Patent Assignment
Reel/Frame 021064/0319
Security Agreement
Recorded: 2008-06-09
Received: 2008-06-09
Pages: 11
Assignor
FEI COMPANY
Executed: 2008-06-04
Assignees
JP MORGAN CHASE BANK, N.A. (AS ADMINISTRATIVE AGENT)
1 CHASE MANHATTAN PLZ FRNT 2, NEW YORK, NY, 10005, UNITED STATES
J.P. MORGAN EUROPE LIMITED, AS ALTERNATIVE CURRENCY AGENT
3 LOCHSIDE VIEW, EDINBURGH PARK, EDINBURGH, SCOTLAND, GBX, EH12 9DH, UNITED KINGDOM
Covered Properties
(75)
Projectile Launcher with Reduced Recoil and Anti-Jam Mechanism
Application:
12/102,535 →
Environmentally Neutral Processing with Condensed Phase Cryogenic Fluids
Application:
11/839,338 →
Projectile Launcher
Application:
29/277,903 →
Paintball Gun System with Secure Quick-Connect Pressure Coupling
Application:
11/678,774 →
Projectile Launcher
Application:
11/633,200 →
Method of Adjusting the Operating Region of a Tool Component to a Pre-Determined Element
Application:
11/522,832 →
Apparatus with Permanent Magnetic Lenses
Application:
11/418,730 →
Cost Effective Paintball Gun System
Application:
11/403,373 →
Particle-Optical Appliance Provided with Aberration-Correcting Means
Application:
11/397,480 →
Directed Growth of Nanotubes on a Catalyst
Application:
11/387,561 →
Method of Localizing Fluorescent Markers
Application:
11/268,975 →
Method of Measuring Three-Dimensional Surface Roughness of a Structure
Application:
11/252,115 →
Cluster Tool for Microscopic Processing of Samples
Application:
11/237,475 →
Electron Source, and Charged-Particle Apparatus Comprising Such an Electron Source
Application:
11/233,488 →
Gas Pressure Regulator
Application:
11/162,182 →
Graphical Automated Machine Control and Metrology
Application:
11/115,751 →
Apparatus with Permanent Magnetic Lenses
Application:
11/111,078 →
Stylus System for Modifying Small Structures
Application:
11/104,876 →
Particle Source with Selectable Beam Current and Energy Spread
Application:
11/058,695 →
Thin-Film Magnetic Recording Head Manufacture Using Selective Imaging
Application:
10/999,908 →
Cold Cathode Ion Gauge
Application:
10/997,410 →
Magnetically Enhanced, Inductively Coupled Plasma Source for a Focused Ion Beam System
Application:
10/988,745 →
Method for Performing Focusing in a Particle-Optical Device with the Aid of Astigmatism in the Particle Beam
Application:
10/928,573 →
Low Power Schottky Emitter
Application:
10/909,621 →
Dual Beam System
Application:
10/889,967 →
Sample Carrier for Carrying a Sample to Be Irradiated with an Electron Beam
Application:
10/870,617 →
Method and Apparatus for Manipulating a Microscopic Sample
Application:
10/863,547 →
Particle-Optical Apparatus with a Permanent-Magnetic Lens and an Electrostatic Lens
Application:
10/829,002 →
Charged Particle Beam System
Application:
10/801,981 →
Particle-Optical Device for Irradiating an Object
Application:
10/795,759 →
Directed Growth of Nanotubes on a Catalyst
Application:
10/763,061 →
Method for the Manufacture and Transmissive Irradiation of a Sample, and Particle-Optical System
Application:
10/758,651 →
Defect Analyzer
Application:
10/706,304 →
Power Saving Electronic Gun Trigger
Application:
10/695,036 →
Angular Aperture Shaped Beam System and Method
Application:
10/688,810 →
System for Imaging a Cross-Section of a Substrate
Application:
10/679,100 →
Ion Beam for Target Recovery
Application:
10/669,616 →
Shaped Sputter Shields for Improved Ion Column Operation
Application:
10/668,431 →
Particle-Optical Device and Detection Means
Application:
10/664,796 →
Method of Obtaining a Particle-Optical Image of a Sample in a Particle-Optical Device
Application:
10/653,735 →
Focused Ion Beam System with Coaxial Scanning Electron Microscope
Application:
10/635,228 →
Magnetic Lens
Application:
10/621,103 →
Proximity Deposition
Application:
10/607,814 →
Particle Detector Suitable for Detecting Ions and Electrons
Application:
10/606,930 →
Thin-Film Magnetic Recording Head Manufacture
Application:
10/462,389 →
Dummy Copper Deprocessing
Application:
10/405,898 →
Integrated Measuring Instrument
Application:
10/317,160 →
Fabrication of Three Dimensional Structures
Application:
10/301,208 →
Electrostatic Manipulating Apparatus
Application:
10/252,845 →
Graphical Automated Machine Control and Metrology
Application:
10/227,619 →
Electron Beam Processing
Application:
10/206,843 →
Method and Apparatus for Scanned Instrument Calibration
Application:
10/186,206 →
Apparatus for Tilting a Beam System
Application:
10/159,790 →
High Angular Intensity Schottky Electron Point Source
Application:
10/138,708 →
Focused Particle Beam Systems and Methods Using a Tilt Column
Application:
10/135,005 →
Method of X-Ray Analysis in a Particle-Optical Apparatus
Application:
10/123,666 →
Thin-Film Magnetic Recording Head Manufacture
Application:
10/085,490 →
Electron Beam System Using Multiple Electron Beams
Application:
10/081,247 →
Fabrication of High Resistivity Structures Using Focused Ion Beams
Application:
10/055,320 →
Sem Provided with a Secondary Electron Detector Having a Central Electrode
Application:
10/024,777 →
Particle-Optical Inspection Device Especially for Semiconductor Wafers
Application:
10/024,762 →
Thin-Film Magnetic Recording Head Manufacture Using Selective Imaging
Application:
10/024,639 →
Vapor-Separating Fuel System Utilizing Evaporation Chamber
Application:
10/021,445 →
Focused Ion Beam System
Application:
09/982,110 →
Low Power Schottky Emitter
Application:
09/981,663 →
Real Time Monitoring for Simultaneous Imaging and Exposure in Charged Particle Beam Systems
Application:
09/960,224 →
Through-The-Lens Neutralization for Charged Particle Beam System
Application:
09/859,295 →
Collection of Secondary Electrons Through the Objective Lens of a Scanning Electron Microscope
Application:
09/840,558 →
Apparatus and Method for Reducing Differential Sputter Rates
Application:
09/818,988 →
Method and Apparatus for Repairing Lithography Masks Using a Charged Particle Beam System
Application:
09/802,342 →
Step Function Determination of Auger Peak Intensity
Application:
09/792,990 →
Multi-Column Fib for Nanofabrication Applications
Application:
09/781,125 →
Object Carrier for a Particle-Optical Apparatus
Application:
09/767,570 →
Gas Pressure Regulator
Application:
09/766,138 →
Shaped and Low Density Focused Ion Beams
Application:
09/765,806 →