragm for limitation of said beam of particles, and;

an energy-selecting diaphragm at the location of the image, characterized in that

the beam-limiting diaphragm is embodied in such a way that said beam is a beam that goes through the lens eccentrically.

2. A particle-optical apparatus according to claim 1 , in which the beam-limiting diaphragm is also embodied to allow a beam going through the middle of the lens to pass.

3. A particle-optical apparatus according to claim 1 , provided with a deflection unit, which deflection unit is embodied to deflect one of the beams of electrically charged particles toward an optical axis, in such a manner than this beam further propagates about the optical axis.

4. A particle-optical apparatus according to claim 1 , in which the particle-emitting surface has the form of several, non-juxtaposed, particle-emitting constituent surfaces.

5. A particle source for use in a particle-optical apparatus, the particle source configured to generate at least one beam of electrically charged particles, the particle source comprising:

a particle-emitting surface for emission of the electrically charged particles;

a lens for formation of an image of the particle-emitting surface;

a beam-limiting diaphragm for limitation of said beam of particles, the beam-limiting diaphragm is embodied in such a way that said beam is a beam that goes through the lens eccentrically; and

an energy-selecting diaphragm at the location of the image.

6. A particle-optical apparatus according to claim 2 , provided with a deflection unit, which deflection unit is embodied to deflect one of the beams of electrically charged particles toward an optical axis, in such a manner than this beam further propagates about the optical axis.

7. A particle-optical apparatus according to claim 2 , in which the particle-emitting surface has the form of several, non-juxtaposed, particle-emitting constituent surfaces.

8. A particle-optical apparatus according to claim 3 , in which the particle-emitting surface has the form of several, non-juxtaposed, particle-emitting constituent surfaces.

9. A particle-optical apparatus according to claim 6 , in which the particle-emitting surface has the form of several, non-juxtaposed, particle-emitting constituent surfaces.

10. A particle-optical source according to claim 5 , in which the beam-limiting diaphragm is also embodied to allow a beam going through the middle of the lens to pass.

11. A particle-optical source according to claim 5 , provided with a deflection unit, which deflection unit is embodied to deflect one of the beams of electrically charged particles toward an optical axis, in such a manner than this beam further propagates about the optical axis.

12. A particle-optical source according to claim 10 , provided with a deflection unit, which deflection unit is embodied to deflect one of the beams of electrically charged particles toward an optical axis, in such a manner than this beam further propagates about the optical axis.

13. A particle-optical source according to claim 5 , in which the particle-emitting surface has the form of several, non-juxtaposed, particle-emitting constituent surfaces.

14. A particle-optical source according to claim 10 , in which the particle-emitting surface has the form of several, non-juxtaposed, particle-emitting constituent surfaces.

15. A particle-optical source according to claim 11 , in which the particle-emitting surface has the form of several, non-juxtaposed, particle-emitting constituent surfaces.

16. A particle-optical source according to claim 12 , in which the particle-emitting surface has the form of several, non-juxtaposed, particle-emitting constituent surfaces.

Assignments (3)
RELEASE OF SECURITY INTEREST Recorded Apr 1, 2016
From: JPMORGAN CHASE BANK, N.A.; J.P. MORGAN EUROPE LIMITED
To: FEI COMPANY
Reel/Frame 038328/0787 →
SECURITY AGREEMENT Recorded Jun 9, 2008
From: FEI COMPANY
To: JP MORGAN CHASE BANK, N.A. (AS ADMINISTRATIVE AGENT); J.P. MORGAN EUROPE LIMITED, AS ALTERNATIVE CURRENCY AGENT
Reel/Frame 021064/0319 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 15, 2005
From: HENSTRA, ALEXANDER; CHMELIK, JAROSLAV
To: FEI COMPANY
Reel/Frame 016286/0832 →